Cathodic arc deposition

McCuUoch, D. G. and Merchant, A. R., The Effect of Annealing on the Structure of Cathodic Arc Deposited Amorphous Carbon Nitride Films, Thin Solid Films, Vol. 290, 1996, pp. 99-102. 

Hyodo, H., Yamamoto, T., and Toyoguchi, T., "Properties of Tetrahedral Amorphous Carbon Film by Filtered Cathodic Arc Deposition for Disk Overcoat, IEEE Trans. Magn., Vol. 37, 2001,pp. 1789-1791. 

Alternative vacuum deposition processes that have recently been developed offer potential advantages such as higher deposition rates, improved adhesion, or better control of film stress or morphology. These processes include ion-beam sputtering (134), ion-cluster evaporation (135, 136), and cathodic-arc deposition (137). 

Earlier work by Hulbert, Morrison and Klawitter (1972) confirmed that calcium zirconate ceramics implanted intramuscularly in rabbits promoted the formation of a 100-200 pm thick pseudo membrane that within 6-9 months gradually den-sified without the presence of inflammatory cells thus suggesting a high degree of biotolerance. Recent work by Liu et al. (2006) showed that nanostructured Zr02 films formed by cathodic arc deposition on silicon surfaces promote the formation of apatite when incubated in SBF. On the apatite, growth and proliferation of... 

The main deposition methods of NS-Ti02 onto stainless steels are cathodic arc deposition [532], electrophoretic deposition [533], anodic spark deposition (ASD) [534], the sol-gel method [535, 536], atmospheric pressure metal organic CVD (AP-MOCVD) [537, 538] and radio frequency (RF) magnetron sputtering [539]. Preparation methods and applications of NS-Ti02 thin films on stainless steel have been summarized in Table 15. 

Cathodic arc deposition Bactericidal effect removal of Escherichia coli K12 [532]... 

B. Kepenek, U.O. . Seker, A.F. Cakir, M. Urgen, C. Tamerler, Photocatal3dic bactericidal effect of Ti02 thin films produced by cathodic arc deposition method . Key Engineering Materials, 254-256, 463 66, (2004). 

The most common methods of TiN thin film creation are physical vapor deposition (PVD usually sputter deposition, cathodic arc deposition, or electron beam heating) and CVD. Eor both methods, pure titanium is sublimated and reacted with nitrogen in a high-energy, vacuum environment. PVD is preferred when film[Pg.75]

TiN nanoparticles also have been prepared by various methods such as CVD (52), cathodic arc deposition (53), and electrochemical reduction of titanium oxide (54). Thus, TiN nanoparticles were deposited on epo resin by electrochemical reduction with high cathodic potential of-1.5 V at room temperature (54). 

APD, or cathodic arc deposition, has been traditionally applied for preparing dense thin films of corrosion-resistant, protective, and decorative coatings, such as TiN, TiC, and CrN [25-27], This method is usually regarded as physical vapor deposition (PVD), but it differs from other PVD methods in that energetic plasma ions condense to form dense films in APD, while in other PVD methods, it is the vapor of neutral atoms that condense [25],... 

Sanders DM, Anders A (2000) Review of cathodic arc deposition technology at the start of the new millennium. Surf Coat Technol 133 78-90... 

Takikawa H, Tanoue H (2007) Review of cathodic arc deposition for preparing droplet-free thin films. IEEE Trans Plasma Sci 35 992-999... 

Chun SY, Chayahara A (2000) Enhanced interfacial roughness in metalhc multilayers prepared by pulsed cathodic arc deposition. Surf Coat Technol 127 282-284... 

Li LH, Lu QY, Fu RKY, Chu PK (2008) Thickness uniformity and surface morphology of Fe, Ti, and Hf films produced by filtered pulsed cathodic arc deposition. Surf Coat Technol 203 887-892... 

Huang AP, Fu RKY, Chu PK et al. (2005) Plasma nitridation and microstructure of high-k Zr02 thin films fabricated by cathodic arc deposition. J Crys Growth 277 422. 

Arc vapor deposition processes are used for vaporizing all forms of conductive materials with low radiant thermal energy from cathodic arc deposition. Non-conductive materials cannot be processed. However, the process is effective in depositing high-wear, corrosion and erosion-resistant thin-film coatings on precision parts. Pure metals, metal nitrides, carbides and carbo-nitrides, for example, can be deposited as a monolayer, multilayer, graded, or alloy film. 

Problems with the cathodic arc deposition technique include stabilization and movement of the arc on the solid surface and the formation of molten micron-sized globules (or macros ) of the ejected material from the solid surface. Macros are not formed if the cathode is molten. If the arc is allowed to move randomly over the surface, the arc soiu"ce is called a random arc source. 

Arc vapor deposition does not have any special vacuum requirements. In reactive arc deposition, gas flow control must be established and controlled in much the same way as for reactive sputter deposition. In the cathodic arc deposition from a cooled cathode, coolant flow and temperature sensors should be used in the cathode coolant circuit. 

Usually in arc vapor deposition, the deposition chambers are large to allow the fixtures to be placed well away from the arc source. This is similar to the vacuum deposition chamber shown in Figure 6.11. When using a cathodic arc deposition, often several sources are positioned in the chamber. Another cathodic arc configuration uses a centrally positioned post as the cathodic electrode. When using such a large chamber, it means that large areas will collect excess deposited film and have to be cleaned. 

The most common contaminants are particulates generated during cathodic arc deposition. These can be molten globules when ejected from the cathode or they may be solid particles such as those ejected from carbon or pressed powder targets. 

Both anodic and cathodic arc vaporization are widely used to deposit hard and wear-resistant coatings both for decorative and functional applications.Typically, these coatings are a few microns in thickness. Many of the arc deposition processes are used in the ion plating mode, i.e. with concurrent energetic particle bombardment during film deposition, which affects the film properties.Cathodic arc deposition is the most widely used arc technique when vaporizing alloy electrodes such as Ti-Al. Some examples of arc vapor deposition are ... 

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