Chemical beam epitaxy

Foord J S, Davies G J and Tsang W S 1997 Chemical Beam Epitaxy and Related Techniques (New York Wiley)... 

Foord, J.S., 1997, Chemical beam epitaxy and related techniques, John Wiley Son Ltd. 

There are numerous materials, both metallic and ceramic, that are produced via CVD processes, including some exciting new applications such as CVD diamond, but they all involve deposition on some substrate, making them fundamentally composite materials. There are equally numerous modifications to the basic CVD processes, leading to such exotic-sounding processes as vapor-phase epitaxy (VPE), atomic-layer epitaxy (ALE), chemical-beam epitaxy (CBE), plasma-enhanced CVD (PECVD), laser-assisted CVD (LACVD), and metal-organic compound CVD (MOCVD). We will discuss the specifics of CVD processing equipment and more CVD materials in Chapter 7. 

Fabrication methods include thermal evaporation, sputtering, magnetron sputtering, pulsed laser evaporation, molecular beam epitaxy, chemical vapor deposition, electrolytic and electroless deposition, and growth from solution. 

Chemical beam epitaxy a process in which one or more beams of volatile metal-organic precursors is directed to the substrate surface to effect film growth Chemical vapor deposition (CVD also termed vapor-phase epitaxy) the deposition of a thin film of an element or compound using some form of excitation for the decomposition of a volatile precursor... 

Another emerging film growth technique that employs metal-organic film growth precursors is termed CBE (chemical beam epitaxy). CBE is a variant of the widely used MBE (molecular beam epitaxy) technique, except that metal-organic... 

J. S. Foord, G. J. Davies, and W. T. Tsang, Chemical Beam Epitaxy and Related Techniques , Wiley, Chichester, 1997. 

Changes in solid surfaces occur either during the formation of a new phase as in vapor deposition, molecular beam epitaxis, chemical vapor deposition and metal electrodeposition, or during a phase disappearance as is the case of metallic corrosion and material erosion. Similar changes occur in roughness relaxation, a process which plays a relevant role in establishing, for instance, the lifetime of solid catalysts. 

DEZ was also used for chemical beam epitaxy by Sato and coworkers [211]. They report a very low substrate temperature of 150 °C for the deposition of aluminum-doped zinc oxide. 

Several technologies that compete with CVD include molecular beam epitaxy (MBE) and its variants, chemical beam epitaxy (CBE) and metal-organic MBE (MOMBE), liquid phase epitaxy (LPE), vapor phase epitaxy (hybride) (VPE), and ion implantation among other technologies. Each of these technologies still remains active and satisfies many niche markets, and is described in greater detail in the following sections. 

The methods available for preparation of the different layers in thin-film solar cells include physical methods such as vacuum sputtering, vapor-phase deposition, and molecular beam epitaxy as well as chemical methods such as chemical vapor-phase deposition, metal organic vapor-phase epitaxy, chemical bath deposition (CBD), and electrochemical deposition (ED). This chapter explores the potential of electrodeposition as a route to the fabrication of absorber layers such as CdTe, CIGS, and CZTS for thin-film solar cells. Electrochemistry may also be usefiil for the preparation of transparent layers such as ZnO this topic has been reviewed by Pauporte and lincot [13]. 

Matarial Science.- Relevant review articles are the use of metalorganic precursors for vapour phase epitaxy, precursor requirements for the growth of GaAs and AlGaAs by chemical beam epitaxy,and the use of aluminium-nitrogen compounds for AIN deposition.203... 

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