Monomer resists

Co-monomers Resistivity (GS2 cm) without with e.s. charges (V) without with Half life (s) without with Ref. 

Polytetrafluoroethylene (PTFE) (7.1) The chemical name for Teflon . A thermoplastic polymer made from C2F4 monomer. Resistant to heat and chemical reactions, PTFE is used in cookware, gaskets, seals, and tubing. 

In UV-NIL, a low viscosity monomer resist is pressed at room temperature with a transparent mold at a limited pressure and later polymerized by UV light to form solid structures. In this case, a rigid and UV-transparent mold, usually from fused silica, is more difficult to fabricate. In addition, only few dedicated resists are commercially available and fiatness issues are more critical due to the low viscosity resist used. Nevertheless, key advantages of UV-NIL make it a very attractive process for industrial applications ... 

Another technique put forth by Gresham and Vogelpohl to stabilize the TFE/PAVE copolymer is to carry out the aqueous polymerization in a buffered medium using a salt such as ammonium carbonate to form the buffered medium. PAVE monomers resist hydrolysis in a basic environment but form amide and ammonium salt groups, which are quite stable or degrade into stable end groups ... 

These monomers provide a means for introducing carboxyl groups into copolymers. In copolymers these acids can improve adhesion properties, improve freeze-thaw and mechanical stability of polymer dispersions, provide stability in alkalies (including ammonia), increase resistance to attack by oils, and provide reactive centers for cross-linking by divalent metal ions, diamines, or epoxides. 

The principal monomer of nitrile resins is acrylonitrile (see Polyacrylonitrile ), which constitutes about 70% by weight of the polymer and provides the polymer with good gas barrier and chemical resistance properties. The remainder of the polymer is 20 to 30% methylacrylate (or styrene), with 0 to 10% butadiene to serve as an impact-modifying termonomer. 

Hexamethylolmelamine can further condense in the presence of an acid catalyst ether linkages can also form (see Urea Eormaldehyde ). A wide variety of resins can be obtained by careful selection of pH, reaction temperature, reactant ratio, amino monomer, and extent of condensation. Eiquid coating resins are prepared by reacting methanol or butanol with the initial methylolated products. These can be used to produce hard, solvent-resistant coatings by heating with a variety of hydroxy, carboxyl, and amide functional polymers to produce a cross-linked film. 

Furfural reacts with ketones to form strong, crosslinked resins of technical interest in the former Soviet Union the U.S. Air Force has also shown some interest (42,43). The so-called furfurylidene acetone monomer, a mixture of 2-furfurylidene methyl ketone [623-15-4] (1 )> bis-(2-furfurylidene) ketone [886-77-1] (14), mesityl oxide, and other oligomers, is obtained by condensation of furfural and acetone under basic conditions (44,45). Treatment of the "monomer" with an acidic catalyst leads initially to polymer of low molecular weight and ultimately to cross-linked, black, insoluble, heat-resistant resin (46). 

Uses. Furfuryl alcohol is widely used as a monomer in manufacturing furfuryl alcohol resins, and as a reactive solvent in a variety of synthetic resins and appHcations. Resins derived from furfuryl alcohol are the most important appHcation for furfuryl alcohol in both utihty and volume. The final cross-linked products display outstanding chemical, thermal, and mechanical properties. They are also heat-stable and remarkably resistant to acids, alkaUes, and solvents. Many commercial resins of various compositions and properties have been prepared by polymerization of furfuryl alcohol and other co-reactants such as furfural, formaldehyde, glyoxal, resorcinol, phenoHc compounds and urea. In 1992, domestic furfuryl alcohol consumption was estimated at 47 million pounds (38). 

In resists of this class, the imaging layer contains a multifunctional monomer that can form an intercormected network upon polymerization, and a photosensitizer to generate a flux of initiating free radicals. Although not stricdy required for imaging, the composition usually includes a polymeric binder (typically an acryhc copolymer) to modify the layer s physical properties. Figure 7b shows the chemical stmctures of typical components. 

Fig. 28. Traditional duv-resist design using derivatives of polyhydroxystyrene. Monomer (a) contributes hydrophilic character to the polymer, and its acidic phenol group enhances aqueous base solubiUty monomer (b) provides acid-labile pendent groups.

PHOST is often prepared by polymerization of 4-acetoxystyrene followed by base-catalyzed hydrolysis (Fig. 29). The acetoxystyrene monomer s stabihty and polymerization kinetics allow production of PHOST of higher quaUty than is easily obtained by direct radical polymerization of HOST. The PHOST homopolymer product is then partially or fully derivatized with an acid-cleavable functionaUty to produce the final resist component. 

In some instances, the resist polymer can be prepared in a single step by direct polymerization of the protected monomer(s) (37,88), entirely avoiding the intermediate PHOST. HOST-containing resist polymers have also been prepared by free-radical copolymerization of a latent HOST and a stable, acid-labile monomer, eg, the copolymerization of acetoxystyrene with tert-huty acrylate, followed by selective removal of the acetoxy group (89) (Fig. 30). 

Fig. 31. An acrylic terpolymer designed for chemically amplified resist applications. The properties each monomer contributes to the final polymeric stmcture are for MMA, PAG solubility, low shrinkage, adhesion and mechanical, strength for TBMA acid-cataly2ed deprotection and for MMA, aqueous...

The polymeric products can be made to vary widely in physical properties through controlled variation in the ratios of monomers employed in thek preparation, cross-linking, and control of molecular weight. They share common quaHties of high resistance to chemical and environmental attack, excellent clarity, and attractive strength properties (see Acrylic ester polymers). In addition to acryHc acid itself, methyl, ethyl, butyl, isobutyl, and 2-ethylhexyl acrylates are manufactured on a large scale and are available in better than 98—99% purity (4). They usually contain 10—200 ppm of hydroquinone monomethyl ether as polymerization inhibitor. 

Acrylonitrile copolymeri2es readily with many electron-donor monomers other than styrene. Hundreds of acrylonitrile copolymers have been reported, and a comprehensive listing of reactivity ratios for acrylonitrile copolymeri2ations is readily available (34,102). Copolymeri2ation mitigates the undesirable properties of acrylonitrile homopolymer, such as poor thermal stabiUty and poor processabiUty. At the same time, desirable attributes such as rigidity, chemical resistance, and excellent barrier properties are iacorporated iato melt-processable resias. 

Cyanoacrylate adhesives (Super-Glues) are materials which rapidly polymerize at room temperature. The standard monomer for a cyanoacrylate adhesive is ethyl 2-cyanoacrylate [7085-85-0], which readily undergoes anionic polymerization. Very rapid cure of these materials has made them widely used in the electronics industry for speaker magnet mounting, as weU as for wire tacking and other apphcations requiring rapid assembly. Anionic polymerization of a cyanoacrylate adhesive is normally initiated by water. Therefore, atmospheric humidity or the surface moisture content must be at a certain level for polymerization to take place. These adhesives are not cross-linked as are the surface-activated acryhcs. Rather, the cyanoacrylate material is a thermoplastic, and thus, the adhesives typically have poor temperature resistance. 

Polyvinylpyrrohdinone/vinyl acetate copolymer (PVP/VA) was developed as an improved, less hygroscopic version of PVP. The monomer ratios control the stiffness and the resistance to humidity however, too high a vinyl acetate monomer content requires another solvent in addition to water to completely solubilize it. 

Vinyl fluoride (fluoroethene), is manufactured from the cataly2ed addition of hydrogen fluoride to acetylene. It is used to prepare poly(vinyl fluoride) which has found use in highly weather-resistant films (Tedlar film, Du Pont). Poly(vinyhdene fluoride) also is used in weather-resistant coatings (see Eluorine compounds, organic). The monomer can be prepared from acetylene, hydrogen fluoride, and chlorine but other nonacetylenic routes are available. 

The chemical resistance and excellent light stabiUty of poly(methyl methacrylate) compared to two other transparent plastics is illustrated in Table 5 (25). Methacrylates readily depolymerize with high conversion, ie, 95%, at >300° C (1,26). Methyl methacrylate monomer can be obtained in high yield from mixed polymer materials, ie, scrap. 

Synthetic Marble. Synthetic marble-like resin products are prepared by casting or molding a highly filled monomer mixture or monomer—polymer symp. When only one smooth surface is required, a continuous casting process using only one endless stainless steel belt can be used (52,53). Typically on the order of 60 wt % inorganic filler is used. The inorganic fillers, such as aluminum hydroxide, calcium carbonate, etc, are selected on the basis of cost, and such properties as the translucence, chemical and water resistance, and ease of subsequent fabrication (54,55). 

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