Thin-solid film thickness

Rutherford back-scattering spectroscopy (RBS) is one of the most frequently used techniques for quantitative analysis of composition, thickness, and depth profiles of thin solid films or solid samples near the surface region. It has been in use since the nineteen-sixties and has since evolved into a major materials-characterization technique. The number and range of applications are enormous. Because of its quantitative feature, RBS often serves as a standard for other techniques. 

This type of lubrication provides the answer to why many mechanisms operate under conditions that are beyond the limits forecast by theory. It was previously thought that increasing pressure reduced oil film thickness until the aspirates broke through, causing metal-to-metal contact. Research has shown, however, that the effect on mineral oil of high contact pressure is a large increase in the viscosity of the lubricant. This viscosity increase combined with the elasticity of the metal causes the oil film to act like a thin solid film, thus preventing metal-to-metal contact. 

Park S.S., Mackenzie J.D., Thickness and microstructure effects on alcohol sensing of tin oxide thin films, Thin Solid Films 1996 274 154-159. 

S. Harbeck, A. Szatvanyi, N. Barsan, U. Weimar, and V. Hoffmann. DRIFT studies of thick film un-doped and Pd-doped Sn02 sensors temperature changes effect and CO detection mechanism in the presence of water vapour . Thin Solid Films 436 (2003), 76-83. 

Multiple reflection of light on a thin solid film with a high refractive index (Fig. 72) causes interference effects in the reflected light and in the complementary transmitted light. For the simple case of nearly perpendicular incidence, the intensity of the reflectance (/) depends on the refractive indices (n1, n2), the layer thickness (d), and the wavelength (A) [5.204], [5.205] ... 

Figure 72. Simplified diagramm showing nearly normal incidence of a beam of light (Lfl from an optical medium with refractive index nl through a thin solid film of thickness d with refractive index n2...

Chemical vapor deposition (CVD) of thin solid films from gaseous reactants is reviewed. General process considerations such as film thickness, uniformity, and structure are discussed, along with chemical vapor deposition reactor systems. Fundamental issues related to nucleation, thermodynamics, gas-phase chemistry, and surface chemistry are reviewed. Transport phenomena in low-pressure and atmospheric-pressure chemical vapor deposition systems are described and compared with those in other chemically reacting systems. Finally, modeling approaches to the different types of chemical vapor deposition reactors are outlined and illustrated with examples. 

S. H. Hahn, N. Barsan, U. Weimar, S. G. Ejakov, J. H. Visser, and R. E. Soltis, CO sensing with Sn02 thick film sensors, role of oxygen and water vapour, Thin Solid Films 436,17-24 (2003). 

The surface force apparatus is now being used routinely to study the equation of state of solutions confined between opposed, molecularly thin solid films. The apparatus is also used in one laboratory to study electrochemistry of thin films at electrodes a few nanometers thick and in a few other laboratories to study the behavior of molecularly thin films subjected to shear and flow [7]. 

Thin solid films of polymeric materials used in various microelectronic applications are usually commercially produced the spin coating deposition (SCD) process. This paper reports on a comprehensive theoretical study of the fundamental physical mechanisms of polymer thin film formation onto substrates by the SCD process. A mathematical model was used to predict the film thickness and film thickness uniformity as well as the effects of rheological properties, solvent evaporation, substrate surface topography and planarization phenomena. A theoretical expression is shown to provide a universal dimensionless correlation of dry film thickness data in terms of initial viscosity, angular speed, initial volume dispensed, time and two solvent evaporation parameters. 

M. Furtsch, M. Offenberg, A. Vila, A. Cornet, J.R. Morante, Texture and stress profile in thick polysilicon films suitable for fabrication of microstructures, Thin Solid Films 296, 177, 1997. 

Definition and Classification of Foams. Colloidal species of any kind (bubbles, particles, or droplets), as they are visually defined, have at least one dimension between 1 and 1000 nm. Foams are a special kind of colloidal dispersion one in which a gas is dispersed in a continuous liquid phase. The dispersed phase is sometimes referred to as the internal (disperse) phase, and the continuous phase as the external phase. In practical occurrences of foams, the bubble sizes usually exceed the size limit given, as may the thin liquid-film thicknesses. Table II lists some simple examples of petroleum industry foam types. Solid foams, dispersions of gas in a solid, will not in general be covered in this chapter. A glossary of frequently encountered foam terms in the science and engineering of petroleum industry foams is given at the end of this volume. 

Jones R, Tredgold R H and Hoorfar A 1985 Effects of thickness on surface-potential and surface conductivity in non-insulating Langmuir-Blodgett multilayers of porphyrins Thin Solid Films "[22 307-14... 

Thin films possess characteristic physical and chemical properties, which depend on their composition and on their thickness. These intrinsic properties, together with contributions due to the substrates account for the effects described above as well as for many other observed characteristics. These few examples demonstrate how certain properties of glass can be modified and improved upon by special thick and thin solid films on or close to their surfaces. 

It should he pointed out, however, that Eq. (11.3) assumes Newtonian behavior, which the complex polymeric resists and B ARC fluids do not necessarily exhibit. In particular, mass is not lost, neither from the radial flow of material nor from evaporation of solvent. Meyerhofer considered the effects of evaporation on the final film thickness. He reported that the final solid film thickness is inversely proportional to the square root of the rotational velocity. He also developed a model similar to that considered above, but allowed the solvent to evaporate during the spinning process. His central assumption was that the thinning process could be divided into two major stages, namely, one dominated by radial flow outward and another by evaporation of solvent. Effectively, he assumed a constant rate of evaporation and the viscosity concentration relationship expressed as... 

Fig. 10. O (Is) binding energy study of ESC A peaks for moderately thick oxide film on A1 (HP ESCA and HP-2100A flood gun). Reprinted with permission from T. L. Barr, S. Seal, L. M. Chen, and C. C. Kao, Thin Solid Films 253, 277 (1994). Copyright (1994) with permission from Elsevier Science.

V. Krishnakumar, et al, CdTe thin film solar cells with reduced CdS film thickness. Thin Solid Films, 2011. 519(21) p. 7138-7141. 

Lin, T., L. Wang, X. Wang, and A. Kaynak. 2005. Polymerising pyrrole on polyester textiles and controlling the conductivity through coating thickness. Thin Solid Films 479 77. 

Aguilella, V., Belaya, M., and Levadny, V., Ion transport through membranes with soft interfaces, the influence of the polar zone thickness. Thin Solid Film, 272 (1), 10 14, 1996. 

Figure 4.42. Physical vacuum deposition apparatus for real-time in situ IRRAS measurements (a) substrate (b) thickness monitor (c) ZnSe windows (d) IR beam (e) shutter (f) mercury lamp (g) crucible. Reprinted, by permission, from M. Tamada, H. Koshikawa, and H. Omichi, Thin Solid Films 292,164-168 (1997), p. 165, Fig. 1. Copyright 1997 Elsevier Science S.A.

Figure 6.2. IR absorption spectra for Tl-SiQx-p-Si solar cells with oxide layer thicknesses of (1, 2) 2.5 nm and (3, 4) 5.0 nm (1,3) before and (2, 4) after UV irradiation for 200 h. Reprinted, by permission, from S. S.Kilchitskaya, T. S.Kilchitskaya, G. D.Popova, and V. A.Skryshevsky, Thin Solid Films 346,226 (1999). Copyright 1999 Elsevier Science.

Joong Kim, K., Park, K.T., Lee, J.W., 2006. Thickness measurement of Si02 films thinner than 1 nm by X-ray photoelectron spectroscopy. Thin Solid Films 500, 356—359. 

Cai, X., Bangert, H., 1995. Hardness measurements of thin films-determining the critical ratio of depth to thickness using FEM. Thin Solid Films 264, 59—71. 

Sun, Y., Bell, T., Zheng, S., 1995. Finite-element analysis of the critical ratio of coating thickness to indentation depth for coating property measurements by nanoindentation. Thin Solid Films 258, 198-204. 

Lazarouk S, Jaguiro P, Katsouba S, Maiello G, La Monica S, Masini G, Proverbio E, Farrari A (1997) Visual determination of thickness and porosity of porous silicon layers. Thin Solid Films 297 97-101... 

Chang, S. R. Doong (2005) Zr02 thin films with controllable morphology and thickness by spin-coated sol-gel method. Thin Solid Films. 489,17-22... 

Thin solid films of PS63-(PBLGlU37)s with an average thickness of a few tens of nanometres (as determined by ellipsometry) were obtained by spin-casting of chloroform (CHCI3) polymer solutions onto hydrophilic UV/ozone-cleaned silicon wafers. 

Fig. 10 Structure formation and dissolution in a 40 3 nm thick film of PS63-(PBLGlU37)g swollen in chloroform vapor at about 34 5% of polymer (a, c, e) no methanol molecules present (b, d) small amounts of methanol molecules present (f) totally dried film. Before performing the swelling of the thin solid film, the sample chamber was flushed with N2 flow in order to create dry air conditions. Regions marked with dotted lines show (d) presence, (e) disappearance, and (f) reappearance of structures. Size of all OM images is 50 x 50 am ...

Nordin, M., Herranen, M., and Hogmark, S. 1999. Influence oflameUae thickness on the corrosion behaviour of multilayered PVD TiN/CrN coatings. Thin Solid Films 348 202-209. 

Tippmann-Krayer, P., Kenn, R. M. and Mohwald, H., Thickness and temperature dependent structure of Cd-arachidate Langmuir-Blodgett films. Thin Solid Films, limn, 577-582 (1992). 

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