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Spectroscopy photoeiectron

Wagner C D, Riggs W M, Davis L E, Moulder J F and Muilenberg G E (eds) 1979 Handbook of X-ray Photoeiectron Spectroscopy Eden Prairie, MN Perkin-Elmer Corporation)... [Pg.318]

Poiarization-Modulation IR Reflection Absorption Spectroscopy (PM-IRAS) High-pressure X-ray Photoeiectron Spectroscopy (HP-XPS)... [Pg.138]

Wang L S, Cheng H S and Fan J 1995 Photoeiectron spectroscopy of size-selected transition metal clusters Fc, = 3-24 J. Chem. Phys. 102 9480... [Pg.2404]

Wang L S and Wu H 1998 Probing the electronic structure of transition metal clusters from molecular to bulk-like using photoeiectron spectroscopy Cluster Materials, Advances in Metal and Semiconductor Clusters vol 4, ed M A Duncan (Greenwich JAI Press) p 299... [Pg.2404]

Iseda M, Nishio T, Han S Y, Yoshida H, Terasaki A and Kondow T 1997 Electronic structure of vanadium cluster anions as studied by photoeiectron spectroscopy J. Chem. Phys. 106 2182... [Pg.2404]

Kim J, Becker i, Cheshnovsky O and Johnson M A 1998 Photoeiectron spectroscopy of the missing hydrated eiectron ciusters n = 3, 5, 8, 9 isomers and continuity with the dominant ciusters n = 6, 7 and >11 Chem. [Pg.2408]

P. K. Ghosh, Introduction to Photoeiectron Spectroscopy , Wiley, New York, 1983. [Pg.3848]

J. Berkowitz, Photoabsorption, Photoionization and Photoeiectron Spectroscopy , Academic press. New York, 1979. [Pg.3848]

D. Briggs, editor. Handbook of X-ray and Ultraviolet Photoeiectron Spectroscopy (H den, London, 1977). [Pg.94]

Angle resolved ultraviolet photoeiectron spectroscopy (ARUPS) also known as angle resolved photoeiectron spectroscopy (ARPES)... [Pg.4592]

Spin polarized ultraviolet photoeiectron spectroscopy (SPUPUS)... [Pg.4592]

See also Microscopy Techniques Atomic Force and Scanning Tunneiing Microscopy. Surface Ana-iysis X-Ray Photoeiectron Spectroscopy Auger Eiec-tron Spectroscopy ion Scattering. X-Ray Absorption and Diffraction X-Ray Absorption. X-Ray Fiuorescence and Emission X-Ray Diffraction - Singie Crystai. [Pg.4701]

However, small shifts in the energy of the core eiectrons due to bonding can be measured by x-ray photoeiectron spectroscopy (page 305). [Pg.403]

Many-Electron Spatial Wavefunctions 157 TOOLS OF THE TRADE Photoeiectron Spectroscopy 163 Approximate Solution to the Schrodinger Equation 164 BIOSKETCH Syivia Ceyer 179 Spin Wavefunctions and Symmetrization 179 Vector Model of the Many-Electron Atom 186 Periodicity of the Elements 190 Atomic Structure The Key to Chemistry 191... [Pg.590]

Surface/interface chemistry X-ray photoeiectron spectres copy (XPS, ESCA) Auger eiectron spectroscopy (AES) Secondary ion mass spectros copy (SiMS) Rutherford backscattering spectrometry (RBS) Uitravioiet photoeiectron spectroscopy (UPS) infrared (iR) spectroscopy Raman spectroscopy... [Pg.155]

Figure 2 Photoionization mass spectrum of xenon between the 2P3/2 (ground) and (excited) ionic states, displaying sharp s like and broad d -like resonances. Reproduced with permission of Academic Press from Berkowitz J (1979) Photoabsorption, Photoionization, and Photoeiectron Spectroscopy, Chapter VI. Figure 2 Photoionization mass spectrum of xenon between the 2P3/2 (ground) and (excited) ionic states, displaying sharp s like and broad d -like resonances. Reproduced with permission of Academic Press from Berkowitz J (1979) Photoabsorption, Photoionization, and Photoeiectron Spectroscopy, Chapter VI.
RBS, Rutherford backscattering spectroscopy XPS, X-ray photoeiectron spectroscopy TOF-SIMS, time of fiight secondary ion mass spectrometry Vibrationai spectroscopies include Infrared techniques such as FTIR and Raman spectroscopy SEM/EDS, scanning electron microscopy with energy dispersive X-ray emission spectroscopy PIXE, particle-induced X-ray emission spectroscopy. [Pg.174]

Spectroscopic Databases and Standardization for Auger-Electron Spectroscopy and X-Ray Photoeiectron Spectroscopy... [Pg.215]

Surface and interface science are critical in efforts to understand fundamental behavior and to develop new materials, processes, and products for many advanced technologies. Surface and interface properties such as reactivity (or stabihty) and catalysis in different environments, thin-fUm growth (and stability), mechanical properties, electrical properties, magnetic properties, and optical properties often need to be measured as a function of one or more processing variables. In almost aU cases, it is also necessary to determine concurrently the chemical composition of the surface or interface of interest As indicated later in this section, the two most commonly used techniques for this purpose are Auger-electron spectroscopy (AES) and X-ray photoeiectron spectroscopy (XPS). This statement is also supported by the number of publications in which these techniques were utihzed [1]. [Pg.215]


See other pages where Spectroscopy photoeiectron is mentioned: [Pg.173]    [Pg.177]    [Pg.1912]    [Pg.451]    [Pg.785]    [Pg.177]    [Pg.141]    [Pg.94]    [Pg.716]    [Pg.82]   
See also in sourсe #XX -- [ Pg.51 ]

See also in sourсe #XX -- [ Pg.46 ]

See also in sourсe #XX -- [ Pg.11 , Pg.23 ]




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