Silicon tetrachloride, reactions

The formation of silicon carbide, SiC (carborundum), is prevented by the addition of a little iron as much of the silicon is added to steel to increase its resistance to attack by acids, the presence of a trace of iron does not matter. (Addition of silicon to bronze is found to increase both the strength and the hardness of the bronze.) Silicon is also manufactured by the reaction between silicon tetrachloride and zinc at 1300 K and by the reduction of trichlorosilane with hydrogen. 

The reaction is carried out by first reacting the alkyl or aryl halide with magnesium shavings in an ether suspension and then treating with silicon tetrachloride (prepared by passing chlorine over heated silicon). With methyl chloride the following sequence of reactions occur ... 

Under the most favourable reaction conditions when methyl chloride is used the crude product from the reaction tube will be composed of about 73.5% dimethyldichlorosilane, 9% trichloromethysilane and 6% chlorotrimethylsilane together with small amounts of other silanes, silicon tetrachloride and high boiling residues. 

This method depends on the reaction of an organic chloride with silicon tetrachloride in the presence of sodium, lithium or potassium. 

When this reaction has occuiTcd accidentally sufficient hydrogen chloride has been liberated to explosively burst the vessel. The purest form of hydrogen chloride is made by the action of water on silicon tetrachloride ... 

The combination of carbonylate dianions with silicon tetrachloride leads in high yields to the p-Si compounds 22-24. As already mentioned, the reaction can be performed either stepwise with isolation of the dichlorosilylene complex or in a one-pot procedure. The resulting products show a surprisingly high thermal... 

Silicon reacts directly with chlorine to form silicon tetrachloride, SiCl4 (this reaction was introduced in Section 14.17, as one step in the purification of silicon). This compound differs strikingly from CC14 in that it reacts readily with water as a Lewis acid, accepting a lone pair of electrons from H20 ... 

Silicon Epitaxy. Silicon epitaxial films have superior properties. The applications are, however, limited by the high temperature of deposition, which is generally above 1000°C. These reactions use chlorinated compounds of silicon (tetrachloride, trichlorosilane, or dichlorosilane) as precursors as follows ... 

An important reaction for the deposition of silicon nitride combines silicon tetrachloride (SiCl4) and ammonia ... 

The reinforcing fibers are usually CVD SiC or modified aluminum oxide. A common matrix material is SiC deposited by chemical-vapor infiltration (CVI) (see Ch. 5). The CVD reaction is based on the decomposition of methyl-trichlorosilane at 1200°C. Densities approaching 90% are reported.b l Another common matrix material is Si3N4 which is deposited by isothermal CVI using the reaction of ammonia and silicon tetrachloride in hydrogen at 1100-1300°C and a total pressure of 5 torr.l" " ] The energy of fracture of such a composite is considerably higher than that of unreinforced hot-pressed silicon nitride. 

Si02(.5 ) + 2 C(5 ) + 2 Cl2(g) SiCl4(/) + 2 CO(g) If the reaction goes in 95.7% yield, how much silicon tetrachloride can be prepared from 75.0 g of each starting material, and how much of each reactant remains unreacted ... 

An extension of the reduction-chlorination technique described so far, wherein reduction and chlorination occur simultaneously, is a process in which the oxide is first reduced and then chlorinated. This technique is particularly useful for chlorinating minerals which contain silica. The chlorination of silica (Si02) by chlorine, in the presence of carbon, occurs above about 1200 °C. However, the silica present in the silicate minerals readily undergoes chlorination at 800 °C. This reaction is undesirable because large amounts of chlorine are wasted to remove silica as silicon tetrachloride. Silica is, therefore, removed by other methods, as described below, before chlorination. Zircon, a typical silicate mineral, is heated with carbon in an electric furnace to form crude zirconium carbide or carbonitride. During this treatment, the silicon in the mineral escapes as the volatile oxide, silicon monoxide. This vapor, on contact with air, oxidizes to silica, which collects as a fine powder in the furnace off-gas handling system ... 

Titanium tetrachloride is produced on an industrial scale by the chlorination of titanium dioxide-carbon mixtures in reactors lined with silica. During the reactor operation, the lining comes into contact not only with chlorine but also with titanium tetrachloride. There appears to be no attack on silica by either of these as the lining remains intact. However, the use of such a reactor for chlorinating beryllium oxide by the carbon-chlorine reduction chlorination procedure is not possible because the silica lining is attacked in this case. This corrosion of silica can be traced to the attack of beryllium chloride on silica. The interaction of beryllium chloride with silica results in the formation of silicon tetrachloride in accordance with the reaction... 

The "conventional" methods for the preparation of SiC and Si3N4, the high temperature reaction of fine grade sand and coke (with additions of sawdust and NaCl) in an electric furnace (the Acheson process) for the former and usually the direct nitridation of elemental silicon or the reaction of silicon tetrachloride with ammonia (in the gas phase or in solution) for the latter, do not involve soluble or fusible intermediates. For many applications of these materials this is not necessarily a disadvantage (e.g., for the application of SiC as an abrasive), but for some of the more recent desired applications soluble or fusible (i.e., proces-sable) intermediates are required. 

A highly explosive liquid [1]. Early attempts failed to isolate it but prepared numerous other explosive compounds. Reaction of dichlorine hexoxide with silicon tetrachloride or tetrabromide gave an explosive solid, apparently a perchlorato oligosiloxane. Silver perchlorate and silicon tetrahalides in ether gave explosive volatile organics, perhaps ethyl perchlorate. Replacing ether by acetonitrile as solvent, a solid (di)acetonitrile adduct of the tetraperchlorate precipitated, described as exceptionally explosive even in the smallest quantities [2],... 

With 29Si NMR spectroscopy we can show that the chlorosilanol-intermediates of the partial hydrolysis of silicon tetrachloride are stable in solution for more than one houn After fast mixing of diluent water to prevent fast reactions at the dropping point we can see with 29Si NMR Cl3SiOH, Cl2Si(OH)2, and ClSi(OH)3 (table 1). 

Aminolysis of the corresponding halides is the preferred method for the synthesis of dialkylamino derivatives of boron,1 silicon,2 germanium,3 phosphorus,4 arsenic,5 and sulfur.6 (Dialkylamino) chlorosilanes are prepared stepwise by the reaction of silicon tetrachloride with dialkylamines. This method may be utilized equally well for the conversion of alkyl- or aryl-substituted halides [e.g., (CH3) SiCl4. ] or of oxide and sulfide halides (e.g., POCl3 or PSC13) to the corresponding dialkylamino compounds. 

Scheme 5. Reactions of silicon tetrachloride and organosilicon compounds with stable nucleophilic carbenes.

Denmark utilized chiral base promoted hypervalent silicon Lewis acids for several highly enantioselective carbon-carbon bond forming reactions [92-98]. In these reactions, a stoichiometric quantity of silicon tetrachloride as achiral weak Lewis acid component and only catalytic amount of chiral Lewis base were used. The chiral Lewis acid species desired for the transformations was generated in situ. The phosphoramide 35 catalyzed the cross aldolization of aromatic aldehydes as well as aliphatic aldehydes with a silyl ketene acetal (Scheme 26) [93] with good yield and high enantioselectivity and diastereoselectivity. 

Methyltrichlorosilane is produced by the Grignard reaction of silicon tetrachloride and methylmagnesium chloride (structure 17.24). Dimethyldichlorosilane, used in the synthesis of polydimethylsiloxane, is obtained by the reaction of methylmagnesium chloride and methyltrichlorosilane (structure 17.25). 

Silicon combines with halogens at elevated temperatures forming silicon tetrahalides. With chlorine, reaction occurs at 450°C forming silicon tetrachloride, SiCh. The tetrahalides also are obtained when sdicon is heated with anhydrous hydrogen chloride, bromide and iodide ... 

Silane also may be prepared by the reaction of silicon tetrachloride with lithium aluminum hydride in ether ... 

Silicon tetrachloride reacts with acetic anhydride to form sihcon tetraacetate (tetraacetoxysilane). This reaction was discovered by Friedel and Ladenburg in 1867 ... 

Silicon tetrachloride undergoes addition with olefinic and acetylenic unsaturated hydrocarbons. In these addition reactions, one chlorine atom adds to one carbon atom of the double or triple bond while the rest of the unit —SiCls attaches to the other carbon atom forming a sihcon—carbon bond ... 

The zeolite dealumination mechanism is illustrated in Scheme 2.1.6.2. During treatment with silicon tetrachloride, a dealumination method first reported by Beyer et al. [50], the faujasite s framework aluminum was isomorphously replaced by silicon while maintaining the microporous structure. The reaction was self-... 

Silicon tetrachloride can be used to produce a smoke like powder known commercially as silica fume (fumed silica, pyrogenic silica) by reaction in an oxygen-hydrogen flame ... 

Crude elemental silicon can be obtained by reduction of silica sand with coke in the electric furnace (reaction 17.33) and may be adequate for making ferrosilicon alloys (Section 16.7.5) or silicones (Section 3.5). The high purity silicon used for electronic chips can be made from silica via silicon tetrachloride, which, like TiCU, is a volatile liquid (bp 57 °C) susceptible to hydrolysis but readily purifiable by fractional distillation. Indeed, the procedure for silicon resembles the Kroll process for titanium, except that an argon atmosphere is not necessary ... 

J. L. Gay Lussac and L. J. Thenard 5 showed in 1811 that if many of the metallic oxides be intimately mixed with carbon the reaction with chlorine proceeds more readily than with the oxide alone the metal chloride and carbon monoxide or dioxide are the products of the reaction. M. le Quesneville and F. Wohler used this process for aluminium chloride, chromic chloride, silicon tetrachloride, etc., and C. Baskerville for thorium tetrachloride. 

---