Nickel thin films

The reaction channels were made in silicon by several photolithographic steps, followed by potassium hydroxide etching [13,14]. Silicon oxide was thermally grovm over the silicon. Nickel thin films were vapor-deposited. Pyrex was anodically bonded to such a modified micro structured silicon wafer. 

Albumin Adsorption on Copper and Nickel Thin Films... 

Different studies have been conducted in order to verify the ability of nickelocene to yield nickel films with satisfactory properties. The main conclusion that has been drawn from these efforts is that, as is generally the case for many precursors using cyclopentadienyl ligands, nickelocene leads to carbon incorporation in the deposits. For this reason mainly, nickelocene has not been extensively used for deposition of nickel thin films by MOCVD. However, a literature review reveals that the question of carbon incorporation in nickel films processed from nickelocene has not... 

G.T. Stauf, D.C. Driscoll, P.A. Dowben, S. Barfuss, and M. Grade, Iron and Nickel Thin Film Deposition via Metallocene Decomposition, Thin Solid Films, Vol.153, 1987, pp.421-430. 

T. Maruyama and T. Tago, Nickel Thin Films Prepared by Chemical Vapor Deposition from Nickel Acetylacetonate, Journal of Materials Science, Vol.28,1993, pp.5345-5348. 

Abstract DC co-sputtered Carbon-Nickel and Carbon-Nitride-Nickel thin films were... 

Fig. 4. Field dependence of the magnetoelastic and magnetostrictive coefficients for a vacuum-evaporated nickel thin film. After Betz (1997).

Nickel thin films exhibited grain growth as well as organization when electric field was applied of the order of few kV/cm as shown in Figure 4.23. Indium thin films, however, showed formation of nanowires as can be observed in Figure 4.24. 

Ryll T, Reibisch P, Schlagenhauf L, Bieberle-Huetter A, Dobeli M, Rupp JEM, Gauckler LJ (2012) Lanthanum nickelate thin films deposited by spray pyrolysis CrystallizatiOTi, microstructure and electrochemical properties. J Eur Ceram Soc 32 1701... 

At the same time, we should draw attention to the following issue. Fig.l2 demonstrates the area, defined experimentally depending upon the thickness where dispersion of nickel thin film can be observed. The upper boimd of shaded area is the dependence of dispersion temperature, where it begins after 5s. The lower one shows when the same process begins after 5 h. Curve 1 illustrated on Fig.l2, is an estimated dependence, attained by iteration method, using equations (7) and (12), which is shown on Fig.7 (Section 3.2). As we can see, the estimated dependence is almost wholly situated in the shaded area of experimental observations. 

Fig. 12. Temperature range, where dispersion of nickel thin film in droplets is observed, and calculated curve of melting temperature dependence of nickel thin films on its thickness. Curve 1 - calculation by means of iteration method using formulas (7) and (12) 2 - control data point.

J. Ye and C. V. Thompson, Mechanisms of complex morphological evolution during solid-state dewetting of single-crystal nickel thin films, Appl. Phys. Lett, 97, 071904 [2010],... 

Selenium and selenium compounds are also used in electroless nickel-plating baths, delayed-action blasting caps, lithium batteries, xeroradiography, cyanine- and noncyanine-type dyes, thin-film field effect transistors (FET), thin-film lasers, and fire-resistant functional fluids in aeronautics (see... 

Nonferrous alloys account for only about 2 wt % of the total chromium used ia the United States. Nonetheless, some of these appHcations are unique and constitute a vital role for chromium. Eor example, ia high temperature materials, chromium ia amounts of 15—30 wt % confers corrosion and oxidation resistance on the nickel-base and cobalt-base superaHoys used ia jet engines the familiar electrical resistance heating elements are made of Ni-Cr alloy and a variety of Ee-Ni and Ni-based alloys used ia a diverse array of appHcations, especially for nuclear reactors, depend on chromium for oxidation and corrosion resistance. Evaporated, amorphous, thin-film resistors based on Ni-Cr with A1 additions have the advantageous property of a near-2ero temperature coefficient of resistance (58). 

Electroless reactions must be autocatalytic. Some metals are autocatalytic, such as iron, in electroless nickel. The initial deposition site on other surfaces serves as a catalyst, usually palladium on noncatalytic metals or a palladium—tin mixture on dielectrics, which is a good hydrogenation catalyst (20,21). The catalyst is quickly covered by a monolayer of electroless metal film which as a fresh, continuously renewed clean metal surface continues to function as a dehydrogenation catalyst. Silver is a borderline material, being so weakly catalytic that only very thin films form unless the surface is repeatedly cataly2ed newly developed baths are truly autocatalytic (22). In contrast, electroless copper is relatively easy to maintain in an active state commercial film thicknesses vary from <0.25 to 35 p.m or more. 

Ni-30 Cu Alloy 400 also undergo fogging, but alloys containing 15% Cr or more do not exhibit this phenomenon. Fogging is prevented by a very thin film of chromium deposited on the surface—a fact which forms the basis for the bright appearance of decorative chromium-nickel plate (see Sections 13.7 and 13.8). 

The current-potential relationship ABCDE, as obtained potentiosta-tically, has allowed a study of the passive phenomena in greater detail and the operational definition of the passive state with greater preciseness. Bonhoeffer, Vetter and many others have made extensive potentiostatic studies of iron which indicate that the metal has a thin film, composed of one or more oxides of iron, on its surface when in the passive state . Similar studies have been made with stainless steel, nickel, chromium and other metals... 

Reactor type Single-channel thin-film micro reactor Bottom plate (metal block) material Nickel (or copper)... 

A novel polysiloxane, containing the isocyanide group pendent to the backbone, has been synthesized. It is observed to react with the metal vapors of chromium, iron and nickel to afford binary metal complexes of the type M(CN-[P])n, where n = 6, 5, 4 respectively, in which the polymer-attached isocyanide group provides the stabilization for the metal center. The product obtained from the reaction with Fe was found to be photosensitive yielding the Fe2(CN-[P])q species and extensive cross-linking of the polymer. The Cr and Ni products were able to be oxidized on exposure of thin films to the air, or electrochemically in the presence of an electron relay. The availability of different oxidation states for the metals in these new materials gives hope that novel redox-active polymers may be accessible. 

In order to avoid contamination of the alloys with oxygen, Gharpurey and Emmett (113) decided to attempt to prepare Cu-Ni catalysts by a film technique. They prepared thin films of copper on nickel or nickel on copper by successive evaporation and heated them overnight at 300°C in... 

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