Crosslinking photosensitized

Figure 5.27 The alignment-patterned process on crosslinkable photosensitive polymer AR-G [37] (a) exposure (b) crosslinked and uncrosslinked domains (c) rubbing treatment (d) LC alignment direction on the AR-G surface. Reproduced from R. Yamaguchi and S. Sato, Liquid crystal optical security device with polarized latent images, IDW 05 Digest, p. 65 (2005), Japan...

Positive-Tone Photoresists based on Dissolution Inhibition by Diazonaphthoquinones. The intrinsic limitations of bis-azide—cycHzed mbber resist systems led the semiconductor industry to shift to a class of imaging materials based on diazonaphthoquinone (DNQ) photosensitizers. Both the chemistry and the imaging mechanism of these resists (Fig. 10) differ in fundamental ways from those described thus far (23). The DNQ acts as a dissolution inhibitor for the matrix resin, a low molecular weight condensation product of formaldehyde and cresol isomers known as novolac (24). The phenoHc stmcture renders the novolac polymer weakly acidic, and readily soluble in aqueous alkaline solutions. In admixture with an appropriate DNQ the polymer s dissolution rate is sharply decreased. Photolysis causes the DNQ to undergo a multistep reaction sequence, ultimately forming a base-soluble carboxyHc acid which does not inhibit film dissolution. Immersion of a pattemwise-exposed film of the resist in an aqueous solution of hydroxide ion leads to rapid dissolution of the exposed areas and only very slow dissolution of unexposed regions. In contrast with crosslinking resists, the film solubiHty is controUed by chemical and polarity differences rather than molecular size. 

If (P ) is terminated by a chain transfer to a solvent or a monomer, a graft copolymer is formed, or, if the termination is from a combination, a crosslinked network polymer is formed. If the pre-existing polymer (B) contains an end group that itself is photosensitive (or can produce a radical by interacting with photoinitiator) and in the presence of a vinyl monomer (A), block copolymer of type AB can be produced if the photosensitive group is on one end of the polymeric chain. Type ABA block copolymer can be produced if the polymer chain (B) contains a photosensitive group on both ends. 

Modified PS by use of BF3-OEt2 catalyst had better properties comparised with virgin PS and other modified polymers. High thermostability and photosensitivity of modified PS compared with virgin PS are explained by the crosslinked structure of macromolecules formed during the processes of thermo- and phototreatment. 

These polymers need to be made photosensitive for use as photoresists and this is achieved by the incorporation of bisazide sensitisers. On exposure to light the photochemical reaction induced by the bisazide results in rapid crosslinking of the polymer rendering it insoluble in the developing solvent. 

Immobilization of (3-D-glucosidase from almonds on photo-crosslinkable resin prepolymer (ENTP-4000) was carried out by the following procedure. One gram of ENTP-4000 was mixed with 10 mg of a photosensitizer, benzoin ethyl ether, and 110 mg of (3-D-glucosidase from almonds (3.4 units mg ). The mixture was layered on a sheet of transparent polyester film (thickness, ca. 0.5 mm). The layer was covered with transparent thin film and then illuminated with chemical lamps (wavelength range 300 00 nm) for 3 min. The gel film thus obtained was cut into small pieces (0.5 x 5 x 5 mm) and used for bioconversion reaction. 

Some diazirines, particularly the 3-trifluoromethyl-3-aryldiazirines, can rearrange upon photolysis to a linear diazo derivative, similar in structure to the photosensitive end of the crosslinker PNP-DTP (Chapter 5, Section 3.12). These isomerized products themselves can be photolyzed to the reactive carbene. 

Of the following amine-reactive and photoreactive crosslinkers, the overwhelming majority use an aryl azide group as the photosensitive functional group. Only a few use alternative photoreactive chemistries, particularly perfluorinated aryl azide, benzophenone, or diazo compounds. For general background information on photoreactive crosslinkers, see Das and Fox (1979), Kiehm and Ji (1977), Vanin and Ji (1981), and Brunner (1993). 

Sulfo-SAMCA, sulfosuccinimidyl-7-azido-4-methylcoumarin-3-acetate, is a heterobifunctional reagent similar in design to SAED (Section 3.9, this chapter) (Thermo Fisher). One end of the crosslinker contains an amine-reactive sulfo-NHS ester, while the other end is an AMCA derivative (Chapter 9, Section 3) that contains a photosensitive phenyl azide group. Unlike... 

PNP-DTP, p-nitrophenyl-2-diazo-3,3,3-trifluoropropionate, is a photoreactive heterobifunctional crosslinker that contains an amine-reactive group on one end and a photosensitive diazo group on the other (Chowdhry et al., 1976) (Thermo Fisher), p-nitrophenyl esters react similarly... 

APG, p-azidophcnyl glyoxal, is a heterobifunctional crosslinker containing an arginine-specific diketone group on one end and a photosensitive phenyl azide group on the other end (Thermo... 

Reactions with Isocyanates. The reaction of alcohols with isocyanates to form carbamates is well known and similar reactions with poly(vinyl alcohol) would be expected. Until recently, the only available reaction conditions were to use a heterogeneous reaction mixture or to run the reaction in a poor solvent for poly(vinyl alcohol). The best poly(vinyl alcohol) solvents, water and formaide derivatives, react rapidly with isocyanates. Nevertheless, several such reactions have been run in the past and we will cite only a few of them. A potentially photosensitive polymer was made by the reaction of allyl isocyanate with poly(vinyl alcohol) (57) and several workers have crosslinked poly(vinyl alcohol) with hexamethylene diisocyanate (58.59). 

The first modern day negative photoresists were developed by the Eastman Kodak Company which utilized cyclized rubbers and cinnamic acid derivatives as photosensitive crosslinking agents (42). The first commercially important photoresist based on this chemistry was known as KPR, which was of a cinnamate ester of polyvinyl alcohol. It was introduced by Kodak in 1954. 

---