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Semiconductor structuring

Dadap J I, Hu X F, Anderson M H, Downer M C, Lowell J Kand Aktsiperov O A 1996 Optical second-harmonic electroreflectance spectroscopy of a Si(OOOI) metal-oxide-semiconductor structure Phys. Rev. B 53 R7607-9... [Pg.1305]

The semiconductor structure is crucial for both electron injection and charge transport after the exciton separation. Meng et al. [35] published a theoretical study focused on the electron injection mechanism in dyad anthocyanine-Ti02 nanowires. [Pg.249]

Dawar, A. L. Kumar, A. Kumar, P. Mathur, P C. 1984. Field-effect studies on p-type CuInTe2 metal-insulator-semiconductor structures. I. Appl. Phys. [Pg.107]

Both classes of these wavy semiconductor structures on PDMS can be reversibly stretched or compressed. Figures 13.17a and b show 3D AFM images of wavy GaAs ribbons formed on a PDMS substrate prestretched by 1.9% and optical images of wavy GaAs ribbons embedded in PDMS. When the initially wavy GaAs ribbons are stretched, their amplitude decreases and wavelength increases. The opposite is true for the compression case. [Pg.438]

Phosphorus oxynitride, PON, is a useful starting product, as a phosphorus and nitrogen source, to prepare various nitridooxophos-phates, in particular phosphorus oxynitride glass compositions (211). Moreover, it shows as a material excellent chemical stability with potential applications in several domains. In microelectronics, for example, PON has been used to form by evaporation insulating films for the passivation of III-V InP substrates and the elaboration of MIS (metal-insulator-semiconductor) structures (190, 212-215). PON could have also valuable properties in flame retardancy (176,191,216). [Pg.216]

Fig. 12.7 InGaAsP/InP multi quantum well semiconductor structure process (a) Si02 etch mask deposition (b) PMMA spin coating (c) E beam lithography and develop (d) Si02 etch (e) PMMA stripping (f) InGaAsP membrane etch (g) Si02 stripping (h) Chip flipping and bonding to sapphire (i) InP substrate etch (j) Adhesive etch... Fig. 12.7 InGaAsP/InP multi quantum well semiconductor structure process (a) Si02 etch mask deposition (b) PMMA spin coating (c) E beam lithography and develop (d) Si02 etch (e) PMMA stripping (f) InGaAsP membrane etch (g) Si02 stripping (h) Chip flipping and bonding to sapphire (i) InP substrate etch (j) Adhesive etch...
Oranges, citric acid in, 6 632t ORBIT PRINT SELECT software, 18 243 Orbitrap, 15 662-663 Orb web, structure of, 22 630 Ordered intermetallic alloys, 13 530 Order, in amorphous semiconductor structure, 22 128-129 Ordering, in ternary semiconductor alloy preparation, 22 158-159 Order of addition, in large-scale... [Pg.650]

Semiconductor refractive index, 14 846 Semiconductor structures, chemically perfect, 9 730... [Pg.830]

One possible solution is to obtain new experimental data, which is independent of co/pH curves. The zeta potential is of course a possibility, but it suffers from the intrinsic indeterminacy of the exact location in the double layer where it occurs. Another possibility is the surface potential, Vo, which will be defined below. Variations of Vo can be measured by using electrolyte/insulator/semiconductor structures. It has been shown by Bousse et al. (14) that the Vo/pH characteristics are determined mainly by the number of charged but uncomplexed surface sites, and are insensitive to complex-ation. This means that combined consideration of tro/pH and Vo/pH characteristics should lead to a more complete and reliable determination of model parameters. [Pg.80]

Semiconductor structures that develop space charge layers and contact potentials, like films of proper thickness, films with applied external bias, homo- and hetero-(nano)junctions, permit significant suppression of bulk recombination processes and, potentially, allow high quantum yields. Spatial separation of electron and holes also allows the separation of cathodic and anodic processes in a photoelec-trochemical cell (eventually at the micro and nano level), minimizing surface re-... [Pg.361]

Space charge layers and contact potential for efficient charge carrier separation can be achieved with proper semiconductor structure in several ways. When possible semiconductor structures are considered, the charge separation can be attained in an active mode, i.e., by the use of a potential bias in a photoelectrochem-ical cell, or in a passive mode, i.e., with the use of proper contact between different phases. [Pg.362]

Polymers and Their Application in Photogalvanic Metal-Insulator- Semiconductor Structures. [Pg.343]

D. K. Maude and J. C. Portal, Parallel Transport in Low-Dimensional Semiconductor Structures... [Pg.305]

We now deal with the structures that molecules build on substrate surfaces at full coverage, that is in the ML regime. Such hybrid systems are known as heterostructures. H. Kroemer dehned heterostructures as heterogeneous semiconductor structures built from two or more different semiconductors, in such a way that the transition region or interface between the different materials plays an essential role in any device action (Kroemer, 2001). The term heterostructure can be generalized to any... [Pg.164]

Electronic Quantum Transport in Mesoscopic Semiconductor Structures By T. Ihn 2003. 90 figs., XII, 280 pages... [Pg.260]

X-Ray Diffuse Scattering from Self-Oi anized Mesoscopic Semiconductor Structures... [Pg.260]

To implement this strategy, multilayered semiconductor structures were grown by MOCVD and then processed using lithographic techniques to create trenches of 10-20 p-m. Trenches of 10 pm were used to create arrays of 34 interdigitated LED/photodiode pairs, as shown in Fig. 8. As molecules adsorb onto the surfaces of these semiconducting materials, the electronic properties of the surfaces can be altered and thus changes in current can be observed when molecules such as ammonia and sulfur dioxide adsorb onto the surfaces of the diodes. [Pg.355]

Prill/. G.A. "Hybrid ferromagnetic--Semiconductor Structures." Sncn.r. 1092 i November 22. 99()>. [Pg.961]

Fig. 16. Schematic diagrams (not to scale) showing, in the upper diagram a metal-insulotor-semiconductor structure which forms an integral part of the field effect transistor shown in the luwer diagram... Fig. 16. Schematic diagrams (not to scale) showing, in the upper diagram a metal-insulotor-semiconductor structure which forms an integral part of the field effect transistor shown in the luwer diagram...
Useful characteristics of hybrid ferromagnetic-semiconductor structures include ... [Pg.1471]

Neaiueii, D.A.. Semiconductor Physics and Devices. Busic Principles, 2nd Edition, McGraw-Hill Higher Education, New York, NY, 1997 Pool, R. Cluster s Strange Morsels of Matter. Science, 1186 (June 8. 1990). Prinz, G.A. Hybrid Ferromagnetic Semiconductor Structures, Science, 1092 (November 23, 1990). [Pg.1471]

Prinz, G.A. Hybrid Ferromagnetic Semiconductor Structures, Science. 1092... [Pg.1520]

Figure 18. C(V) curves for a metal-Ba stearate semiconductor structure (multilayer thickness, 1000 A). Capacitance levels are indicated the max/min ratio depends on the parameters of the structure, and the absolute values of the capacitance depend of course on the area of the metal contact (a mercury probe). Different areas of the same sample were used to obtain the curves in the top and bottom figures.------------- an ideal, theoretical C(V) curve. Figure 18. C(V) curves for a metal-Ba stearate semiconductor structure (multilayer thickness, 1000 A). Capacitance levels are indicated the max/min ratio depends on the parameters of the structure, and the absolute values of the capacitance depend of course on the area of the metal contact (a mercury probe). Different areas of the same sample were used to obtain the curves in the top and bottom figures.------------- an ideal, theoretical C(V) curve.

See other pages where Semiconductor structuring is mentioned: [Pg.384]    [Pg.9]    [Pg.415]    [Pg.115]    [Pg.210]    [Pg.3]    [Pg.259]    [Pg.289]    [Pg.5]    [Pg.476]    [Pg.138]    [Pg.280]    [Pg.835]    [Pg.71]    [Pg.220]    [Pg.245]    [Pg.281]    [Pg.384]    [Pg.77]    [Pg.1024]    [Pg.1471]    [Pg.856]    [Pg.348]    [Pg.442]    [Pg.256]    [Pg.116]    [Pg.70]   
See also in sourсe #XX -- [ Pg.23 ]




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