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The structure of silicones

Silicones are polymeric compounds in which molecules with -Si-O-Si-O- bonds occur, [Pg.83]

It appears that for these cyclic polymers the values of the specific refraction and the specific parachor are almost constant, though the refractive index, the density and the surface tension vary notably. The specific refraction and the specific parachor are independent of the degree of polymerization. [Pg.84]

Although this result is only the first step in establishing relationships between chemical structure and physical constants of silicones, it is very promising. New investigations with the aim of establishing new relationships have been started in the [Pg.84]

It must be borne in mind that, for glass of a certain composition, the specific refraction according to Lorentz-Lorenz is independent of the temperature of treatment. The results discussed above suggest that this phenomenon may also be connected with polymerization and depolymerization of the glass in question. [Pg.85]


Lednicky et studied the structure of silicone rubber-hydrogel based on poly(HEMA) by... [Pg.246]

Coprecipitation is a partitioning process whereby toxic heavy metals precipitate from the aqueous phase even if the equilibrium solubility has not been exceeded. This process occurs when heavy metals are incorporated into the structure of silicon, aluminum, and iron oxides when these latter compounds precipitate out of solution. Iron hydroxide collects more toxic heavy metals (chromium, nickel, arsenic, selenium, cadmium, and thorium) during precipitation than aluminum hydroxide.38 Coprecipitation is considered to effectively remove trace amounts of lead and chromium from solution in injected wastes at New Johnsonville, Tennessee.39 Coprecipitation with carbonate minerals may be an important mechanism for dealing with cobalt, lead, zinc, and cadmium. [Pg.796]

Si-S bond lengths of 212.3 and 212.9 pm) and (PhSe Si (Si-Se bond lengths are 227.2 and 227.4 pm) includes a comprehensive list of the structures of silicon-sulphur and silicon-selenium compounds. These suggest a decrease in the Si—S bond length from 216 pm to 212 pm as the number of Si—S bonds in the molecule increases5. [Pg.1870]

Compare the structures of silicon(iv) oxide (p. 50) and diamond, and describe their physical properties in terms of these structures. [Pg.64]

Effect of the Structure of Silicon Sources. Hoebbel et al. used silicic acid sols, silicic acid gels, or Aerosil as a silica source of tetramethylammonium silicate aqueous solutions (9). In the solutions at the conditions that a N/Si ratio is 1.0 and Si02 concentration is ca. 1.4 mol dm-, the distributions of silicate anions are almost the same, and the cubic octamer is a dominant species, although the degradation rates of the silica sources are different. This suggests that the cubic octamer is formed in the tetramethylammonium silicate aqueous solution, regardless of the type of silica source with tetra-functionality. Tetraalkoxysilanes (Si(0R), R denotes an alkyl group) can be used as a silica source as well (4,12,14). [Pg.141]

The first observation of the formation of a silicone oil was reported more than 120 years ago [195], but it was just after the World War II that the first industrial applications started at General Electric and Dow Corning, mainly after the discovery of direct synthesis of organochlorosilanes from halogenosilanes by Rochow [196]. The structure of silicones was first recognized by Robinson and Kipping [197],... [Pg.737]

The many etch rate equations described above are empirical in nature even though mechanistic arguments are made in each specific case. One important omission in these quantitative formulations on the etching kinetics is the lack of consideration of the effect of the structure of silicon oxides. As shown in Fig. 4.40, etch rate can vary over more than three orders of magnitude for different types of oxides. It increases with increasing disorder of the oxide structure with the most ordered oxide, that is, quartz, having the lowest etch rate. The structural disorder of the silicon oxide can be due to impurities, partial oxidation of the silicon atoms, and degree of crystallinity. [Pg.163]

We found that the adsorbed PA molecules slightly affect the structure of silicon core. The PA adsorption does not change the optical properties of SiQDs, while it substantially decreases the ionization potentials in the excited state and results in some new active orbitals with adjacent energies around the Fermi energy level. Accordingly, the modified surface of SiQDs can serve as a reaction substrate to oxygen and solvent molecules, which is responsible for the increase in both PL stability and water solubility. [Pg.50]

At room temperature, pure silicon is not a good conductor of electricity. Silicon has four valence electrons, but they are held tightly between neighboring atoms in the crystal structure. You can see this clearly when you look at the structure of silicon in Figure 3.15. [Pg.111]

In metallurgical practice, sodium uses include preparation of powdered metals removal of antimony, tin, and sulfur from lead modification of the structure of silicon—aluminum alloys application of diffusion alloy coatings to substrate metals (162,163) cleaning and desulfurizing alloy steels via NaH (164) nodularization of graphite in cast iron deoxidation of molten metals heat treatment and the coating of steel using aluminum or zinc. [Pg.169]

Silicone II paintable sealant, commonly used as a caulking material, has the following statement under Directions "Wipe hands and tools with a dry cloth or paper towel, before washing with soap and water." In fact, if you wash with soap and water first, you get a slimy mess. What is there about the structure of silicones that makes this direction important and the behavior expected ... [Pg.425]

Colombo P., Paulson T.E., Pantano C.G. Atmosphere effects in the processing of silicon carbide and silicon oxycarbide thin films and coating. J. Sol-Gel Sci. Technol. 1994 2 601-604 Corriu R.J., Leclercq D., Mutin H., Vioux A. Si nuclear magnetic resonance study of the structure of silicon oxycarbide glasses derived from organosUicon precursors. J. Mater. Sci. 1995 30 2313-2318... [Pg.198]

Solution and Refinement of the Structure of Siliconate 6. All calculations were performed using the TEXSAN (14) crystallographic software package of Molecular Structure Corporation. The structure was solved by a combination of the Patterson method and direct methods (15). The non-hydrogen atoms were refined anisotropically. The final cycle of full-matrix least-squares refinement (16) was based on 2956 observed reflections [I > 3.00a(I)] and 478 variable parameters and converged to R = 0.051 and Rw = 0.059 The maximum and minimum peaks on the final difference Fourier map corresponded to 0.46 and -0.61 e"/A, respectively. [Pg.175]

Si NMR has proved to be invaluable for elucidating the structures of silicones and of the multifarious species present in aqueous solutions of inorganic silicates. A selection of results is presented below, and it has been found possible to use the wide Si chemical shift dispersion allied to empirically established trends to identify various isomeric species. Note that MsMejSiOin, D = MeTSifOi/,), T = MeSi(Oi/2)3 and Q = Si(Oi/2)4. [Pg.317]

The phenomena of insertion-deinsertion of Li in the structure of silicon is complex. For a better understanding of the process. Fig. 11.14 shows the stages of amorphization and crystallization of the silicon structure. This scheme was developed based on the work of Obrovac and the work of Dahn team. The diffusion of Li from the surface to the core is very slow at room temperature, 10-13 cm S" according to calculations by impedance. " For silicon particles larger than 10 microns, given the value of the diffusion coefficient at room temperature, the simple calculation (Lithiation time x Diffusion coefficient = Lithiated thickness of the particle) give that silicon particles will not be fully affected by the... [Pg.397]

Chu, Qin, and Elan applied an SVM classification model for the fault detection and identification of the operation mode in processes with multi-mode operations.They studied the rapid thermal annealing, which is a critical semiconductor process used to stabilize the structure of silicon wafers and to make uniform the physical properties of the whole wafer after ion implantation. A dataset of 1848 batch data was divided into 1000 learning data and 848 test data. Input data for the SVM model were selected with an entropy-based algorithm, and 62 input parameters were used to train three SVM classification models. The system based on SVM is superior to the conventional PCA fault detection method. [Pg.384]

The control over the depth of structures created in thick photoresists by varying the transmission of the mask used during the exposure has been used for the structuring of silicon for a few years [474]. This method was transferred to the photostructuring of UV-sensitive glass. [Pg.238]


See other pages where The structure of silicones is mentioned: [Pg.310]    [Pg.311]    [Pg.311]    [Pg.83]    [Pg.292]    [Pg.19]    [Pg.150]    [Pg.103]    [Pg.115]    [Pg.139]    [Pg.3992]    [Pg.496]    [Pg.71]    [Pg.91]    [Pg.165]    [Pg.305]    [Pg.758]    [Pg.159]    [Pg.3991]    [Pg.364]    [Pg.439]    [Pg.41]    [Pg.91]    [Pg.11]   


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