Nitrides carbon

Quite clearly the semi-empirical procedure is very dependent upon the choice of parameters, although it has been possible to obtain sensible parameters from fixed systems. The shortcoming with the approach is that the parameters may not be transferable to other (especially unknown) situations. At the same time once a reh-able potential is obtained there are many excellent molecular dynamics algorithms available to compute the subsequent motion of the system quite efficiently and with low computer cost. [Pg.257]

Stick-kohlenstoff, m. carbon nitride, -luft, /. close air nitrogen, -oiyd, n. nitric oxide, -oiydentbindung, /. liberation of nitric oxide, -oxydul, n. nitrous oxide, dinitrogen oxide, -stoff, m. nitrogen. [Pg.428]

Carbon nitrides are another kind of coating material, on which much attention was paid in the past 20 years. Carbon nitride is practically a material first worked out by calcula-... [Pg.147]

Up to the present, a number of conventional film preparation methods like PVD, CVD, electro-chemical deposition, etc., have been reported to be used in synthesis of CNx films. Muhl et al. [57] reviewed the works performed worldwide, before the year 1998, on the methods and results of preparing carbon nitride hlms. They divided the preparation techniques into several sections including atmospheric-pressure chemical processes, ion-beam deposition, laser techniques, chemical vapor deposition, and reactive sputtering [57]. The methods used in succeeding research work basically did not... [Pg.152]

The research work on carbon nitride materials was first motivated due to its hypothetical super-hardness. The tribological properties of the CNx films are, of course, the emphasis of the succeeding research works. Although the expected structure and hardness have not been achieved up to the present, the potential interesting properties still stimulate many approaches on the tribological behavior of CNx films. Figure 8 gives the results of hardness measurement reported by the... [Pg.152]

Cutiongco, E. C., Li, D., and Chung, Y. W., "Tribological Behavior of Amorphous Carbon Nitride Overcoats for Magnetic Thin-film Rigid Disks, 7. Tribol., Vol. 118, 1996, pp. 543-548. [Pg.163]

Aixiang Wei, DUm Chen, Ning Ke, Shaoqi Peng, S. P. Wong, Characteristics of Carbon Nitride Eilms Prepared by Magnetic Filtered Plasma Stream, Thin Solid Films, Vol. 323, No. 1-2,1998,pp.217-221. [Pg.163]

McCuUoch, D. G. and Merchant, A. R., The Effect of Annealing on the Structure of Cathodic Arc Deposited Amorphous Carbon Nitride Films, Thin Solid Films, Vol. 290, 1996, pp. 99-102. [Pg.163]

Ming, Y. and Kramer, D. J., Properties of Carbon Nitride Films Deposited With and Without Electron Resonance Plasma Assistance, Thin Solid Films, Vol. 382, 2001, pp. 4-12. [Pg.164]

Wang, X., Martin, P. J., and Kinder, T. J., Optical and Mechanical Properties of Carbon Nitride Films Prepared by Ion-Assisted Arc Deposition and Magnetron Sputtering, Thin SolidFilms, o. 256, Ho. 1-2,1995,pp. 148-154. [Pg.164]

Popov, C., Zambov, L. M., Plass, M. R, and Kulisch, W., Optical, Electrical and Mechanical Properties of Nitrogen-rich Carbon Nitride Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition," Thin Solid Films, Vol. 377-378,2000, pp. 156-162. [Pg.164]

Mingwu, Bai, Koji, Kato, Noritsugu, Umehara, Yoshihiko, Miyake, Xu, Junguo, and Hiromitsu, Tokisue, "Dependence of Microstructure and Nanomechanical Properties of Amorphous Carbon Nitride Thin Films on Vacuum Annealing, Thin SoZ/dFz Zms, Vol. 376,2000, pp. 170-178. [Pg.164]

Czyzniewski, A., Precht, W., Pancielejko, M., Myslinski, P., and Walkowiak, W., Structure, Composition and Tribological Properties of Carbon Nitride Films," Thin Solid Films, Vol. 317, No. 1-2,1998, pp. 384-387. [Pg.164]

Toshiyuki, Hayashi, Akihito, Matsumuro, Mutsuo, Mura-matsu, Masao, Kohzaki, and Katsumi, Yamaguchi, "Wear Resistance of Carbon Nitride Thin Films Formed by Ion Beam Assisted Deposition," Thin Solid Films, Vol. 376, No. 1-2, 2000,pp. 152-158. [Pg.164]

Husein, F., Imad, Zhou, YuanZhong, Li, Fan, Ryne, C., AUen, Chung Chan, Jacob, I., Kleiman, Yu, Gudimenko, and Clark, V, Cooper, Synthesis of Carbon Nitride Thin Film by Vacuum Arcs, Mater. Sci. Eng., A, Vol. 209,1996, pp. 10-15. [Pg.164]

Tessier, P. Y., Pichon, L., VUlechaise, P, Linez, P., Angleraud, B., MubumbUa, N., Fouquet, V, Straboni, A., Milhet, X., and Hildebrand, H. F., Carbon Nitride Thin Films as Protective Coatings for Biomaterials Synthesis, Mechanical and Biocompatibility Characterizations, Diamond Relat. Mater, Vol. 12,2003,pp. 1066-1069. [Pg.164]

Miyake, S., Tribology of Carbon Nitride and Boron Nitride Nanoperiod Multilayer Films and Its Application to Nanoscale Processing," Thin Solid Films,Wo. 493,2005, pp. 160-169. [Pg.165]

The work on carbon nitride solids is strongly related to research on diamondlike carbon (DLC) materials [5, 6]. DLC materials are thin film amorphous metastable carbon-based solids, pure or alloyed with hydrogen, which have properties similar to that of crystalline diamond (high hardness, low friction coefficient, high resistance to wear and chemical attack). This resemblance to diamond is due to the DLC structure, which is characterized by a high fraction of highly cross-linked sp -hybridized carbon atoms. To obtain this diamond-like structure... [Pg.217]

Research on plasma-deposited a-C(N) H films has been frequently included in the general discussion of carbon nitride solids [2, 3]. However, the presence of hydrogen in its composition, and the complexity of the deposition process, which introduces the nitrogen species in the already intricate hydrocarbon plasma-deposition mechanism, make a-C(N) H films deserve special consideration. This is the aim of the present work to review and to discuss the main results on the growth, structure, and properties of plasma-deposited a-C(N) H films. As this subject is closely related to a-C H films, a summary of the main aspects relative to the plasma deposition of a-C H films, their structure, and the relationship between the main process parameters governing film structure and properties is presented... [Pg.218]

A. Y. Liu and M. L. Cohen, Structural Properties and Electronic Structure of Low-Compressibility Materials P-silicon Nitride and Hypothetical Carbon Nitride (P-C3N4), Phys. Rev. B, 41(15), 10727-34 (1990). [Pg.10]

C-M. Sung and M. Sung, Carbon Nitride and Other Speculative Superhard Materials , Mater. Chem Phys., 43,1 (1996). [Pg.201]

Applications of quantum mechanical methods Carbon nitride... [Pg.367]

Carbonitride alloys, quaternary, 17 218. See also Carbonitrides Carbon nitride entries... [Pg.142]

Carbon nitride, 27 214—215 conductivity of, 2 7 204-206 field emission properties of, 27 221 theoretical band structure calculations for, 27 203-204 Carbon nitride films, 2 7 205 Carbon nitride solids, 2 7 203 Carbonochloridic esters, 6 290 Carbon paper, 4 738-739 Carbon profile, in gas carburizing, 26 204 Carbon Raschig-ring tower packing, 22 745 Carbon reduction, of ferrovanadium, 25 518... [Pg.143]

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