Auger electron spectroscopy analysis technique

See also Surface Analysis Overview X-Ray Photoelectron Spectroscopy Auger Electron Spectroscopy Desorption Techniques Ion Scattering Secondary Ion Mass Spectrometry of Polymers Laser Ionization. 

Auger electron spectroscopy (AES) is a technique used to identify the elemental composition, and in many cases, the chemical bonding of the atoms in the surface region of solid samples. It can be combined with ion-beam sputtering to remove material from the surface and to continue to monitor the composition and chemistry of the remaining surface as this surface moves into the sample. It uses an electron beam as a probe of the sample surface and its output is the energy distribution of the secondary electrons released by the probe beam from the sample, although only the Ai er electron component of the secondaries is used in the analysis. 

Auger electron spectroscopy is the most frequently used surface, thin-film, or interface compositional analysis technique. This is because of its very versatile combination of attributes. It has surface specificity—a sampling depth that varies... 

PIXE detection limits for surface layers on bulk specimens are sufficiendy low to permit calibradon of true surfe.ce analysis techniques (e.g., Auger electron spectroscopy). 

In other articles in this section, a method of analysis is described called Secondary Ion Mass Spectrometry (SIMS), in which material is sputtered from a surface using an ion beam and the minor components that are ejected as positive or negative ions are analyzed by a mass spectrometer. Over the past few years, methods that post-ion-ize the major neutral components ejected from surfaces under ion-beam or laser bombardment have been introduced because of the improved quantitative aspects obtainable by analyzing the major ejected channel. These techniques include SALI, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS), and Sputtered Neutral Mass Spectrometry (SNMS) or electron-gas post-ionization. Post-ionization techniques for surface analysis have received widespread interest because of their increased sensitivity, compared to more traditional surface analysis techniques, such as X-Ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES), and their more reliable quantitation, compared to SIMS. 

Laser ionization mass spectrometry or laser microprobing (LIMS) is a microanalyt-ical technique used to rapidly characterize the elemental and, sometimes, molecular composition of materials. It is based on the ability of short high-power laser pulses (-10 ns) to produce ions from solids. The ions formed in these brief pulses are analyzed using a time-of-flight mass spectrometer. The quasi-simultaneous collection of all ion masses allows the survey analysis of unknown materials. The main applications of LIMS are in failure analysis, where chemical differences between a contaminated sample and a control need to be rapidly assessed. The ability to focus the laser beam to a diameter of approximately 1 mm permits the application of this technique to the characterization of small features, for example, in integrated circuits. The LIMS detection limits for many elements are close to 10 at/cm, which makes this technique considerably more sensitive than other survey microan-alytical techniques, such as Auger Electron Spectroscopy (AES) or Electron Probe Microanalysis (EPMA). Additionally, LIMS can be used to analyze insulating sam-... 

Surface analysis has made enormous contributions to the field of adhesion science. It enabled investigators to probe fundamental aspects of adhesion such as the composition of anodic oxides on metals, the surface composition of polymers that have been pretreated by etching, the nature of reactions occurring at the interface between a primer and a substrate or between a primer and an adhesive, and the orientation of molecules adsorbed onto substrates. Surface analysis has also enabled adhesion scientists to determine the mechanisms responsible for failure of adhesive bonds, especially after exposure to aggressive environments. The objective of this chapter is to review the principals of surface analysis techniques including attenuated total reflection (ATR) and reflection-absorption (RAIR) infrared spectroscopy. X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and secondary ion mass spectrometry (SIMS) and to present examples of the application of each technique to important problems in adhesion science. 

The most widely used techniques for surface analysis are Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS), Raman and infrared spectroscopy, and contact angle measurement. Some of these techniques have the ability to determine the composition of the outermost atomic layers, although each technique possesses its own special advantages and disadvantages. 

As representative techniques of the second group, we discuss two methods x-ray photoelectron spectroscopy (XPS), sometimes referred to as electron spectroscopy for chemical analysis (ESCA) and Auger electron spectroscopy (AES). The main principle of the first method (XPS) is the excitation of electrons in an atom or molecule by x-rays. The resulting electrons carry energy away according to the formula... 

Although not capable of the micrometer-sized lateral resolutions available with the aforementioned techniques, the surface spectroscopy, electron spectroscopy for chemical analysis (ESCA), also deserves mention. The ESCA experiment involves the use of X-rays rather than electrons to eject core electrons (photoelectrons), and it has comparable surface specificity and sensitivity to that of Auger electron spectroscopy (AES) (25, 26, 29). The principal advantage of ESCA relative to AES is that small... 

Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) are the two principle surface analysis techniques. They are used to identify the elemental composition, i.e., the amount and nature of species present at the surface to a depth of about 1 nm. 

Techniques of electron spectroscopies have emerged to become the principal means for investigating electronic structures of solids and surfaces (Rao, 1985 Mason et al, 1986). Most of these techniques involve the analysis of the kinetic energy of the ejected or scattered electrons. Some of the important techniques of electron spectroscopy used to study solids are photoelectron spectroscopy using X-rays (XPS) or UV radiation (UVPS), Auger electron spectroscopy (AES) and electron energy loss spectroscopy, (EELS). All these techniques are surface-sensitive and probe 25 A or less of solids. Cleanliness of the surfaces and ultra-high vacuum ( 10 — 10 " torr) are there-... 

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