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Photosensitive acrylate resins

The/ac-ClRe(CO)3(a,a/-diimine) system is also an excellent spectroscopic probe for acrylate polymerization. Photosensitive acrylate resins investigated were constituted by mixing medium weight poly(methyl methacrylate) (PMMA) with... [Pg.233]

Properties M.w. 228.25 dens. 1.120 b.p. 120 C (1 mm) ref. index 1.4720 Toxicology Eye irritant TSCA listed Storage Refrigerate heat and light sensitive Uses Photosensitive acrylic resin for paint, flexo print resin crosslinking agent for free radical polymerization Manuf./Distrib. Aldrich http //www.sigma-... [Pg.1907]

Under UV-laser irradiation, photosensitive multifunctional acrylate resins become rapidly cross-linked and completely insoluble. The extent of the reaction was followed continuously by both UV and IR spectroscopy in order to evaluate the rate and quantum yield of the laser-induced polymerization of these photoresist systems. Two basic types of lasers emitting in the UV range were employed, either a continuous wave (C.W.) argon-ion laser, or a pulsed nitrogen laser. [Pg.212]

Table 6 Emission Data of/ac-ClRe(CO)3(4,7-Ph2-phen) in the Photosensitive Acrylate (TMPTA/PMMA) System as a Function of Resin Composition3... Table 6 Emission Data of/ac-ClRe(CO)3(4,7-Ph2-phen) in the Photosensitive Acrylate (TMPTA/PMMA) System as a Function of Resin Composition3...
Synonyms Glycerol monomethacrylate Uses Acrylic resin for paint, adhesive, soft contact lens, medical applies. photosensitive resin modifier for fiber and paper Trade Name Synonyms Blemmer GLM t[NOF http //www.nof.co.jp]] Rohamere D 1132 [Rdhm Am. http //www.rohmamerica.com] R6hm GmbH http //www.roehm.de]... [Pg.1911]

The first polymer in Table 2.3 is a typical cataphoretic acrylic resin, to which a monomer is added to provide sites of unsaturation. Polymer 2 is reacted with N-methylethanolamine to give the ionizable t-amine group. Polymer 3, which is incorporated into a positive-working photoresist, is preformed containing the PAC, whereas the PAC is mixed with polymer 4 during resist formulation. The final example in the table is not formulated with any photosensitive group. The resist here is used as an etch-resist, replacing tin-lead solder, in the manufacture of printed circuit boards. [Pg.53]

The third type of composition is exemplified acrylate- and methacrylate-ester derivatives of epoxy resins combined with a photoinitiator 1. Epo prepolymers (e. g., glycidyl methacrylate-allyl glycidyl ether copolymers or Ciba ECN 1299) combined with a photosensitive aryldiazonium compound (e.g.,... [Pg.172]

Typical resists include cyclized polyisoprene with a photosensitive crosslinking agent (ex bisazide) used in many negative photoresists, novolac resins with diazoquinone sensitizers and imidazole catalysts for positive photoresists, poly(oxystyrenes) with photosensitizers for UV resists, polysilanes for UV and X-ray resists, and polymethacrylates and methacrylate-styrenes for electron-beam resists (Clegg and Collyer, 1991). Also note the more recent use of novolac/diazonaphthoquinone photoresists for mid-UV resists for DRAM memory chips and chemically amplified photoacid-catalysed hydroxystyrene and acrylic resists for deep-UV lithography (Choudhury, 1997). [Pg.425]

The third type of composition is exemplified by acrylate- and methacrylate-ester derivatives of epoxy resins combined with a photoinitiator 1. Epoxy prepolymers (e. g., glycidyl methacrylate-allyl glycidyl ether copolymers or Ciba ECN 1299) combined with a photosensitive aryldiazonium compound (e.g., -nitrobenzenediazonium hexaflourophosphate) (38,39) 2. Epoxy prepolymers (e.g., a diglycidyl ether of disphenol A-(3,4-epoxycyclohexyl)-methyl-3,4-epoxycyclohex-anecarboxylate-alkyl glycidyl ether mixture) combined with a photosensitive aryldiazonium compound (e.g., -chlorobenzenediazonium hexaflourophosphate) and l-methyl-2-pyrrolidone gelation inhibitor (40) ... [Pg.178]

Liquid - solid Polymerisation by local UV exposure of a photosensitive resin Photosensitive resins Acrylates, epoxydes shrinkage and deformations model needs supports... [Pg.24]

The materials used in polymerization processes are photosensitive resins from the acrylate or epoxy type. Since filled materials are available, former disadvantages like limited durability and low thermal resistance have been overcome, and parts can be made even from metals or ceramics. [Pg.1027]

Uses Crosslinking agent for rubber vulcanization, moisture barrier films and coatings, photopolymer printing plates and letterpress inks, conversion coatings and adhesives crosslinked acrylic/vinyl resin comonomer syn. resin modifier plastisols photosensitive resins textile modifier Manuf./Distrib. Aldrich http //www.sigma-aldrich.com, CPS Monomer-Polymer Dajac Labs Polysciences... [Pg.1310]

Hazardous Decomp. Prods. Heated to decomp., emits toxic vapors of NOx Storage Photosensitive Uses Accelerator for unsat. polyester and acrylate polymerizations curing agent for epoxy resins... [Pg.1464]


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See also in sourсe #XX -- [ Pg.233 ]




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Acrylate resin

Acrylates Acrylic resins

Acrylic resins

Resins, photosensitive

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