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Swimming pool contamination

However, these systems have been shown to be ineffective in either disinfection, algae prevention, or oxidation of swimming-pool contaminants. [Pg.297]

Ionizers, Ionizers generate small concentrations of copper and silver ions (by electrochemical dissolution of a copper—silver electrode) that function as algicide and bactericide, respectively (10). Although the concentration of copper (. 3 ppm) is adequate, the concentration of silver, a poor disinfectant, is very low (<50 ppb). Consequendy chlorine sanitizers are necessary not only for effective disinfection but also for oxidation of swimming pool contaminants. Another disadvantage is that copper and silver ions form colored insoluble precipitates, which can cause staining. [Pg.297]

Calcium Hypochlorite. High assay calcium hypochlorite [7778-54-3] was first commercialized in the United States in 1928 by Mathieson Alkali Works, Inc. (now Olin Corp.) under the trade name HTH. It is now produced by two additional manufacturers in North America (Table 5). Historically, it usually contained about 1% water and 70—74% av CI2, so-called anhydrous product, but in 1970, a hydrated product was introduced (234). It is similar in composition to anhydrous Ca(OCl)2 except for its higher water content of about 6—12% and a slightly lower available chlorine content. This product has improved resistance to accidental initiation of self-sustained decomposition by a Ht match, a Ht cigarette, or a small amount of organic contamination. U.S. production in the 1990s consists primarily of partially hydrated Ca(OCl)2, which is sold as a 65% av CI2 product mainly for swimming pool use. Calcium hypochlorite is also sold as a 50% av CI2 product as a sanitizer used by dairy and food industries and in the home, and as a 32% product for mildew control. [Pg.473]

Swimming pools Ozone injection for removal of organic contaminants Removal of residual ozone and control of chloramine levels... [Pg.416]

Contamination of silicon wafers by heavy metals is a major cause of low yields in the manufacture of electronic devices. Concentrations in the order of 1011 cm-3 [Ha2] are sufficient to affect the device performance, because impurity atoms constitute recombination centers for minority carriers and thereby reduce their lifetime [Scl7]. In addition, precipitates caused by contaminants may affect gate oxide quality. Note that a contamination of 1011 cnT3 corresponds to a pinhead of iron (1 mm3) dissolved in a swimming pool of silicon (850 m3). Such minute contamination levels are far below the detection limit of the standard analytical techniques used in chemistry. The best way to detect such traces of contaminants is to measure the induced change in electronic properties itself, such as the oxide defect density or the minority carrier lifetime, respectively diffusion length. [Pg.211]

EXPOSURE ROUTES Inhalation (wood burning, swimming pools, tobacco smoke and aerosol) ingestion (contaminated drinking water) absorption occupational exposure. [Pg.140]

EXPOSURE ROUTES drinking water eonsumption of beverages and food products inhalation of contaminated ambient air dermal exposure to chlorinated swimming pool water... [Pg.267]

Other soils that shampoos must remove are proteinaceous matter arising from the stratum corneum, sweat, and other environmental sources. We have already described metallic ion contamination from the water supply, from swimming pools, and from sweat. In addition, particulate soils from the environment include hydrocarbons, soot, and metal oxide particles, which should also be removed by shampoos [13]. [Pg.209]

The ISO 10304-4 standard specifies a method for the determination of dissolved chlorite, chloride, and chlorate anions in water at low levels of contamination (e.g., drinking water, raw water, swimming-pool water). An appropriate sample pretreatment and detection using conductivity, UV, or amperometric method ensures working ranges from 0.03-10 pg/L (chlorate) to 0.01-1000 pg/L (chlorite). [Pg.1213]


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