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Pulsed-laser vaporization method

The first ever reported molecule to undergo encapsulation was fullerene, which spontaneously and accidentally ended up in the tubes during post-processing of raw tubes prepared via the pulsed laser vaporization method. This could be considered a milestone in the self-assembling of a new class of nanomaterials [78]. [Pg.60]

A pulsed Nd YAG laser beam has been used at 532 and 1064 nm to irradiate graphite-metal composites in many studies.High efficiency laser-vaporization methods such as ultrafast pulses from a free electron laser and... [Pg.5963]

Apart from the methods discussed in Sections 5.3.1 to 5.3.5, there are several more methods to prepare LiFeP04, such as the emulsion drying process, coprecipitation method, microwave heating method, solvothermal method, mechanochemical methods, vapor phase deposition, liquid phase oxidation/ reduction, and pulse laser deposition method. [Pg.102]

DEC coating was first prepared by Aisenberg and Chabot using ion beam deposition in 1971 [2]. At present, PVD, such as ion beam deposition, sputtering deposition, cathodic vacuum arc deposition, pulsed laser deposition, and CVD, like plasma enhanced chemical vapor deposition are the most popular methods to be selected to fabricate DEC coatings. [Pg.147]

There are several preparative methods for the production of bare metal clusters including the fast flow reactor (PER), the fast flow tube reactor (FTR), the SIDT (24), the GIB (23), and a supersonic cluster beam source (SCBS) (198). Essentially, all of these methods are similar. The first process is to vaporize the metal sample producing atoms, clusters, and ions. Laser vaporization is generally favored although FAB or FIB may be used. The sample is located in a chamber or a tube and so vaporization generally takes place in a confined environment. An inert gas such as helium may be present in the vaporization source or may be pulsed in after the ionization process. [Pg.394]

Fabrication methods include thermal evaporation, sputtering, magnetron sputtering, pulsed laser evaporation, molecular beam epitaxy, chemical vapor deposition, electrolytic and electroless deposition, and growth from solution. [Pg.957]

ZnO thin films can be prepared by a variety of techniques such as magnetron sputtering, chemical vapor deposition, pulsed-laser deposition, molecular beam epitaxy, spray-pyrolysis, and (electro-)chemical deposition [24,74]. In this book, sputtering (Chap. 5), chemical vapor deposition (Chap. 6), and pulsed-laser deposition (Chap. 7) are described in detail, since these methods lead to the best ZnO films concerning high conductivity and transparency. The first two methods allow also large area depositions making them the industrially most advanced deposition techniques for ZnO. ZnO films easily crystallize, which is different for instance compared with ITO films that can... [Pg.10]

Since the QRLPP has a fairly high electron temperature, the normal equilibrium between the Cs2 molecules and the Cs atoms is affected in the QRLPP. This means that the bound Cs2 (singlet) density is decreased while the unbound Cs2 (triplets) density is increased due to the QRLPP. We have indeed observed that the transient destruction of molecular state by the pulsed QRLPP can be measured by positioning the cw probe beam close to or in coincidence with the pulsed laser beam. The transient absorption signals observed in the probe beam, with long transient time constants (for example, on the order of 1 msec) provide a new method to study diffusion dynamics in a vapor system (33). [Pg.457]

For their rich potential in various applications described in the previous section, the synthesis and assembly of various ZnO micro and nanostructures have been extensively explored using both gas-phase and solution-based approaches. The most commonly used gas-phase growth approaches for synthesizing ZnO structures at the nanometer and micrometer scale include physical vapor deposition (40, 41), pulsed laser deposition (42), chemical vapor deposition (43), metal-organic chemical vapor deposition (44), vapor-liquid-solid epitaxial mechanisms (24, 28, 29, 45), and epitaxial electrodeposition (46). In solution-based synthesis approaches, growth methods such as hydrothermal decomposition processes (47, 48) and homogeneous precipitation of ZnO in aqueous solutions (49-51) were pursued. [Pg.366]


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