Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Model devices with resists

The coefficients of thermal resistance can either be measured for existing devices or be calculated with the thermal microhotplate model presented in Chap. 3. In analogy to resistor-heated membranes, the model can be used for evaluation and optimization of new designs. A combination of the presented transistor model equations with the lumped microhotplate model in Sect. 3.4 would allow to also derive an AHDL model for coupled-system simulations. [Pg.54]

Fig. 6.16. A simple small signal model for OFET devices, (a) shows the model of the core device, (b) shows the device with contact resistance characterized and included in the model. Fig. 6.16. A simple small signal model for OFET devices, (a) shows the model of the core device, (b) shows the device with contact resistance characterized and included in the model.
FIGURE 19.14 Variation of AT/T as a function of applied DC voltage. The open squares are for the unstressed device and the solid circles are for the stressed device. The inset shows a simple electrical model, where the resistance of the polymer is Rp and the interface resistance is Rj. (From Khan, R.U.A., D.D.C. Bradley, M.A. Webster, J.L. Auld, and A.B. Walker. Appl. Phys. Lett., 84, 921-923, 2004. With permission.)... [Pg.823]

Figure 11.4 shows the OLED model used in this Chapter. The model consists of a series resistance and a diode parallel with a capacitor. The capacitor models the total capacitance of the layers, the series resistance models the total resistance of the device and the diode models the rectifying nature of the OLED, the model is based on the... [Pg.110]

Impedance Spectroscopy. Impedance spectroscopy has been carried out on devices with WO3 as the cathodic electrochromic layer, counter electrodes of iridium oxide, polyaniline or Prussian blue, and polymers as electrolytes (Katsube et al [1986], Friestad et al [1997]). The equivalent circuit for a whole device becomes very complicated. In the works quoted above simplified, Randles-type circuits were used for the two electrochromic layers, while the ion conductor was modeled by a pure resistance, or neglected. Extraction of device parameters from the data fitting was reported. However, it is clear that in many cases it will be difficult to distinguish the contributions from the different layers in a device, in particular if the migration impedances, ion diffusion impedances, etc. are of the same order of magnitude. When it comes to characterizing electrochromic devices, impedance spectroscopy is a very time-consuming process, since a spectrum down to low frequencies should be taken at a number of equilibrium potentials. Thus we believe that transient current measurements in many cases offer a faster alternative that sometimes allows a simple determination of diffusion coefficients. [Pg.320]

However, it is useful first to illustrate the complexity of such systems by showing a hierarchy of equivalent RC circuits that can be developed, from which an ultimate model of a porous-electrode CR device can be constructed. Note that the behavior of an electrochemical capacitor device is, electrically, far from that of a pure capacitor in its ac response spectrum to AV modulation this is primarily due to the complexity of the distributed, internal connections within the matrix, associated with resistivity of electrolyte channels and the intrinsic resistance of the C microparticles or fibrils and their interparticle contact resistances which usually depend on the pressure applied during fabrication of electrode structures. [Pg.480]

Microscale Cooling Devices, Rgure 10 Nanolluid flow applications in microchannel heat sinks (a) comparison of model predictions with experimental thermal conductivity data for copper oxide-in-water and aluminum-in-water nanofluids [27] (b) thermal resistances of microchannel heat sinks with water-based nanolluids containing copper and diamond particles [26]... [Pg.1323]

Fig. 2 Process flow (a) Starting Material, (b)Deposit SisN (c)Deposit poly-silicon, (d) Deposit Al, (e) Resist coating, (f) Soft bake, (g) Exposure mask, (h) Develop resist (i) Poly-silicon RIE, (j) Alum etch and stripe resist, ion(k) Dry oxidation, (1) Poly-silicon nanogap pattern with pad Pt/Au fabrication( Electrical checking of the device can be performed on the fabricated pad)(Repeat step (a) to (j) for mask 2). Fig. 3 shows the circuit after serial impedance is measured, a simple resistor model is developed representing the substrate and polysilicon layer. The capacitor also found in series to describe the device with no liquid test... Fig. 2 Process flow (a) Starting Material, (b)Deposit SisN (c)Deposit poly-silicon, (d) Deposit Al, (e) Resist coating, (f) Soft bake, (g) Exposure mask, (h) Develop resist (i) Poly-silicon RIE, (j) Alum etch and stripe resist, ion(k) Dry oxidation, (1) Poly-silicon nanogap pattern with pad Pt/Au fabrication( Electrical checking of the device can be performed on the fabricated pad)(Repeat step (a) to (j) for mask 2). Fig. 3 shows the circuit after serial impedance is measured, a simple resistor model is developed representing the substrate and polysilicon layer. The capacitor also found in series to describe the device with no liquid test...
Alivisatos and coworkers reported on the realization of an electrode structure scaled down to the level of a single Au nanocluster [24]. They combined optical lithography and angle evaporation techniques (see previous discussion of SET-device fabrication) to define a narrow gap of a few nanometers between two Au leads on a Si substrate. The Au leads were functionalized with hexane-1,6-dithiol, which binds linearly to the Au surface. 5.8 nm Au nanoclusters were immobilized from solution between the leads via the free dithiol end, which faces the solution. Slight current steps in the I U) characteristic at 77K were reflected by the resulting device (see Figure 8). By curve fitting to classical Coulomb blockade models, the resistances are 32 MQ and 2 G 2, respectively, and the junction... [Pg.112]

Figure 11. Experimental and predicted differential conductance plots of the double-island device of Figure 10(b). (a) Differential conductance measured at 4.2 K four peaks are found per gate period. Above the threshold for the Coulomb blockade, the current can be described as linear with small oscillations superposed, which give the peaks in dljdVj s- The linear component corresponds to a resistance of 20 GQ. (b) Electrical modeling of the device. The silicon substrate acts as a common gate electrode for both islands, (c) Monte Carlo simulation of a stability plot for the double-island device at 4.2 K with capacitance values obtained from finite-element modeling Cq = 0.84aF (island-gate capacitance). Cm = 3.7aF (inter-island capacitance). Cl = 4.9 aF (lead-island capacitance) the left, middle and right tunnel junction resistances were, respectively, set to 0.1, 10 and 10 GQ to reproduce the experimental data. (Reprinted with permission from Ref [28], 2006, American Institute of Physics.)... Figure 11. Experimental and predicted differential conductance plots of the double-island device of Figure 10(b). (a) Differential conductance measured at 4.2 K four peaks are found per gate period. Above the threshold for the Coulomb blockade, the current can be described as linear with small oscillations superposed, which give the peaks in dljdVj s- The linear component corresponds to a resistance of 20 GQ. (b) Electrical modeling of the device. The silicon substrate acts as a common gate electrode for both islands, (c) Monte Carlo simulation of a stability plot for the double-island device at 4.2 K with capacitance values obtained from finite-element modeling Cq = 0.84aF (island-gate capacitance). Cm = 3.7aF (inter-island capacitance). Cl = 4.9 aF (lead-island capacitance) the left, middle and right tunnel junction resistances were, respectively, set to 0.1, 10 and 10 GQ to reproduce the experimental data. (Reprinted with permission from Ref [28], 2006, American Institute of Physics.)...
There are few models with automatic test capability. Testing is usually limited to hand held devices only 2 meters (7 ft.) from the detector or directly on the lens test unit. It can be ineffective if ice forms on the lens. It is sensitive to modulated emissions from hot black body sources. Most of the detectors have fixed sensitivities. The standard being under five seconds to a petroleum fire of 0.1 square meter (1.08 sq. ft.) located 20 meters (66 ft.) from the device. Response times increase as the distance increases. It cannot be used in locations where the ambient temperatures could reach up to 75 °C (167 °F). It is resistant to contaminants that could affect a UV detector. Its response is dependent on fires possessing a flicker characteristic so that detection of high pressure gas flames may be difficult. [Pg.181]

The suggested procedure to arrive at this goal is presented in Fig. 3.1. It starts with the transfer of a certain microhotplate layout into a geometry model for a complex FEM simulation. This step is shown in Fig. 3.2 and will be explained in more detail in one of the next sections. A complex 3-d FEM simulation is then performed. The results of this simulation are used to produce a lumped-element model. This model is translated into a hardware description language (HDL). Using the resistances of the device elements such as the heater resistance, Rheat> and the resistance of the temperature sensor, Rx. co-simulations with the circuitry can be performed. [Pg.18]

A mixed ion conductor, BaSnO, has also been tested as a contact layer on a Schottky sensor [90]. The BaSnOj/SiC sensor showed a response to oxygen and this was most pronounced at 400°C. The sensor was tested from 200°C to 700°C. Operated at 700°C, the sensor showed a negative resistance peak at a bias of 2V (Figure 2.8). This peak was accounted for by the tunneling or Esaki effect [91]. Up to an operation temperature of 400°C, thermionic emission was proposed to explain its behavior. At higher temperatures, a resistance connected in series with a Schottky diode can model the device [5, 73]. At temperatures of 500-600°C, the BaSn03 shows a mixed behavior of electronic and ion conduction, and the Nernst potential [92] can be added to the model. The complete proposed model is given in (2.9). [Pg.42]

The Co(III)—C bond in the natural coenzymes is resistant to cleavage in protic solvents. However, the bond length [20] is similar to that in models. Indeed, there appear to be no special corrin ring electronic properties necessary for such water-stable Co—C bonds even Co(III)—CH3 compounds with classical ligands such as ammonia or ethylenediamine have now been discovered [21], Although such non-Bi2-related systems are outside the scope of this review, I believe that the main reason that few such compounds are known lies in the paucity of synthetic routes. Since the Co—C bond, once formed, is relatively inert, such compounds could be used for multiple types of applications such as in molecular assemblies or devices [22], The natural compounds and some models are photosensitive, however [23]. It is this photosensitivity that delayed the discovery of the coenzymes, leading instead to the isolation and characterization of the vitamin [1]. [Pg.425]


See other pages where Model devices with resists is mentioned: [Pg.590]    [Pg.782]    [Pg.76]    [Pg.1051]    [Pg.531]    [Pg.641]    [Pg.100]    [Pg.7]    [Pg.771]    [Pg.67]    [Pg.30]    [Pg.326]    [Pg.106]    [Pg.173]    [Pg.80]    [Pg.587]    [Pg.113]    [Pg.389]    [Pg.152]    [Pg.229]    [Pg.230]    [Pg.637]    [Pg.116]    [Pg.24]    [Pg.282]    [Pg.40]    [Pg.409]    [Pg.132]    [Pg.221]    [Pg.73]    [Pg.56]    [Pg.104]    [Pg.329]    [Pg.371]    [Pg.193]    [Pg.28]    [Pg.335]   
See also in sourсe #XX -- [ Pg.107 ]

See also in sourсe #XX -- [ Pg.107 ]




SEARCH



Devices modeling

Resistance model

Resistance modeling

Resistant model

Resistivity devices

© 2024 chempedia.info