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Topographic design

As a topographically constrained analogue of tyrosine, p,2,6-trimethyltyrosine (TMT) offers many advantages for topographical design of peptide and peptidomimetic analogues due to its very well-defined conformational and dynamic properties. Examination of the yflyf en-... [Pg.10]

The following discussion clarifies the effect that topographic factors can have on the transport of pollutants and, consequently, on the design and especially the siting of the stack. [Pg.292]

The principal factors which must be accounted for when designing a stack for air pollution control purposes are the dispersion and transport of the pollutants and the performance criteria against which the stack will be compared. These factors include (1) air quality standards, (2) meteorological conditions, and (3) topographical peculiarities. [Pg.339]

The rig selection will dictate the basic layout of the pad. Based on the necessary area needed to support its functions, ancillary equipment may be added in space conservative measures. In addition to the placement of various stationary rig site components, other operations such as logging, trucking and subsequent completion operations must be provided for. The most environmentally sensitive design will impact the least amount of area, and in that it will be the most economic. Potential pad sites and access routes should be laid out on a topographic map prior to the actual survey. At this time, construction costs can be estimated and compared. Figure 4484 shows such a layout. The cost of building a location includes the cost of reclamation such as any remediation. [Pg.1345]

Opioid receptors comprise a heterogenous group that can be divided into at least four biochemically and topographically distinct sub-types, designated mu, kappa, sigma, and delta. Martin et al. ... [Pg.37]

V. J. Hruby, G. G. Bonner, Design of Novel Synthetic Peptides Including Conforma-tionally and Topographically Constrained Analogs , Methods Mol. Biol. 1994, 35, 201 -240. [Pg.381]

Several observations of this type that have been published may appear confusing at first but have led to the design of useful topographical models... [Pg.390]

A shadow-mask technique has been applied for the local metal deposition to exclude metal residues on other designs processed on the same wafer (Fig. 4.2b). Such metal residues may be caused by imperfections in the patterned resist due to topographical features on the processed CMOS wafers or dust particles. The metal film is only deposited in those areas on the wafer, where it is needed for electrode coverage on the microhotplates. This also renders the lift-off process easier since no closed metal film is formed on the wafer, so that the acetone has a large surface to attack the photoresist. Another advantage of the local metal lift-off process is its full compatibility with the fabrication sequence of chemical sensors based on other transducer principles [20]. [Pg.33]

In an effort to overcome some of these difficulties and to provide the beginnings of a rational approach to the design of hormone analogs, we have utilized conformational and topographical restriction of peptide hormone and neurotransmitter structures. In this approach, we have attempted to make use where possible of classical structure-function studies, to Interpret the results from these studies In terms of specific conformational parameters which may be Involved In the observed rela-... [Pg.11]


See other pages where Topographic design is mentioned: [Pg.598]    [Pg.51]    [Pg.52]    [Pg.186]    [Pg.191]    [Pg.256]    [Pg.46]    [Pg.290]    [Pg.256]    [Pg.598]    [Pg.51]    [Pg.52]    [Pg.186]    [Pg.191]    [Pg.256]    [Pg.46]    [Pg.290]    [Pg.256]    [Pg.1716]    [Pg.384]    [Pg.25]    [Pg.289]    [Pg.19]    [Pg.41]    [Pg.339]    [Pg.410]    [Pg.286]    [Pg.485]    [Pg.317]    [Pg.455]    [Pg.41]    [Pg.405]    [Pg.257]    [Pg.166]    [Pg.219]    [Pg.240]    [Pg.823]    [Pg.399]    [Pg.172]    [Pg.179]    [Pg.194]    [Pg.121]    [Pg.138]    [Pg.5]    [Pg.6]    [Pg.11]    [Pg.21]    [Pg.31]   
See also in sourсe #XX -- [ Pg.290 ]




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Topographic Design in Bulk Metallic Substrates

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