Semiconductor reactor

Chemical engineers have an obvious role to play in raw material and reactor effluent processing and in process integration and optimal control. They need to apply semiconductor reactor analysis to solve the critical problem... 

CVD gaseous reactants (precursors) delivered to a heated substrate in a flow reactor undergo tliennal reaction to deposit solid films at atmospheric or reduced pressure, and volatile side products are pumped away. CVD is used for conductors, insulators and dielectrics, elemental semiconductors and compound semiconductors and is a workliorse in tire silicon microelectronics industry. 

Heterostructures and Superlattices. Although useful devices can be made from binary compound semiconductors, such as GaAs, InP, or InSb, the explosive interest in techniques such as MOCVD and MBE came about from their growth of ternary or quaternary alloy heterostmctures and supedattices. Eor the successful growth of alloys and heterostmctures the composition and interfaces must be accurately controlled. The composition of alloys can be predicted from thermodynamics if the flow in the reactor is optimised. Otherwise, composition and growth rate variations are observed... 

Plasmas can be used in CVD reactors to activate and partially decompose the precursor species and perhaps form new chemical species. This allows deposition at a temperature lower than thermal CVD. The process is called plasma-enhanced CVD (PECVD) (12). The plasmas are generated by direct-current, radio-frequency (r-f), or electron-cyclotron-resonance (ECR) techniques. Eigure 15 shows a parallel-plate CVD reactor that uses r-f power to generate the plasma. This type of PECVD reactor is in common use in the semiconductor industry to deposit siUcon nitride, Si N and glass (PSG) encapsulating layers a few micrometers-thick at deposition rates of 5—100 nm /min. 

In addition, the copper industry s market development activities have resulted in appHcations such as clad ship hulls, sheathing for offshore platforms, automotive electrical systems including electric vehicles, improved automobde radiators, solar energy, fire sprinkler systems, parts for fusion reactors, semiconductor lead frames, shape memory alloys, and superconducting ceramics (qv) containing copper oxides. 

NAA is well suited for Si semiconductor impurities analysis. The sensitivity and the bulk mode of analysis make this an important tool for controlling trace impurities during crystal growth or fer monitoring cleanliness of various processing operations for device manufacturing. It is expected that research reactors will ser e as the central analytical facilities for NAA in the industry. Since reactors are already set up to handle radioactive materials and waste, this makes an attractive choice over installing individual facilities in industries. 

Another example of a cold-wall reactor is shown in Fig. 5.9. It uses a hot plate and a conveyor belt for continuous operation at atmospheric pressure. Preheating and cooling zones reduce the possibility of thermal shock. The system is used extensively for high-volume production of silicon-dioxide coatings for semiconductor passivation and interlayer dielectrics. 

Ultra-High Vacuum Reactors. CVD reactions at extremely low pressures (i.e., 10 Torr) are being developed for the deposition of semiconductor materials, such as silicon-germanium and some optoelectronic materials. Advantages appear to be better control of the deposit structure and reduction of impurities. 

A semiconductor microcircuit is a series of electrically intercoimected films that are laid down by chemical reactions. The successful growth and manipulation of these films depend heavily on proper design of the chemical reactors in which they are laid down, the choice of chemical reagents, separation and purification steps, and the design and operation of sophisticated control systems. Microelectronics based on microcircuits are commonly used in such consumer items as calculators, digital watches, personal computers, and microwave ovens and in information processing units that are used in communication, defense, space exploration, medicine, and education. 

A challenge related to the problems of reactor design and engineering is the modehng and study of the fundamental chemistry occtrrring in manufactrrring processes for semiconductors, optical fibers, magnetic media, and interconnection. 

A micro reactor concept proposed by MIT and DuPont on the basis of electronic circuits is the most prominent among the examples listed for the hybrid approach [19,101]. The so-called turnkey multiple micro-reactor test station relies on the use of standard components originating from the semiconductor industry for microchemical processing, the construction being oriented at the concept of printed circuit boards. 

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