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Contamination defects

Diagnosing and eliminating a problem that occurs due to an improperly operating extruder can be difficult and time consuming. This section contains several case studies where improperly designed processes created contamination defects in the final articles. The axial pressure profiles of the metering channels for these case studies and other studies in the next chapters were calculated using the method described in Section 9.2.1. The simulated axial pressure profiles are shown with solid lines while the estimated pressure profiles are shown by dashed lines. [Pg.501]

Many of the contamination defects that typically occur in extrusion processes can also occur in injection-molded parts. The most obvious defects are caused by foreign material contamination, resin degradation, and surface defects known as splay. The next sections provide case studies where contamination caused defects in injection-molded parts. [Pg.513]

As a fine example of the actual measurement of a parameter matrix asymmetry, we cite the collaborative effort,132 which reported the quantitative measurement via ENDOR of superhyperfine splittings attributed to neighbours of oxygen O contaminative defects (with S = l/2) in x-irradiated BaFBr single-crystals. Here g is anisotropic, and the local symmetry is C2h- While g was taken to be symmetric, the matrix A(19F) required to fit the line-position data was found to be highly asymmetric. ENDOR of course measures NMR transitions by using EPR spectroscopy. [Pg.22]

In literature it s possible find several examples of apvplications of spectroscopac image analysis. Hyperspectral imaging could be used as critical control points of food processing to inspect for potential contaminants, defects or lesions. Their absence is essential for ensuring food quality and safety. In some case the application on-line was achieved. [Pg.240]

In the last process step, fine particles are removed by the microfiltration unit. In the manufacture of highly integrated electronic devices, particles from the solvents used in these processes must be removed to improve product yields and suppress wafer contamination defects. For example, particles with >0.05-pm diameter should be removed to the extent of less than 10 particles per milliliter from solvents used in 16-Mbit level production lines [247]. Accordingly, the level of the microfiltration unit affects total system performance therefore, the unit should be equipped with an appropriate filtration membrane, although only a few membranes with sufficient performance are available [248]. In the solvent a very low level of dissolved metals and low total organic carbon (TOC) is desired. Moreover, high chemical resistance of the filtration membrane is also needed. [Pg.154]

Finally, it should be noted that stability, contaminants, defects, and the metal substrate used are the crucial points to be considered when some kind of molecular architecture or device is built using SAMs as structural functional elements. Temperature, solvent, pH, oxidizing conditions, side reaction products, exposure to the atmosphere and light. [Pg.2773]

Short circuit of the machines to keep clean the headbox and the formation area that will avoid paper contamination, defects in the process and breaks on the machines. [Pg.385]

The application of Raman spectroscopy to the study of semiconductors is an area of interest with a long history from the perspective of both QC and failure analysis. The general applicability of Raman spectroscopy to semiconductors is covered in depth in Chapter 12 and has been the subject of a number of articles and reviews [154-157]. During the last 10 years, the opportunity to move beyond the research Raman microscopes for materials research to Raman analyzers for QC analysis has been explored. Some of the major areas of interest from a quality control/failure analysis standpoint are contamination, defect identification, materials characterization, and strain mapping at interfaces (between components and between silicon and attached circuitry). [Pg.969]

The laser-based methods discussed thus far can be used to probe surface and interstitial contaminants as well as for the direct determination of additives in a complex matrix. It is now common to have a CCD camera and video display that gives a microscopic view of the sample when it is in the mass spectrometer. This allows contaminants, defects, and areas of interest to be observed and manipulated while under the probing beW of the laser (25). A number of industrial examples have I ved that direct Laser Probe FT/MS analyses can rapidly determine many additives directly, even when the combination of laborious classical wet chemical techniques with other modem instrumental methods have proved difficult and time consuming. [Pg.68]

Surface defects (Section VII-4C) are also influenced by the history of the sample. Such imperfections may to some extent be reversibly affected by processes such as adsorption so that it is not safe to regard even a refractory solid as having fixed surface actions. Finally, solid surfaces are very easily contaminated detection of contamination is aided by ultra-high-vacuum techniques and associated cleaning protocols [24]. [Pg.259]

Lea.dAnodes. A principal use for lead—calcium—tin alloys is lead anodes for electrowinning. The lead—calcium anodes form a hard, adherent lead dioxide layer during use, resist corrosion, and gready reduce lead contamination of the cathode. Anodes produced from cast lead—calcium (0.03—0.09 wt %) alloys have a tendency to warp owing to low mechanical strength and casting defects. [Pg.60]

Nondestmctive testing (qv) can iaclude any test that does not damage the plastic piece beyond its iatended use, such as visual and, ia some cases, mechanical tests. However, the term is normally used to describe x-ray, auclear source, ultrasonics, atomic emission, as well as some optical and infrared techniques for polymers. Nondestmctive testing is used to determine cracks, voids, inclusions, delamination, contamination, lack of cure, anisotropy, residual stresses, and defective bonds or welds in materials. [Pg.156]

Although vitreous siUca is a simple, single-component glass, its properties can vary significantly, depending on thermal history, the type and concentration of defects, and impurities. Vitreous siUca can, however, be one of the purest commercially available glassy materials. In synthetic vitreous sihcas, for example, total metal contamination is typically measured ia the 50—100 ppb range. Even at such a low level of impurities, differences ia properties, such as uv-transmission, are observed for various siUcas. [Pg.497]

The ultraviolet cutoff or the absorption edge for pure vitreous siUca is 8.1 eV or 153 nm (171). This uv cutoff is influenced by the impurity level and stoichiometry of the material. Several impurities, such as the transition metals (Fe, Cu, Ti, etc) and alkaU metal ions (Na, Li, K), degrade the ultraviolet performance, shifting the uv cutoff to longer wavelengths. Ferric ions (Fe " ) cause absorption or result in network defects under reducing conditions. This contaminant at only a few ppm can be detected as an absorption at 230 nm and below (176). [Pg.507]

Clinical manifestation of vitamin B 2 deficiency is usually a result of absence of the gastric absorptive (intrinsic) factor. Dietary deficiency of vitamin B 2 is uncommon and may take 20 to 30 years to develop, even in healthy adults who foUow a strict vegetarian regimen. An effective enterohepatic recycling of the vitamin plus small amounts from bacterial sources and other contaminants greatly minimizes the risk of a complete dietary deficiency. Individuals who have a defect in vitamin B 2 absorption, however, may develop a deficiency within three to seven years. [Pg.112]

In addition, all of the process raw materials must be clean and not iatroduce contaminants. The raw materials and temporary coatings must also be defect-free, and these have to be manufactured under similar conditions so that no contaminants are iatroduced. The solvents used to clean the substrate and develop the resists must be filtered and pure. Care must also be taken to ensure that no trace compounds or elements are present that may affect the electronic properties. The specific type of coating aid, the type of functional coating, and the process used to apply the functional coating are all widely varied ia actual practice. [Pg.124]

Metal Preparation. Sheet-steel parts are formed by stamping, bending, and shearing. Many parts require welding (qv), which needs to be carried out in a uniform, smooth manner so that the welded joint can be enameled without defects. Cast-iron parts are formed by the usual cast-iron foundry methods however, additional care is given to prevent contamination of the surface. Surface contamination causes defects in the enamel, particularly bUsters and bubbles. Aluminum metal can be formed in sheets, extmsions, and as castings. [Pg.212]


See other pages where Contamination defects is mentioned: [Pg.608]    [Pg.298]    [Pg.79]    [Pg.344]    [Pg.2936]    [Pg.138]    [Pg.171]    [Pg.696]    [Pg.1784]    [Pg.566]    [Pg.608]    [Pg.298]    [Pg.79]    [Pg.344]    [Pg.2936]    [Pg.138]    [Pg.171]    [Pg.696]    [Pg.1784]    [Pg.566]    [Pg.928]    [Pg.117]    [Pg.207]    [Pg.310]    [Pg.310]    [Pg.374]    [Pg.201]    [Pg.346]    [Pg.569]    [Pg.343]    [Pg.498]    [Pg.366]    [Pg.4]    [Pg.6]    [Pg.346]    [Pg.146]    [Pg.123]    [Pg.125]    [Pg.217]    [Pg.2424]   
See also in sourсe #XX -- [ Pg.477 , Pg.498 , Pg.501 , Pg.513 , Pg.521 ]




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