Use in microelectronics

Equally important as tape casting in the fabrication of multilayer ceramics is thick film processing. Thick film technology is widely used in microelectronics for resistor networks, hybrid integrated circuitry, and discrete components, such as capacitors and inductors along with metallization of MLC capacitors and packages as mentioned above. 

Other specialty silanes used in microelectronic apphcations include dichlorosilane and disilane. Trihromosilane [7789-57-3] iodosilanes, and trisilylamine [13862-16-3] are of interest for microelectronics in low temperature deposition technologies. 

At the start of this Chapter, an essay by Peter Day was quoted in which he lauds the use of soft chemistry , exemplifying this by citing the use of organometallic precursors for making thin films of various materials used in microelectronics. The same approach, but without the softness, is increasingly used to make ceramic fibres here, ceramic includes carbon (sometimes regarded as almost an independent state of matter because it is found in so many forms). 

The method can successfully be used in analyses of impurities in metals and alloys, for estimation of minor elements in monomolecular films of oxide layers of Fe-Cr-Ni alloys, for detection of metal impurities in environmental pollution, for studying the depression of high-grade semiconducting materials and for analysis of the corrosion products of contact junction diodes used in microelectronic circuits. Much sophistication is desirable on the instrumental side so as to incorporate an automatic recording device to make an FR polarograph suitable for wider applications and common use. 

As an additional example of high practical significance, we refer here to copper depKJsits when used in microelectronics, mirrors, and other optical applications. Those deposits have been observed to soften in time even when stored at room temperature for only 4 to 6 weeks. Also, mirrors and other precision objects made of copper will undergo surface deformation after a few months. This type of degradation can be counterbalanced by a suitable metal overcoating. Another, not always practical way is heat treatment to about 300°C. These phenomena are the direct results of microstructural instabilities, often referred to as recrystallization in the copper. It is worth stressing that recrystallization is not limited to copper (5). 

Table 9.19 Application of ICP-MS in trace analysis of high purity solutions used in microelectronics.

In order to develop an integrated optical sensor, it has to be taken into account that the main material used in microelectronics is silicon, which absorbs at wavelengths below 1.12 xm. Then, the first step would be the design of waveguides that could operate in the visible region with acceptable absorption losses while keeping their single-mode behavior. 

Low rate solid-electrolyte-based cells For instance, Li/I2 cells used primarily in implantable medical devices are well established. Another example is the developmental all-solid-state Li metal/phosphorous oxynitride (PON)/intercalation cathode cells conceived for use in microelectronic circuits. The PON is a glassy ceramic electrolyte which is stable to over 5 V [25],... 

Rogers JA, Fuchs M, Banet MJ, Hanselman JB, Logan R, Nelson KA. Optical system for rapid materials characterization with the transient grating technique application to nondestructive evaluation of thin films used in microelectronics. Appl Phys Lett 1997 71(2) 225-227. 

Polyimides are Hnding increased use in microelectronics [1-6]. There are four primary areas of application 1) as fabrication aids 2) as passivants and interlevel insulators 3) as adhesives and 4) as components of the substrate or circuit board. In each plication, the requirements on properties and performance differ. This paper addresses primarily the first two applications. 

Cold wall reactors are the other major category of CVD reactors. In such systems, the substrates are heated but the walls are cooled. Figure 9 shows an example of a cold wall rotating disk CVD reactor.This system has water-cooled quartz walls, with a rotating holder for (silicon or compound semiconductor) wafers that is resistively heated from below. Other commercial cold-wall reactors include lamp heated single-wafer reactors that are widely used in microelectronics fabrication, and inductively heated horizontal flow reactors. Cold-wall reactors are often run at relatively high pressures, several hundred torr to atmospheric total... 

Nickel is also present in numerous alloys in the form of thin films, such as Au-Ge-Ni or NiP, that have been used in microelectronics for specific applications. Nickel silicides have been used as contacts on sihcon, and have been investigated as diffusion barriers. ... 

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