Photoresists properties

Miscellaneous Applications. PEIs and their derivatives ate used as cementation auxihaties in cmde oil exploration (459), and for breaking cmde oil emulsions (460) in cmde oil extraction. Seed coatings of water-soluble copolymers containing polyethyleneimine have been developed (461). Polyethyleneimine derivatives have positive photoresist properties (462) amidated polyethyleneimines improve the flow properties of cement (463) and with few exceptions, A/-acyla2iddines act as chemical sterilisers for insects (464). 

Even if a same azide is used as the sensitizer, such properties of the photoresist as photosensitivity, photocurability and adhesion to base surfaces differ depending on the property of the base polymer. That is, degree of cyclization, content of the unsaturated groups and molecular weight of the polymer affect the photoresist properties mentioned above. H.L.Hunter et al. have discussed the dependence of the sensitivity of polybutadiene photoresist on the polymer structure, and have concluded that a higher sensitivity was obtained when 1,2- and 3, -isomers were used( 7.) ... 

Polyamic acid methacrylate esters are the first self-patternable, pure organic polyimide precursors to be described. They are the polymer basis of the first technically applied resist to produce polyimide patterns in a direct process. They are synthesized simply by the addition of hydroxyethylmethacrylate to aromatic acid dianhydride, and subsequent polycondensation of the intermediate tetracarboxylic acid diester with aromatic diamines. These polyimide precursors give rise to a number of special photoresist properties which lead to important applications, such as photolithographically produced protection layer against a-radiation on memory... 

CAS 27813-02-1 EINECS/ELINCS 248-666-3 Uses Crosslinkable paint resin binder for textiles/paper adhesives urethane methacrylates reactive thinners grafting of textile fibers scale inhibitors adhesion promoter for polymers hydrophilic polymers rubber modifiers contact lenses photopolymer plates photoresists Properties Pt-Co 30 max. colorless clear liq. ester-like odor sol. 10.7% ester in water, 21% water in ester m.w. 144.2 sp.gr. 1.03 (20 C) vise. 

I ovolac Synthesis and Properties. Novolac resins used in DNQ-based photoresists are the most complex, the best-studied, the most highly engineered, and the most widely used polymers in microlithography. Novolacs are condensation products of phenoHc monomers (typically cresols or other alkylated phenols) and formaldehyde, formed under acid catalysis. Figure 13 shows the polymerization chemistry and polymer stmcture formed in the step growth polymerization (31) of novolac resins. 

LB films of CO-tricosenoic acid, CH2=CH—(CH2)2qCOOH, have been studied as electron photoresists (26—28). A resolution better than 50 nm could be achieved. Diacetylenic fatty acids have been polymerized to yield the corresponding poly (diacetylene) derivatives that have interesting third-order nonlinear optical properties (29). 

Photoresistive sensors are essentially inactive devices, but they have the property of exhibiting a change in resistance when light falls on them. This change is detected by an appropriate circuit and is used to measure the light falling on the unit (e.g. in photography exposure meters)... 

Photopolymerizable coatings relief-image-forming systems, 6,125 Photoreactivity environmental effects, 1, 394 Photoredox properties bipyridyl metal complexes, 2, 90 Photoresist systems, 6,125 Photosensitive materials, 6, 113 Photosynthesis anoxygenic, 6, 589 magnesium and manganese, 6, 588 water decomposition models, 6, 498... 

The history and development of polysilane chemistry is described. The polysilanes (polysilylenes) are linear polymers based on chains of silicon atoms, which show unique properties resulting from easy delocalization of sigma electrons in the silicon-silicon bonds. Polysilanes may be useful as precursors to silicon carbide ceramics, as photoresists in microelectronics, as photoinitiators for radical reactions, and as photoconductors. 

Preliminary Examination of PATE Imaging Characteristics. The data herein have shown that PATE resins are easily photolyzed in the deep UV region to form crosslinked films which are of sufficient integrity for photoresists. However, in addition to these film performance properties, a potential resist material must meet other equally important criteria. For example, the masked (unphotolyzed) portion of the resist film must be removed prior to etching, without damage to the cured film. Also, the cured films must withstand an etchant bath. Therefore, since PATE resins seem to meet the necessary requirements of solubility and solvent resistance, investigation of performance under crude simulated processing conditions was undertaken. 

Cyclized polyisoprene has been used as a photoresist by being sensitized with bisazides(1-3). Recently, H.Harada et al. have reported that a partially cyclized 1,2-polybutadiene showed good properties as a practical photoresist material in reproducing submicron patterns (U ). S.Shimazu et al, have studied the photochemical cleavage of 2,6-di(h -azidobenzal)cyclohexanone in a cyclized polyisoprene rubber matrix, and have reported that the principal photoreaction is the simultaneous cleavage of the both azido groups by absorption of a single photon with a U3% quantum yield(5 ). Their result does not support the biphotonic process in the photolysis of bisazide proposed by A.Reiser et al.(6 ). 

The synthesis and electrochemical properties of carbon films prepared from positive photoresist have been reported.The initial direction for this work was the fabrication of carbon interdigitated electrodes. In this work, positive photoresist was spin coated on a silicon substrate, patterned by photolithography, and pyrolyzed to form the carbon electrode. In more recent work, laser excitation has been used to both pyrolyze the film and to write the electrode pattern. ... 

As insulation between the coil and the magnetic core, a hard-cured (to 200°C) photoresist insulator is patterned. It is a novolak polymer or polyimide about 5 fim thick, which is popular for its high insulator and photolithographic properties. This provides electrical insulation as well as a planar surface for subsequent deposition of copper cods. 

Photoresists. These are used in holography because they can be employed to map holographic exposures into surface relief. This property is utilised in the production of embossing masters, reflection and transmission gratings and in computer generated holograms. 

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