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Adsorption hydroxyl radicals

In the absence of TCE and chlorine, the possible active species are holes (h+), anion vacancies, or anions (02 ), and hydroxyl radicals (OH ). At constant illumination and oxygen concentration, we may expect h+, and O2 concentrations to be approximately constant, and the dark adsorption to be a dominant variable. If kh+, or ko2- does not vary appreciably with the contaminant structure, the rate would depend clearly on the contaminant coverage as shown in Figme 2a, and the reaction would therefore occur via Langmuir-Hinshelwood mechanism. (Note only rates with conversions below 95% are correlated here (filled circles), as the 100% conversion data contains no kinetic information). This rate vs. d>r LH plot is smoother than those for koH or koH suggesting that non-OH species (holes, anion vacancies, or O2 ) are the active species reacting with an adsorbed contaminant. [Pg.441]

Our studies [46] of interaction of hydroxyl radicals with the surface of oxide semiconductors show that our reasoning on other radicals is also applicable to these particles as their chemical activity is sufficiently high. With radicals possessing low chemical activity the situation changes drastically becoming close to the adsorption of valence-saturated molecules. [Pg.205]

Fig. 6-34. Adsorption coverage of hydroxyl radicals on, and work function of, a platinum (111) surface plane observed as functions of coverage of potassium atoms coadsorbed with water molecules adsorption of water vapor takes place on a potassium-adsorbed surface of platimun at 305 K. 6k = coverage of adsorbed potassium atoms 6oh = coverage of hydroxyl radicals adsorbed by partial dissociation of water molecules A

Fig. 6-34. Adsorption coverage of hydroxyl radicals on, and work function of, a platinum (111) surface plane observed as functions of coverage of potassium atoms coadsorbed with water molecules adsorption of water vapor takes place on a potassium-adsorbed surface of platimun at 305 K. 6k = coverage of adsorbed potassium atoms 6oh = coverage of hydroxyl radicals adsorbed by partial dissociation of water molecules A<P = change in work function. [From Bonzel-Pirug-Ritke, 1991 Kiskinova-Pirug-Bonzel, 1985.]...
The Adsorption Integrated Reaction (AlR-11) process is a destructive photocatalytic oxidation (PCO) process for the treatment of gas-phase waste streams that can operate successfully at low concentrations of contaminants and at a low energy cost. In the process, ultraviolet (UV) light illuminates a proprietary catalyst at room temperature, and produces hydroxyl radicals, which destroy organic compounds by oxidation. Very few by-products are created by the process, and many contaminants are broken down into harmless carbon dioxide and water. [Pg.741]

The evidence that adsorption has an influence on the luminescence of zinc oxide is not as clear-cut as it is in the case of photoconductivity and conductivity. No experiments have been carried out, to the author s knowledge, directly correlating adsorption to luminescence, such as the work by Ewles and Heap (7) on silica, which showed correlations between its fluorescence and the adsorption of the hydroxyl radical. [Pg.298]

Since water is required for the reaction, the primary photochemical product is thought to be a surface bound hydroxy radical. The observed chemoselectivity for radical formation from the adsorbed ether, however, is thought to be governed by adsorption phenomena since a free hydroxyl radical in homogeneous solution is much less selective than the photoirradiated catalyst system. [Pg.88]

The rate of H2Oz consumption and the OH production were directly related to total iron concentration. The concentrations of hydroxyl radical produced were controlled by the rate of reaction with dissolved constituents. Rate constants for adsorption (ka) and desorption (kd) of PCBs from particles were calculated by regression of data from 1.5 to 5 hr. Adsorption rate constants were estimated from Equation (6.130) assuming that the partitioning rate constants between 2 and 5 hr without OH could be used for calculation of equilibrium partition coefficients Ky)... [Pg.223]

Sedlak and Andren (1991b) modeled hydroxyl radical reaction kinetics in the presence of particulate. They found that the reaction kinetics for PCB oxidation in the presence of particulate resulted from the complex interplay between solution-phase OH reactions and reversible adsorption-desorption reactions. A model predicting the reaction kinetics can be described by the following equation ... [Pg.224]

The selectivity of the trap towards hydroxyl radicals was demonstrated by several control experiments using different radicals, showing that the formation of the respective hydroxylation product, 5-hydroxy-6-0-zso-propyl-y-tocopherol (57), was caused exclusively by hydroxyl radicals, but not by hydroperoxyl, alkylperoxyl, alkoxyl, nitroxyl, or superoxide anion radicals. These radicals caused the formation of spin adducts from standard nitrone-and pyrroline-based spin traps, whereas a chemical change of spin trap 56 was only observed in the case of hydroxyl radicals. This result was independent of the use of monophasic, biphasic, or micellar reaction systems in all OH radical generating test systems, the trapping product 57 was found. For quantitation, compound 57 was extracted with petrol ether, separated by adsorption onto basic alumina and subsequently oxidized in a quantitative reaction to a-tocored, the deeply red-colored 5,6-tocopheryldione, which was subsequently determined by UV spectrophotometry (Scheme 23). [Pg.187]

Effect of Water Vapor on Photocatalytic Air Treatment. Several studies have reported on the effects of water vapor on the photocatalytic treatment of air (101-108). The effect of water vapor very much depends on the type of pollutant and, obviously, on the partial pressure of water against that of the pollutant. On one hand, water can compete with the adsorption of organic pollutants, especially those that are structurally related, such as alcohols. On the other hand, water can behave as a reactant in some of the successive steps of the degradation of organics and, in particular, can limit the formation of products that inhibit the photocatalytic activity. Water can be at the origin of the formation of hydroxyl radicals however, the importance of these radicals in gas-phase photocatalytic reactions is being debated on (109-111). The conclusion is that some humidity seems necessary for optimum photocatalytic activity. [Pg.110]

When adsorption of oxalic acid was hindered, either by adsorbed hydroxyl radicals [as at Os electrodes (Sargisyan et al. 1982)] or by a low adsorption capacity (as at glassy carbon or BDD electrodes), the rate of anodic oxidation reached minimum values. However, the same authors underlined that compared with glassy carbon, a... [Pg.210]

Luo and Ollis [204] compared the influence of water vapour on toluene with other compounds and found that the influence of water depended upon the characteristics of the contaminants. The research indicated that in a toluene-air mixture there was no toluene degradation in the absence of water, the toluene oxidation rate began to decrease when the water concentration started to reach saturation levels. Martra et al. [209] found that water vapour was needed to keep steady state toluene conversion to benzaldehyde and that in a dry toluene/air mixture an irreversible deactivation of the catalyst occurred. Their results further indicated that the produced benzaldehyde could undergo further oxidation but only in the presence of water. Kaneko and Okura [232] reported that the concentration of CO2 increased linearly with increases in the relative humidity and that the yield at 60% relative humidity was greater by one order than under dry conditions. The yield of benzaldehyde, however, decreased sharply with increased relative humidity and it was proposed that an increase in hydroxyl radicals may compete and/or hinder adsorption of toluene on the surface of Ti02 hence resulting in retardation of toluene oxidation. Kaneko and Okura [232], however, concluded that the effect of water vapour on the photocatalytic oxidation of toluene may depend on the initial pollutants concentration and its adsorptiv-ity. Pengyi et al. [234] observed that the effect of water vapour was two sided in that a little humidity can improve the decomposition of toluene whilst too much can suppress the decomposition. This was explained by the fact that hu-... [Pg.408]

Water adsorbed on Ti02 is the source for hydroxyl radicals needed to initiate photocatalytic reactions. On the other hand, water competes with the pollutants on adsorptive sites. It is for this reason that one finds out that the... [Pg.298]

The intermediates formed in AOPs sometimes are more toxic than the parent compounds and are required to be decomposed completely using either combination of AOPs or combination of AOP and some other treatment methods such as adsorption and biodegradation. Carbonyl compounds, particularly aldehydes, are quite toxic, and some of the secondary compounds formed from aldehydes, especially peroxyacylnitrates are more dangerous than the parent compounds. Organic peroxy radical (ROj) reactions are of significance because they represent an important class of intermediates formed in the oxidation process of hydrocarbons (15). Intermediates such as ethers and alcohols have enhanced reactivity toward hydroxyl radical. The rate constant of oxidation of these compounds is of similar order of magnitude as of the alkanes. [Pg.469]

In the atmosphere, ammonia is estimated to have a half-life of several days. The primary fate process is reaction of ammonia with acid air pollutants and removal of the resulting ammonium compounds by dry or wet deposition. Rain washout and reaction with photochemically produced hydroxyl radicals are also expected to contribute to the atmospheric fate of vapor-phase ammonia. In water and soil, ammonia will volatilize to the atmosphere and be removed by microbial processes, by adsorption to sediment and soil matrices as well as by plant uptake. [Pg.102]


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See also in sourсe #XX -- [ Pg.40 , Pg.85 , Pg.95 , Pg.97 , Pg.98 , Pg.100 , Pg.106 , Pg.142 , Pg.143 , Pg.186 ]




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