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Cleaning stations

AH recipes are terminated by the three process steps intermediate storage, discharging and vessel cleaning. The duration of all intermediate storage procedures was specified as 24 h, the duration of the cleaning of the vessels at the cleaning stations was estimated as 10 min. Figure 3.4 shows a screenshot of the recipe editor with the sequence of steps described above. [Pg.46]

In the basic configuration one cleaning station (station 6) and two AGVs were used. The speed of the AGVs was set to 0.025 m s-1. [Pg.48]

The pipeless plant concept leads to 20% shorter processing times for batch sizes between 200 and 500 kg, what clearly reduces the manufacturing costs of the products. By the distribution of the technical functions on several stations, the transport of the intermediate products in mobile vessels and the cleaning of the vessels in separate cleaning stations, the utilization of the stations rises and in parallel the productivity of the plant is increased. [Pg.53]

Contamination of line equipment on a dip-fill line is a constant problem. During filling operations, WP contamination is transferred from filled munitions and pallets to surfaces of accessory equipment until the filled munition enters the cleaning station. Large quantities of water and gas are contaminated from ... [Pg.168]

Figure 3.4 shows subsystems and related materials in a CMP system. In addition to a polisher and post-CMP cleaning station, a CMP system encompasses slurry supply, waste treatment, monitors, slurry, and pad. The performance of a CMP system is measured by its output in (a) wafer uniformity, (b) polishing rate, (c) planarization efficiency within chip, and (d) defect count. From a mechanistic point of view, the tool uptime, throughput, and reliability of the system are also very important [16]. In order to satisfy these requirements, all subsystems described in Fig. 3.4 are considered as one total system of CMP and should be upgraded as a whole whenever needed. [Pg.60]

Robotically loading the wafer onto the cleaning stations. [Pg.282]

An important item in both routes A and D is the cane dry cleaning station. A prototype for 250 tonnes of cane per hour was designed and built, and tested in one of Copersucar mills since 1994. Trash separation efficiency at the mill is 55 to 60% when operating on chopped green cane. It is expected that a trash separation efficiency of greater than 70% can be achieved. [Pg.514]

Potential of material (trash) produced 140 kg dry/tonne cane (average value). Efficiency of the harvester in the separation of trash in the field 68% with the extractor on and 5.5% with the extractor off (values obtained from test results). Trash separation efficiency at the mill 55 to 70% (average value obtained from test results with the dry cleaning station. The station was improved and will be retested). [Pg.515]

Who Exfoliated In the Cleaning Tank A contamination problem developed In a device line cleaning operation particulate contamination monitors (flamed SI wafers) showed many particulates, as In Figure 11. [(done In-sltu because SI Is 50Z transmissive In the Infrared.)] The In-sltu small area Infrared spectrum (Indicates) zeln, a corn-derived protein, which has over 100 commercial uses, many In paper processing. However, as bare paper Is not allowed In this clean area, another source of zeln had to be found. Zeln Is also widely used In cosmetics as a powder or "pancake" make-up base. Thus, In all likelihood, some operator had violated the rules regarding cosmetics In the clean room, and "exfoliated" over the cleaning station tanks. [Pg.410]

Photo 144 Cleaning stations are sometimes set up to deal with lightly oiled birds and mammals. An oiled otter is being cleaned in this photo. (Foss Environmental)... [Pg.208]

In many spills, cleaning stations are set up to rehabilitate birds. Although techniques have improved gready in the past few years, success rates are still poor as it is very stressful for a wild bird to be captured and handled. Less than half of the oiled birds that are cleaned and released actually survive. Only very sick birds can... [Pg.212]

Is your employees clothing oovered with dust and debris Would you like to provide a SAFE and OSHA Compliant solution for them to dust themselves off ACI s JETBLACK Personnel Cleaning Stations offer a unique, cost effective, OSHA-compliant, and safe way for personnel to clean themselves off. Visit Air Control Industries at www.aircontrolindustries.com or call (207) 445-2518 for more information. Circle 175... [Pg.90]

Know where the first-aid and eye cleaning stations are located and know how to use them properly. [Pg.88]

This prevents a road haulage company that also operates a cleaning station from being subject to two full assessments SQAS Road and SQAS Cleaning Stations. With this modular approach, one single core assessment can be followed by two separate but specific assessments of the road transport and the cleaning station activities. [Pg.86]

Nowadays, most 300 mm CMP polishers are equipped with at least two sequential post-clean stations where rotating brushes are placed in direct contact with the spinning wafer to remove PR and FM in the presence of cleaning chemicals. Maintaining stable torques, minimizing the vibration, and optimizing the bmsh/wafer rpm and contact are the keys to maximize cleaning efficiency [28]. [Pg.451]

An example of post-CMP clean process sequence design for defect reduction is the hybrid clean process as illustrated in Figure 17.25. In this approach, an acidic chemical is used in the roller bmsh steps in sequence to dissolve the metal oxide PR/FM while an alkaline clean chemical is plumbed to the megasonic tank without power to clean off the remaining PR/FM and passivate the Cu surface. In other words, the megasonic clean station is adopted only as a rinse tank with an alkaline chemical solution. The use of acidic clean chemical solution in the bmshes to dissolve metal oxide is the key to the reduction of PR/FM and the ehmination of circular ring defects. The application of a basic chemical rinse step provides further reduction in surface defects and passivation of the Cu surface to prevent the formation of HM and DE defects. [Pg.451]


See other pages where Cleaning stations is mentioned: [Pg.196]    [Pg.443]    [Pg.131]    [Pg.37]    [Pg.50]    [Pg.169]    [Pg.196]    [Pg.290]    [Pg.511]    [Pg.417]    [Pg.126]    [Pg.52]    [Pg.327]    [Pg.1029]    [Pg.72]    [Pg.90]    [Pg.342]    [Pg.42]    [Pg.62]    [Pg.86]    [Pg.86]    [Pg.86]    [Pg.96]    [Pg.96]    [Pg.96]    [Pg.21]    [Pg.48]    [Pg.58]    [Pg.342]    [Pg.64]    [Pg.13]   
See also in sourсe #XX -- [ Pg.5 , Pg.6 ]




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