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Coating deposition techniques methods

However, the most frequent way to obtain a CIME consists in the formatiOTi of a film coating. Different deposition procedures can be followed depending oti the thickness required. Among others, evaporation of the solvent from a clay aqueous suspension is the simplest and most widely used method for film thickness ranging from a few hundreds of nanometers to several micrometers. In order to obtain a more homogeneous, reproducible, and thinner film, a spin coating deposition technique is also adopted. Due to the poor stability of clay films obtained by these methods, alternative approaches imply the entrapment of clay particles into polymeric membranes [39—41], epoxy resin [40], or sol-gel structure [42]. [Pg.191]

Yu et al. [139] developed a dry-deposition technique for coating the MPL onto a diffusion layer. This method consisted of forcing a mixture of carbon and PTFE powder through a mesh with the help of a vacuum pump located underneath the DL material. Once the mixture passed through the mesh, it was deposited on the surface of fhe substrate (still with the help of the vacuum pump). After this, the DL, with the MPL, was sintered at 350°C in order to melt the PTFL particles and bind all the particles together. Once the thermal stage was completed, the MPL was subjected to a rolling step in order to adjust the total thickness of the layer (MPL and DL). [Pg.237]

Other coating processes involving fluoridated apatite have been investigated to improve the long-term adhesion and promote osteointegration of cementless titanium-based metal implants pulsed laser deposition, electron beam deposition and ion beam sputter deposition techniques, and sol-gel methods, for example. They lead to fluor-containing calcium phosphates (apatites in most cases) with different compositions and crystallinity states. [Pg.313]

In contrast to plasma spraying, low pressure plasma CVD does not require any remote handling technique. However, there is yet no experience with large scale applications of this method, particularly in metallic vessels. This is the first goal towards which future studies have to be directed. Very little is also known about the adherence of the coatings deposited by low pressure plasma CVD and their resistance against thermal shock. The choice of the best material for such coatings is presently open to discussion. [Pg.90]

One of the major attractions for the use of polymer coatings is the wide range of deposition techniques that can be employed to obtain relatively well-defined thin films with thicknesses of the order of microns and less. The methods that have been used include the following ... [Pg.127]

Different methods have been used to deposit microporous thin films, including solgel, pyrolysis, and deposition techniques [20], Porous inorganic membranes are made of alumina, silica, carbon, zeolites, and other materials [8], They are generally prepared by the slip coating method, the ceramic technique, or the solgel method (Section 3.7). In addition, dense membranes are prepared with metals, oxides, and other materials (Chapter 2). [Pg.468]

Because of the sequential nature of atomic layer deposition, it is a slow method for preparing thin films. The sequential nature, however, also produces a film of uniform thickness, referred to as a conformal film. This is important when the surface being coated is not atomically flat, but rather, has troughs and islands to be coated. Some of the most important technological materials, such as silicon and germanium, have not shown themselves to be amenable to the atomic layer deposition technique. This points to the need for continued research in the field of precursor synthesis. [Pg.134]

Numerous methods have been described in the literature for depositing coatings onto piezoelectric acoustic sensors. They generally fall into three categories solvent casting techniques, vacuum deposition techniques, and vapor-phase deposition techniques. [Pg.348]

Ottova et al. looked at two-compartment semiconductor-septum electrochemical photovoltaic cells with cadmium selenide and cadmium selenide telluride for water photolysis [126], They used cells consisting of two chambers separated by a CdSe or CdSe/CdTe bipolar electrode. The bipolar electrodes were prepared by painting a CdSe slurry on a metal substrate or by ultrasound-aided electrodeposition from CdSe solution in ZnCl2. The photoresponse (voltage and current output) and hydrogen yield from photo-induced electrolysis of H20 in the dark chamber of the cell were evaluated as a function of CdSe preparation method. The ultrasound-aided deposition technique gave excellent coatings of CdSe. [Pg.244]

Fig, 10.24. Simplified schematics illustrating some deposition techniques (a) thermal evaporation (b) stamping (c) liquid-solid interface (d) electro-chemistry set-up (e) Langmuir-Blodgett technique (f) electro-spray deposition (g) pulse injection method (h) solution casting (i) spin-coating. [Pg.372]


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