Polymers, acrylate-based cyclic

Cyclic allylic disulfide readily underwent the R-ROP due to the facile cleavage of the bond between allylic carbon and sulfur atom, resulting in the production of polysuffides with exo-methylene groups (3, 41, 42). Acrylate-based cyclic allylic sulfide also showed a high radical polymerizability (3, 43). The copolymerization of acrylate-based cyclic allylic sulfide with MMA and styrene produced the corresponding copolymers bearing sulfide and ester moieties in the polymer backbone (43). 

The utility of the bis cyclic ureas for curing of coatings was demonstrated by dispersing them in a functional acrylic polymer formulated for powder coating application, or by using them as additive in solvent based coatings or in aqueous polymer emulsions for electrocoating. 

To achieve good compatibility with functionalized acrylic and epoxy resins a bis cyclic urea with n=3> and R=-(CH2)7-(see Scheme I) was synthesized. Acrylic- and epoxypolymer solutions were prepared using 15% by weight of the bis cyclic urea (based on the dry polymer) and methyl ethyl ketone as solvent. Films cast from these solutions on steel sheets were clear, and had a thickness of 0.4 mil. 

Some commercial durable antistatic finishes have been listed in Table 3 (98). Early patents suggest that amino resins (qv) can impart both antislip and antistatic properties to nylon, acrylic, and polyester fabrics. Cyclic polyurethanes, water-soluble amine salts cross-linked with styrene, and water-soluble amine salts of sulfonated polystyrene have been claimed to confer durable antistatic protection. Later patents included dihydroxyethyl sulfone [2580-77-0]9 hydroxyalkylated cellulose or starch, poly(vinyl alcohol) [9002-86-2] cross-linked with dimethylolethylene urea, chlorotriazine derivatives, and epoxy-based products. Other patents claim the use of various acrylic polymers and copolymers. Essentially, durable antistats are polyelectrolytes, and the majority of useful products involve variations of cross-linked polyamines containing polyethoxy segments (92,99—101). 

The most common conformal coatings are derived from polyurethanes, acrylics, and epoxies the more special formulations for high-temperature performance are based on silicones, diallyl-phthalate esters, and polyimides. An example of a vapor deposited conformal coating is Parylene. It is obtained by vapor deposition of p-xylylene, which is formed as a transient by dehydrogenation of p-xylene at high temperature, and polymerization on the surface of the object to be coated. Because p-xylylene monomer is not stable, it is advantageous to work with the cyclic dimer, di-p-xylylene (paracyclophane), which, upon heating under reduced pressure, will produce the transient monomer which converts to the polymer at low temperatures. 

In chemical development, the matrix resin of the resist system dissolves in the developer through a chemical reaction. Examples of resists that use chemical development include positive resists composed of novolac resins and DNQs, as well as positive chemical amplification resists based on phenolic, acrylate, and ali-cyclic polymers. These resists are developed with a 0.26-N aqueous solution of tetramethylammonium hydroxide. The exposed resins with phenolic and acidic functional groups dissolve in the developer via the chemical reactions... 

Other experimental 157-nm resists can be considered to be derived from 193-nm CA resists. The homopolymer poly(HFIPA-norbomene) has an optical density of 1.8/)nm (130). First used in 193-nm resist polymers (131), HFIPA-norbomene monomer can be incorporated into cyclic olefin polymers prepared via organometalUc catalysis, and can be copolsrmerized with vinyl monomers such as acrylates or fluorinated acrylates using standard free-radical polymerization to give products with optical densities of less than 3/)um (Fig. 18, lower structure) (132,133). Still other fluorinated monomers can be employed in 157-nm resists, and resist systems based on polymers of fluorinated olefins and vinyl alcohols have been described (134,135). In general, it appears that incorporation of fluorine compromises the etch resistance of resists when compared with their hydrocarbon analogues (136). 

The cyclic diether, 1,3-dioxolane, is recommended by Ferro Corporation as a more benign solvent substitute for chlorinated organic solvents, such as methylene chloride, 1,2-dichloroethane, and 1,1,1-trichloroethane, and for ketones, such as methyl ethyl ketone (MEK). This ethylene glycol-based ether is a suitable solvent under neutral and basic conditions in several major-use areas. It is a powerful solvent for softening and dissolving polymers made from polar monomers, for example, polycarbonates, acrylates, cellulosics urethanes, phenoUcs, nitriles, urea-formaldehydes, and alkyds, as well as polyesters, vinyl epoxys, and halogen-containing polymers. As a reaction solvent it is added as a component to a special quaternary ammonium or phosphonium salt solution for preparation of a vesicular phenoxy resin. Other beneficial uses for the solvent dioxolane, include ... 

Oxazoline acrylic polymers have an oxazoline group, which is a kind of cyclic imino ether, as side chains. Ethylenimine acrylic polymers are modified with ethylenimine. Both materials have been used as main components of acrylic adhesives (Noda 2005). Oxazoline acrylic polymers can be applied to paints, coats, adhesives or pressure-sensitive adhesives (PSAs), and textile treating agents as water-base cross-linkers. Applications of oxazoline acrylic polymers are as follows ... 

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