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Plasma metals

Two methods of producing nanostructured MgH were already briefly mentioned in Sect. 2.1.3.3 and 2.1.5. Shao et al. [44] used the hydrogen plasma-metal reaction to obtain ultrafine magnesium with an average size of about 300 nm. The activation of... [Pg.147]

H. Shao, Y. Wang, H. Xu, X. Li, Hydrogen storage properties of magnesium ultrafine particles prepared by hydrogen plasma-metal reaction, Mater Sci. Eng. B 110 (2004) 221-226. [Pg.185]

Shao et al. [25] prepared Mg Ni from magnesium and nickel nanoparticles produced by hydrogen plasma-metal reaction. Two preparation methods were developed to obtain the compound. One is heating the nanoparticles under 0.10 MPa argon pressure at 430°C and the other is under 3.00 MPa hydrogen pressure at 280°C. No hydrogen storage properties of this material were assessed. [Pg.197]

Fig. 8.1.2 Schematic model of nitriding zone of iron vapor and/or condensed iron particles in reactive plasma-metal reaction. (From Ref. 17, p. 412. with kind permission from The Japan Institute of Metals.)... Fig. 8.1.2 Schematic model of nitriding zone of iron vapor and/or condensed iron particles in reactive plasma-metal reaction. (From Ref. 17, p. 412. with kind permission from The Japan Institute of Metals.)...
In order to improve the kinetics of the Li-N-H system, Xie et al. [96] prepared Li2NH hollow nanospheres by plasma metal reaction based on the Kirkendall effect. The special nanostructure showed significantly improved hydrogen storage kinetics compared to that of the Li2NH micrometer particles. The absorption temperature decreased markedly, and the absorption rate was enhanced dramatically because... [Pg.175]

Recent developments in ion chromatography are filling the analytical gap between the atomic adsorption spectroscopy and inductively coupled plasma metal spectroscopy. Ion chromatography can now not only determine what trace metals are present, but also their oxidation state, the degree of complexation, and the stability of the complex. For example, a nickel electroplating solution was analyzed by diluting it with a water eluant solution. The analysis revealed the following ion concentrations. [Pg.88]

Cornelis, R. (1990) Speciation of trace elements in serum or plasma. Metal speciation in the environment, Broekaert, J.A.C., Guger, S., and Adams, F., Eds., Series G.Ecologi-cal Sciences, Vol. 23, NATO ASI Series, Springer-Verlag Berlin, Heidelberg, New York, London, Paris, Tokyo, Hong Kong, Barcelona, pp 169 -194. [Pg.356]

In addition, the hydrogen plasma-metal reaction (HPMR) method was applied to synthesize rare earth oxide nanoparticles [13], which has been used to prepare better metallic ultrafine particles industrially at low cost. Pure Sm and Nd oxide nanoparticles were prepared through the HPMR method followed by oxidation treatment. The first step is to fabricate hydride nanoparticles the second is to oxidize them at room or elevated temperatures. Cubic neodymium and samarium oxides were synthesized with their average sizes of 20 and 40 nm, respectively. [Pg.137]

Koprowska J., Ziaja J., Janukiewicz J. (2008). Plasma Metallization Textiles as Shields for Electromagnetic Fields, EMC Europe 2008, Hamburg, Germany, September 8-12, 2008, pp. 493-496... [Pg.327]

Ziaja J., Koprowska J., Janukiewicz J., (2008a). Using of plasma metallization for fabrication of fabric screens against electromagnetic field, FIBRES TEXTILES in Eastern Europe 5, s. 70-72... [Pg.327]

The link between arc plasmas and electrochemistry was explored by Vijh [14], who studied 32 metals and compared the electrochemical description of the plasma-metal interface with that of treating the interface as a boundary between two plasmas, one for the metal and the other for the arc. Vijh concluded that the interface could be described as a metal/electrolyte interface with a characteristic interfacial potential distribution which depended on the choice of metal. [Pg.310]

The major IH emphasis for dry etchers has been on potential exposures to maintenance personnel working on the reaction chambers, pumps, and other associated equipment that may contain reaction product residues. The complexity of plasma metal etchers and the difficulty in characterizing the odors associated with their maintenance has made them the subject of many investigations and a few published papers. [Pg.229]

The reaction products formed in plasma metal etchers are a complex mixture of chlorinated and fluorinated compounds. The maintenance of metal etchers often involves short duration operations that generate strong odors. Hexachloroethane was found to be the major cause of odor in one type of aluminum etcher.h l In another, cyanogen chloride was the main problem exposure levels were 11 times the 0.3 ppm TLV .[20] In still other types of etchers, hydrogen chloride is associated with the odor (maximum exposure measured was 68 ppm odor threshold for HCl is less than 5 ppm). The paper by Mueller and Kunesh is a good source of additional information on the subject.I l... [Pg.229]

Petit, S., Laurens, P., Amourox, (., and Arefi-Khonsari, F. (2000) Excimer laser treatment of PET before plasma metallization. Appl. Surf. Sci.. 168, 300-303. [Pg.166]

Other processes investigated for planar SOFC fabrication include electrostatic-assisted vapour deposition, vapour phase electrolytic deposition, vacuum evaporation, laser spraying, transfer printing, sedimentation method, and plasma metal organic chemical vapour deposition. [Pg.207]


See other pages where Plasma metals is mentioned: [Pg.634]    [Pg.208]    [Pg.123]    [Pg.198]    [Pg.409]    [Pg.410]    [Pg.123]    [Pg.197]    [Pg.198]    [Pg.269]    [Pg.287]    [Pg.385]    [Pg.389]    [Pg.544]    [Pg.544]    [Pg.472]    [Pg.256]    [Pg.97]    [Pg.242]    [Pg.316]    [Pg.69]   
See also in sourсe #XX -- [ Pg.89 , Pg.297 ]




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Atmospheric plasma cleaning metals

Blood plasma metal complexes

Blood plasma, metal ions

Hydrogen Plasma Reduction of Metals and Other Elements from Their Halides

Hydrogen plasma-metal reaction

Inductively coupled plasma optical emission metal analysis using

Metal-polymer systems plasma surface treatment

Metals inductively coupled plasma

Metals, determination inductively coupled plasma

Metals, determination inductively coupled plasma atomic absorption spectrometry

Plasma Electrochemical Metal Deposition in Ionic Liquids

Plasma Etching of Refractory Metals and Semiconductors

Plasma alkali metals

Plasma etching metals

Plasma metal organic vapour deposition

Plasma metal reaction

Plasma platinum group metals

Plasma polymer-metal films

Plasma technology sputtering/metallic deposition

Plasma-sprayed metals

Polymer metal-containing, plasma

Reactive schemas on contact between metal and plasma

Trifluoromethyl radicals, plasma generation with metal atom vapors

Vacuum plasma spraying coat metals

Wettability Improvement of Metallic Surfaces by Active and Passive Plasma Cleaning

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