Thermal decomposition, metal

LEAD FLUOROBORATE (13814-96-5) Pb (BF4)2 Decomposes in water or acids, forming ionic lead and fluoboric acid solution. Aqueous solution incompatible with sulfuric acid, alkalis, ammonia, aliphatic amines, alkanolamines, alkylene oxides, amides, epichlorohydrin, organic anhydrides, isocyanates, nitromethane, vinyl acetate. Corrodes aluminum and most other metals. Thermal decomposition releases lead fumes and hydrogen fluoride gas. On small fires. 

SODIUM BICARBONATE (497-19-8) CHNaOj Noncombustible solid. Aqueous solution is a strong base. Violent reaction with acids evolving carbon dioxide. Violent reaction with finely divided aluminum, fluorine, lithium. Incompatible with organic anhydrides, acrylates, alcohols, aldehydes, alkylene oxides, substituted allyls, cellulose nitrate, cresols, caprolactam solution, epichlorohydrin, ethylene dichloride, isocyanates, ketones, glycols, nitrates, phenols, phosphorus pentoxide, 2,4,6-trinitrotoluene. Forms explosive material with 2,4,5-trinitrotoluene and increases the thermal sensitivity of 2,4,6-trinitrotoluene (TNT) by decreasing the tenqjerature of explosion from 566°F/297°C to 424°F/218°C. Attacks metals. Thermal decomposition at 228°F/109°C, releasing oxides of carbon. 

Currently, numerous procedures for the preparation of nanocomposite materials are available. Recently, the major synthetic approaches (e.g., evaporation of elemental metal with its deposition on polymeric matrices, plasma-induced polymerisation, vacuum evaporation of metals, thermal decompositions of precursors in the presence of polymers, and reduction of metal ions using different procedures including electrochemical) have been surveyed in books and reviews. However, the uniform distribution of ingredients is generally difficult to achieve when hybrid nanocomposites are prepared with the use of the above-mentioned procedures resulting in the nonuniformity of the properties of the material. The following three principal procedures are most commonly employed ... 

Currently, numerous procedures for the preparation of polymer nanocomposites have been proposed, using the following approaches (i) direct incorporation of nanoscale building blocks into a polymer melt or solution, (ii) in situ generation of nanoscale building blocks in a polymer matrix e.g., vacuum evaporation of metals, thermal decomposition of precursors, reduction of metal ions through an electrochemical procediffe, (iii) polymerization of monomers in the... 

Oxygen can also be prepared by the thermal decomposition of certain solid compounds containing it. These include oxides of the more noble metals, for example of mercury or silver ... 

Ruthenium is a hard, white metal and has four crystal modifications. It does not tarnish at room temperatures, but oxidizes explosively. It is attacked by halogens, hydroxides, etc. Ruthenium can be plated by electrodeposition or by thermal decomposition methods. The metal is one of the most effective hardeners for platinum and palladium, and is alloyed with these metals to make electrical contacts for severe wear resistance. A ruthenium-molybdenum alloy is said to be... 

Uranium can be prepared by reducing uranium halides with alkali or alkaline earth metals or by reducing uranium oxides by calcium, aluminum, or carbon at high temperatures. The metal can also be produced by electrolysis of KUF5 or UF4, dissolved in a molten mixture of CaCl2 and NaCl. High-purity uranium can be prepared by the thermal decomposition of uranium halides on a hot filament. 

Germane is used primarily to produce high purity germanium metal or epitaxial deposits of germanium on substrates for electronics by thermal decomposition at about 350°C (see Germaniumand germanium compounds). 

Direct splitting requires temperatures above 977°C. Yields of around 30% at 1127°C are possible by equiUbrium. The use of catalysts to promote the reaction can lower the temperature to around the 327—727°C range. A number of transition metal sulfides and disulfides are being studied as potential catalysts (185). Thermal decomposition of H2S at 1130°C over a Pt—Co catalyst with about 25% H2 recovery has been studied. 

In addition to ready thermal decomposition, 1,2-dioxetanes are also rapidly decomposed by transition metals (39), amines, and electron-donor olefins (10). However, these catalytic reactions are not chemiluminescent as determined by the temperature drop kinetic method. 

Miscellaneous. Electron beams can be used to decompose a gas such as silver chloride and simultaneously deposit silver metal. An older technique is the thermal decomposition of volatile and extremely toxic gases such as nickel carbonyl [13463-39-3] Ni(CO)4, to form dense deposits or dendritic coatings by modification of coating parameters. 

Metal Catalysis. Aqueous solutions of amine oxides are unstable in the presence of mild steel and thermal decomposition to secondary amines and aldehydes under acidic conditions occurs (24,25). The reaction proceeds by a free-radical mechanism (26). The decomposition is also cataly2ed by V(III) and Cu(I). 

Rhenium Halides and Halide Complexes. Rhenium reacts with chlorine at ca 600°C to produce rheniumpentachloride [39368-69-9], Re2Cl2Q, a volatile species that is dimeric via bridging hahde groups. Rhenium reacts with elemental bromine in a similar fashion, but the metal is unreactive toward iodine. The compounds ReCl, ReBr [36753-03-4], and Rel [59301-47-2] can be prepared by careful evaporation of a solution of HReO and HX. Substantiation in a modem laboratory would be desirable. Lower oxidation state hahdes (Re X ) are also prepared from the pentavalent or tetravalent compounds by thermal decomposition or chemical reduction. 

The thermal decomposition of silanes in the presence of hydrogen into siUcon for production of ultrapure, semiconductor-grade siUcon has become an important art, known as the Siemens process (13). A variety of process parameters, which usually include the introduction of hydrogen, have been studied. Silane can be used to deposit siUcon at temperatures below 1000°C (14). Dichlorosilane deposits siUcon at 1000—1150°C (15,16). Ttichlorosilane has been reported as a source for siUcon deposition at >1150° C (17). Tribromosilane is ordinarily a source for siUcon deposition at 600—800°C (18). Thin-film deposition of siUcon metal from silane and disilane takes place at temperatures as low as 640°C, but results in amorphous hydrogenated siUcon (19). 

The reaction of higher alkyl chlorides with tin metal at 235°C is not practical because of the thermal decomposition which occurs before the products can be removed from the reaction zone. The reaction temperature necessary for the formation of dimethyl tin dichloride can be lowered considerably by the use of certain catalysts. Quaternary ammonium and phosphonium iodides allow the reaction to proceed in good yield at 150—160°C (109). An improvement in the process involves the use of amine—stannic chloride complexes or mixtures of stannic chloride and a quaternary ammonium or phosphonium compound (110). Use of these catalysts is claimed to yield dimethyl tin dichloride containing less than 0.1 wt % trimethyl tin chloride. Catalyzed direct reactions under pressure are used commercially to manufacture dimethyl tin dichloride. 

The heavy metal salts, ia contrast to the alkah metal salts, have lower melting points and are more soluble ia organic solvents, eg, methylene chloride, chloroform, tetrahydrofiiran, and benzene. They are slightly soluble ia water, alcohol, ahphatic hydrocarbons, and ethyl ether (18). Their thermal decompositions have been extensively studied by dta and tga (thermal gravimetric analysis) methods. They decompose to the metal sulfides and gaseous products, which are primarily carbonyl sulfide and carbon disulfide ia varying ratios. In some cases, the dialkyl xanthate forms. Solvent extraction studies of a large number of elements as their xanthate salts have been reported (19). 

Semiconductor and Solar Cells. High purity (up to 99.9%) antimony has a limited but important appHcation in the manufacture of semiconductor devices (see Semiconductors). It may be obtained by reduction of a chemically purified antimony compound with a high purity gaseous or soHd reductant, or by thermal decomposition of stibine. The reduced metal may be further purified by pyrometaHurgical and zone melting techniques. 

Future Methods. A by-product stream containing 60—80% PEA can be obtained from the catalytic air oxidation of ethylbenzene [100-41-4] (100). Perfumery-grade material can be isolated from this stream by complexing the PEA with a metal haUde (such as CaCl2), separation of the adduct, and thermal decomposition followed by distillation. 

Bismuth trioxide may be prepared by the following methods (/) the oxidation of bismuth metal by oxygen at temperatures between 750 and 800°C (2) the thermal decomposition of compounds such as the basic carbonate, the carbonate, or the nitrate (700—800°C) (J) precipitation of hydrated bismuth trioxide upon addition of an alkah metal hydroxide to a solution of a bismuth salt and removal of the water by ignition. The gelatinous precipitate initially formed becomes crystalline on standing it has been represented by the formula Bi(OH)2 and called bismuth hydroxide [10361 -43-0]. However, no definite compound has been isolated. 

CH2CN)4Yb[( J.-H)2BH]2, and (CgH N)4Yb[( J.-H)2BH4]2 have been stmcturally characterized by x-ray crystallography and shown to contain ytterbium to boron hydride Yb—H—B linkages. Thermal decomposition of lanthanaboranes can be used to generate lanthanide metal borides. 

Easily decomposed, volatile metal carbonyls have been used in metal deposition reactions where heating forms the metal and carbon monoxide. Other products such as metal carbides and carbon may also form, depending on the conditions. The commercially important Mond process depends on the thermal decomposition of Ni(CO)4 to form high purity nickel. In a typical vapor deposition process, a purified inert carrier gas is passed over a metal carbonyl containing the metal to be deposited. The carbonyl is volatilized, with or without heat, and carried over a heated substrate. The carbonyl is decomposed and the metal deposited on the substrate. A number of papers have appeared concerning vapor deposition techniques and uses (170—179). 

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