Molecular deposition

An additional and very attractive aspect of molecular qubits is the fact that they are stable in solution, and that the ligand shell can be functionalized with specific chemical groups. In recent years, this has enabled depositing molecular clusters onto different substrates and grafting them to nanostructures or devices, such as carbon nanotube single electron transistors or point contacts [112]. These devices... 

Chemical Vapor Deposition Electrochemical Deposition Molecular Beam Epitaxy Atomic Layer Deposition Thermal Oxidation Spin Coating... 

Comparing the calculated and theoretical values for molecular weight, we found that there is a very good match for G5 to G8, but not for G9 and G10. The discrepancy for G9 and G10 are probably due to a breakdown of the assumption that the deposited molecular shape is that of a spherical cap (see Figure 12.18). 

ZnO thin films can be prepared by a variety of techniques such as magnetron sputtering, chemical vapor deposition, pulsed-laser deposition, molecular beam epitaxy, spray-pyrolysis, and (electro-)chemical deposition [24,74]. In this book, sputtering (Chap. 5), chemical vapor deposition (Chap. 6), and pulsed-laser deposition (Chap. 7) are described in detail, since these methods lead to the best ZnO films concerning high conductivity and transparency. The first two methods allow also large area depositions making them the industrially most advanced deposition techniques for ZnO. ZnO films easily crystallize, which is different for instance compared with ITO films that can... 

Table 6 Prefactor Mobilities for a Series of Vapor-Deposited Molecular Glasses...

It is of some interest to consider the situation where one of the ideahzed 2D systems that have been addressed can be followed in a layer-by-layer growth mode from a strictly 2D plane to one that is more 3D like. Such is the situation in the formation of multilayer molecular films adsorbed to uniform substrates or where epitaxial metal or soft matter growth is realized in chemical vapor deposition, molecular beam epitaxy or polymeric deposition systems. The hneshape discussion above has to be modified to account for the development of the third dimension of order in the system. Conceptually this is rather straightforward. Instead of considering, as Warren did, an ideal 2D reciprocal lattice composed of an ordered array of uniform rods, the reciprocal lattice for an idealized multilayer (e.g., two to five individual layers) system is characterized by... 

Modifications of LB films, whether caused by the SPM probe or by some other external force, are easily characterized and can provide insight into film structure and -dynamics. With an AFM tip under high force it is possible to maike holes in an LB film. From the image of the hole the thickness per monolayer and number of monolayers can be determined. Virtanen et al. ) induced defect pores in bllayers of stearic acid and cadmium stearate by the application of electric pulses between an STM tip and film surface. Real-time STM images measuring the rates at which these pores refill , provide a means of determining the viscosity of nanometer-scale regions of deposited molecular films. 

Changes in solid surfaces occur either during the formation of a new phase as in vapor deposition, molecular beam epitaxis, chemical vapor deposition and metal electrodeposition, or during a phase disappearance as is the case of metallic corrosion and material erosion. Similar changes occur in roughness relaxation, a process which plays a relevant role in establishing, for instance, the lifetime of solid catalysts. 

Silica can be deposited molecularly from supersaturated aqueous solution. Supersaturation can be brought about by one of the following processes ... 

On the other hand, when silica is deposited molecularly, the resulting solid silica contains little or no adsorbed water and few internal silanol groups. It is very similar. to vitreous silica or fused quartz, as it is commonly but erroneously called. 

Recently, an evaporation deposition technique was employed for preparation of thin films, because it can maintain deposition conditions in a vacuum in the course of deposition. Therefore high-quality thin films can be obtained. Physical vapor deposition techniques include mainly vacuum evaporation, sputtering deposition ion-assisted deposition, molecular beam epitaxy (MBE), and ICB deposition. Table 1 shows characteristics of these deposition methods. 

Figure 6 (a) (Top) Aligned nanoelectrode arrays suitable for depositing molecular switches and crossbar arrays of nanoelectrodes... 

In this contribution we introduce a new method for oiganic multilayered heterostructures deposition. Molecular Layer Epitaxy (MLE), that in a sense is widering the... 

In the new method for organic multilayers deposition, molecular layer epitaxy (MLE), the epitaxial growth is achieved by self-limited vapor-phase reactions on a templated surface. As in ALE method, MLE is governed by covalent bonding at the intermolecular level that leads to ideal monomolecular growth. The chemical principles of the MLE method can be divided into four levels (i) a template layer, (ii) self-restricted vapor phase reactions, (Hi) covalent ( c-axis ) interlayer bonding and (iv) 7C-stacking in x-y plane. 

Borsenberger, P. M., Detty, M. R., and Magin, E. H., Electron transport in vapor deposited molecular glasses, Phys. Status Solidi B, 185, 465, 1994. 

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