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Nickel silicide

Nickel selenide, 22 87 Nickel-selenium, 22 73t Nickel sensitization, 17 119 Nickel silicate, 17 89 Nickel silicate green olivine, formula and DCMA number, 7 347t Nickel silicides, 17 121 uses for, 17 123 Nickel-silver, 7 759... [Pg.620]

Defects in a SCR, which is present under reverse bias, can be tested in a similar way. Figure 10.6 c shows the same wafer as in Fig. 10.6 e after removal of the oxide and under cathodic polarization in the dark. Hydrogen bubbles caused by the dark current now decorate nickel silicide precipitates that short-circuit the SCR. Nickel precipitates are known to increase the dark current of a p-type Si electrode under reverse bias by orders of magnitude [Wa4]. If the bias is increased the copper silicide precipitates also become visible, as shown in Fig. 10.6 d. This method, like defect etching (Fig. 10.4f), is only sensitive to precipitated metals. Metals that stay in solution, like iron, do not show up in defect mapping and have to be determined by other methods, for example diffusion length mapping. [Pg.217]

Silicide layers can also be grown on Pt surfaces.247 The preferential facets of epitaxial growth are the 111. Atom-probe data reveal that the stoichiometry of the silicide phase is Pt2Si, and the Pt-Pt2Si interface is also very sharp. However, a small fraction of silicon atoms can diffuse into the Pt matrix. Formation of silicide layers on a nickel emitter surface is much more complicated where silicide layers of varying stoichiometries are formed.246,247 Owing to the statistical nature of the atom-probe data, identification of all the silicide phases in a nickel silicide layer is at best uncertain. [Pg.291]

F.M. d Heurle evaluated a specific thickness of the layers (an analogue of the critical radius of nuclei in a homogeneous system for more detail, see Ref. 31) for compounds of the Ni-Si binary system. For Ni2Si, its value was found to be 0.15 nm, i.e. the nucleus does not contain even one lattice unit. Although higher values were obtained for other nickel silicides, they never exceeded 1 nm. Therefore, the nucleation process can hardly play any significant role in the formation of most transition-metal silicides, except in some special cases. This conclusion is likely to be valid for any other chemical compound layer. It should be noted, however, that there is also a different viewpoint.38 132... [Pg.7]

It should be noted that the thermodynamic data for the same binary system often reveal a very considerable scatter. This can readily be seen from the results compiled by J. Gulpen260 for the nickel silicides. At 850°C,... [Pg.148]

J.E.E. Baglin, H.A. Atwater, D. Gupta, F.M. d Heurle. Radioactive Ni tracer study of the nickel silicide growth mechanism // Thin Solid Films - 1982 - V.93 - P.255-264. [Pg.280]

Di nickel Silicide or Nickel Subsilicide, Ni2Si, is obtained by heating nickel and 10 per cent, of silicon in a carbon crucible in an electric furnace.3 It is a stable, steel-grey substance, density 7-2 at 17° C. Fluorine attacks it with incandescence at ordinary temperatures, and chlorine at red heat. It dissolves readily in hydrogen fluoride, less so in hydrogen chloride aqua regia decomposes it completely. [Pg.133]

Nickel is also present in numerous alloys in the form of thin films, such as Au-Ge-Ni or NiP, that have been used in microelectronics for specific applications. Nickel silicides have been used as contacts on sihcon, and have been investigated as diffusion barriers. ... [Pg.288]

E. Hokelek and G. Y. Robinson, Aluminum/ Nickel Silicide Contacts on Silicon, Thin Solid Films, Vol.53, 1978, pp.135-140. [Pg.326]

Na2H14O10S sodium sulfite heptahydrate 10102-15-5 25.00 1.5600 1 3167 NiSi2 nickel silicide 12201-89-7 25.00 4.8300 1... [Pg.304]

J. C. Barbour The Diffusion of Nickel in Amorphous Nickel-Zirconium Alloys and the Composition Analysis of Nickel-Silicide Formation in Lateral Diffusion Couples. Ph.D. Thesis, Dept, of Mater. Sci. Cornell Univ., (1986)... [Pg.65]

Summary Transition metal silicides, containing small amounts of chlorine, act as catalysts in the hydrodechlorination of silicon tetrachloride into trichlorosilane. Silicides, with comparable properties to the catalytically active phases, can be prepared by the reaction of silicon-rich silicides with the respective metal chloride. For the first time a thermodynamic model of chlorine-containing nickel silicides is given. Chlorine is considered to be dissolved in the silicides and is modeled as a lattice gas. Consequences regarding the bonding state of chlorine in the silicide phases are reported and discussed in relationship with the interactions within the silicide lattice. [Pg.818]

The subject of this paper is the investigation of chlorine-containing nickel silicide phases. These are obtained by the reaction of silicon-rich phases with nickel(ll)chloride in evacuated ampoules during sufficiently long testing periods (Eq. 3). The compounds thus obtained have chlorine contents between 0.02 and 0.6 wt. %. In generally, the chlorine-containing silicides and their route of formation can be used as models to describe the catalytically active phases in the hydrodechlorination process [4],... [Pg.819]

By means of the preliminary results it has been possible to thermodynamically model the presence of chlorine in nickel silicides. Chlorine-containing silicides may be taken as diluted solid solutions of chlorine in nickel silicides, which in the thermodynamic sense can be described by a modified Wagner model [5]. The molar free enthalpy of the solution of chlorine in silicide (Gm) is derived from Eq. 4. [Pg.820]

Eq. 4. The modified Wagner model [5] applied to chlorine-containing nickel silicides. [Pg.821]

Fig. 3. The enthalpy of a solution of chlorine in nickel silicides as a function of the molar fraction of silicon. Fig. 3. The enthalpy of a solution of chlorine in nickel silicides as a function of the molar fraction of silicon.
The dependence of the calculated enthalpy of solution of chlorine is comparable to the enthalpy of mixing of Ni-Si melts (Fig. 4) [9]. The extreme value of both dependencies is xsi = 0.375. The negative values of the enthalpy of mixing indicate considerable interactions between nickel and silicon. These interactions should be correlated with chlorine solubility in the nickel silicides. Both findings could point to the already frequently assumed strong metal-silicon interactions in transition metal silicides [10]. [Pg.823]

Chlorine solubility is essentially restricted by the formation of silicon tetrachloride and, in the presence of hydrogen, of trichlorosilane. The suppression of these reactions, according to our calculations, must lead to the metastable ternary compounds nickel silicide chlorides . This thesis is supported by earlier theoretical calculations [11], which indicated a possible existence of calcium silicide bromides [12], and furthermore by the preparation of rare earth silicide iodides , rare earth chlorid silicides and rare earth bromids silicides [13]. [Pg.823]

Mink JE, Rojas JP, Logan BE, Hussain MM (2012) Vertically grown multiwalled carbon nanotube anode and nickel silicide integrated high performance microsized (1.25 pL) microbial fuel cell. Nano Lett 12 791-795... [Pg.2201]

Xiang, Q., J.-S. Goo, J. Pan, B. Yu, S. Ahmed, J. Zhang, M.-R. Lin. 2003. Strained Si nmos with nickel-silicide metal gate. Symposium on VLSI Technology, Digest of Technical Papers 101-102. [Pg.39]

Baudouin D, Szeto KC, Laurent P, Mallmann AD, Fenet B, Veyre L, Rodemerck U, Coperet C (2012) Nickel—silicide colloid prepared undcT mild conditions as a versatile Ni precursor for more efficient CO2 reforming of CH4 catalysts. J Am Chem Soc 134 20624-20627... [Pg.305]


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See also in sourсe #XX -- [ Pg.325 ]

See also in sourсe #XX -- [ Pg.307 ]




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