Plasma-enhanced atomic layer deposition

Polyimide sheet Plasma enhanced atomic layer deposition (PE-ALD) Photocatalytic degradation of 4-chlorophenol [578]... 

C.S. Lee, 1. Kim, J.Y. Son, W. Choi, H. Kim, Photocatal3hic functional coatings of Ti02 thin films on polymer substrate by plasma enhanced atomic layer deposition , Apphed Catalysis B Environmental, 91, 628-633, (2009). 

Several techniques have been developed to deposit alumina films on different surfaces such as those of semiconductors or metals. These films find apphcation in various areas. In most cases, amorphous alumina films are desired. Depending on the deposition techniques, various precursors may be used the following combinations have been reported plasma-enhanced atomic layer deposition using trimethylaluminum (112), metal-organic chemical vapor deposition using aluminum tri-iso-propoxide (113), and condensation from the gas phase using laser-evaporated alumina (114). Similar evaporation techniques can also be apphed to prepare Y-AI2O3 powders (115,116). 

Kim H, Detavenier C, van der Straten O, Rossnagel SM, KeUock AJ, Park D-G. Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition. J Appl Phys 2005 98(1). 

Polymer surfaces are modified by plasma techniques for interfacial enhancement [4-10], Au, Ag, Pd, Cu and Ni were coated on poly (methylmethacrylate) (PMMA) by barrel technique [11]. Coating of A1 alloys on PET was compared with Ti layer under A1 alloys [12]. Thin Aluminum oxide coatings have been deposited on various uncoated papers, polymer-coated papers and plain polymer films using atomic layer deposition technique [13]. The isotactic polypropylene (iPP) and A1 composite is widely used as television cable electromagnetic shielding materials [14], The reflection of infrared light depends on geometry of the surface of alumi-... 

There are numerous materials, both metallic and ceramic, that are produced via CVD processes, including some exciting new applications such as CVD diamond, but they all involve deposition on some substrate, making them fundamentally composite materials. There are equally numerous modifications to the basic CVD processes, leading to such exotic-sounding processes as vapor-phase epitaxy (VPE), atomic-layer epitaxy (ALE), chemical-beam epitaxy (CBE), plasma-enhanced CVD (PECVD), laser-assisted CVD (LACVD), and metal-organic compound CVD (MOCVD). We will discuss the specifics of CVD processing equipment and more CVD materials in Chapter 7. 

Chemical vapor deposition (CVD). In CVD, the material s components come from the decomposition of one or more volatile chemical precursors that decompose and/or react on the substrate. Depending on deposition conditions (temperature and pressure) and the precursor nature, different terminologies are used to define CVD processes. Eor example, MOCVD is metal organic CVD, LPCVD is low-pressure CVD, ALCVD is atomic layer CVD, HWCVD is hotwire CVD, and PECVD is plasma-enhanced CVD. These processes can lead to single crystal, amorphous, or polycrystaUine films. 

CCVD combustion chemical vapor deposition MOCVD mettil-organic-assisted CVD PECVD plasma-enhanced CVD FACVD flame-assisted CVD AACVD aerosol-assisted CVD ESAVD electrostatic-atomization CVD LPCVD low-pressure CVD APCVD atmospheric-pressure CVD PACVD photo-assisted CVD TACVD thermtil-activated CVD EVD electrochemical vapor deposition RTCVD rapid thermal CVD UHVCVD ultrahigh-vacuum CVD ALE atomic-layer epitaxy PICVD pulsed-injection CVD... 

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