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Dip-coating deposition

Self-assembled monolayers of amphiphilic molecules have been deposited at surfaces since Langmuir and Blodgett developed their dip coating deposition method in 1937.4 These were briefly discussed in Chapter 10 in relation to thiol... [Pg.203]

Figure 8.6 The dip-coating deposition of C-SWCNT solutions on fluorine doped tin oxide (a) A schematic outline of the dip-coating procedure that was used to assemble carboxy-SWNTs. (b) FESEM image of carboxy-SWNTs deposited on to neat fluorine-tin-oxide sample from acetonitrile solution by vertically dip-coating the neat fluorine-tin-oxide in carboxy-SWNT dispersion with a pulling speed of 0.05 mm min (the arrow indicates the pulling direction). Reproduced with permission from Valentini et al ... Figure 8.6 The dip-coating deposition of C-SWCNT solutions on fluorine doped tin oxide (a) A schematic outline of the dip-coating procedure that was used to assemble carboxy-SWNTs. (b) FESEM image of carboxy-SWNTs deposited on to neat fluorine-tin-oxide sample from acetonitrile solution by vertically dip-coating the neat fluorine-tin-oxide in carboxy-SWNT dispersion with a pulling speed of 0.05 mm min (the arrow indicates the pulling direction). Reproduced with permission from Valentini et al ...
Faustini, M., Capobianchi, A., Varvaro, G., and Grosso, D. (2012) Highly controlled dip-coating deposition of fct FePt nanoparticles from layered salt precursor into nanostructured thin films an easy way to tune magnetic and optical properties. Chem, Mater., 24 (6),... [Pg.313]

The preparation procedure, as described by Azzurri et al. (2011), can follow the following subsequent steps (1) oxidation of the porous metal (2) dip-coating deposition of a ceramic barrier layer (3) dip-coating deposition of an activation layer, containing PdCl2 and (4) Pd deposition by electroless plating. [Pg.162]

Solution Deposition of Thin Films. Chemical methods of preparation may also be used for the fabrication of ceramic thin films (qv). MetaHo-organic precursors, notably metal alkoxides (see Alkoxides, metal) and metal carboxylates, are most frequently used for film preparation by sol-gel or metallo-organic decomposition (MOD) solution deposition processes (see Sol-GEL technology). These methods involve dissolution of the precursors in a mutual solvent control of solution characteristics such as viscosity and concentration, film deposition by spin-casting or dip-coating, and heat treatment to remove volatile organic species and induce crystaHhation of the as-deposited amorphous film into the desired stmcture. [Pg.346]

We prepared ceria on Ni substrate by sol-gel coating method. Ceria sol solution was prepared with ceria sol solution (Alfa, 20% in H2O, colloidal dispersion) mixed with ethanol (99.9%, Hayman) with weight ratio (1 2) and stirred. Ceria was deposited on Ni substrate by dip coating method. The variation number of dipping was carried out to obtain different coating ratio. The anode was completely dipped into the ceria sol solution for several seconds and dried at a temperature of 50 C for 24 hours in air atmosphere followed by calcination at 700 C for 30 minutes in 5%H2-N2 atmosphere. [Pg.601]

This is comparable to or slightly higher than the values reported for single crystal (11) and polycrystalline Ti02 (12), and much higher than those for the TiC>2 film electrode prepared by other methods such as chemical vapor deposition (13) and oxidation (14) and anodization (15) of Ti metal. The high efficiency of the dip-coated Ti(>2 film may be attributed to the porous nature of the film as described below. [Pg.351]

The Japanese scientists tested the fiber optic carbon dioxide sensor86, prepared by dip-coating method - the sol-gel film containing indicator dye, thymol blue, was deposited on unclad fiber. The sensitive film had both organic and inorganic parts with good permeability. The differences between attenuation in N2 gas and in CO2/N2 mixture gas increased with the CO2... [Pg.372]

After the precursor stock solution is prepared, various techniques can be used to coat the substrate, depending on the solution viscosity, required film thickness and coverage. The most common methods in the semiconductor industry are spin- and dip-coating. Other processes that are used for deposition include spray coating and stamping. A summary of the uses, limitations, and advantages of the various thin film deposition methods is reported in Table 2.2. [Pg.49]

To experimentally prove the phenomenon of the modal transition and its effects on the sensitivity of nano-coated LPGs to SRI changes, the dip coating, as deposition technique, and the sPS, as HRI material, were used. Here the LPG sensitivity (different for each cladding mode) is defined as the gradient of the wavelength shift of the attenuation bands minima with respect to the SRI (d esj/dSRI). [Pg.57]

The dip-coating method was used to deposit the 8 form sPS layer on the LPG. The optical fiber with the LPG was arranged in the holder and a sPS chloroform... [Pg.66]


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See also in sourсe #XX -- [ Pg.246 ]

See also in sourсe #XX -- [ Pg.246 ]




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