Layers epitaxial organic

CavaUini M, Facchini M, Albonetti C, Biscarini F, Innocent M, Loglio F, Salvietti E, Pezzatini G, Forest ML (2007) Two-dimensional self-organization of CdS ultra thin films by confined electrochemical atomic layer epitaxy growth. J Phys Chem C Lett 111 1061-1064... 

There are numerous materials, both metallic and ceramic, that are produced via CVD processes, including some exciting new applications such as CVD diamond, but they all involve deposition on some substrate, making them fundamentally composite materials. There are equally numerous modifications to the basic CVD processes, leading to such exotic-sounding processes as vapor-phase epitaxy (VPE), atomic-layer epitaxy (ALE), chemical-beam epitaxy (CBE), plasma-enhanced CVD (PECVD), laser-assisted CVD (LACVD), and metal-organic compound CVD (MOCVD). We will discuss the specifics of CVD processing equipment and more CVD materials in Chapter 7. 

The preparation method of the thin layers and the electroluminescent materials available are reviewed in Ref. [28J. Among the teehniques used are sputtering, vacuum evaporation, metal-organic chemical-vapor deposition (MOCVD) and atomic layer epitaxy (ALE). 

The conventional CVD method uses thermal energy to activate chemical reactimis, which is commonly known as thermally activated CVD (TACVD). CVD reactions can be initiated by using different energy sources. Plasma and light energy are currently being used to activate the chemical reactions. Other types of CVD include atomic layer epitaxy, metal-organic CVD, flame-assisted CVD, and electrochemical vapor deposition. They are briefly discussed herewith [1,5]. 

Atomic layer deposition (ALD), originally termed atomic layer epitaxy, was pioneered and patented by T. Suntola and coworkers for growing ZnS (Suntola and Antson, 1977). Initial motivation for the development of ALD came from thin film electroluminescent displays. After extensive research advances in the past 40 years, ALD, which allows deposition at the atomic or molecular level, can be used for a variety of thin films such as metal oxides and nitrides, polymers, and inorganic—organic... 

CCVD combustion chemical vapor deposition MOCVD mettil-organic-assisted CVD PECVD plasma-enhanced CVD FACVD flame-assisted CVD AACVD aerosol-assisted CVD ESAVD electrostatic-atomization CVD LPCVD low-pressure CVD APCVD atmospheric-pressure CVD PACVD photo-assisted CVD TACVD thermtil-activated CVD EVD electrochemical vapor deposition RTCVD rapid thermal CVD UHVCVD ultrahigh-vacuum CVD ALE atomic-layer epitaxy PICVD pulsed-injection CVD... 

In the new method for organic multilayers deposition, molecular layer epitaxy (MLE), the epitaxial growth is achieved by self-limited vapor-phase reactions on a templated surface. As in ALE method, MLE is governed by covalent bonding at the intermolecular level that leads to ideal monomolecular growth. The chemical principles of the MLE method can be divided into four levels (i) a template layer, (ii) self-restricted vapor phase reactions, (Hi) covalent ( c-axis ) interlayer bonding and (iv) 7C-stacking in x-y plane. 

Recent applications of e-beam and HF-plasma SNMS have been published in the following areas aerosol particles [3.77], X-ray mirrors [3.78, 3.79], ceramics and hard coatings [3.80-3.84], glasses [3.85], interface reactions [3.86], ion implantations [3.87], molecular beam epitaxy (MBE) layers [3.88], multilayer systems [3.89], ohmic contacts [3.90], organic additives [3.91], perovskite-type and superconducting layers [3.92], steel [3.93, 3.94], surface deposition [3.95], sub-surface diffusion [3.96], sensors [3.97-3.99], soil [3.100], and thermal barrier coatings [3.101]. 

Alaboson, J.M.P., et ah, Seeding atomic layer deposition of high-kdielectrics on epitaxial graphene with organic self-assembled monolayers. ACS Nano, 2011. 5(6) p. 5223-5232. 

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