Optical ultraviolet

The dielectric constant is a measure of the ease with which charged species in a material can be displaced to form dipoles. There are four primary mechanisms of polarization in glasses (13) electronic, atomic, orientational, and interfacial polarization. Electronic polarization arises from the displacement of electron clouds and is important at optical (ultraviolet) frequencies. At optical frequencies, the dielectric constant of a glass is related to the refractive index k =. Atomic polarization occurs at infrared frequencies and involves the displacement of positive and negative ions. 

It is idle to pretend that a definite comparison of optical (ultraviolet, visible, and infrared) emission spectrography with x-ray emission spectrography can be made at this time. We give in Table 8-4, with little qualification and no defense, what we consider to be a fair comparison for a laboratory called upon to determine a large number of elements under a variety of conditions not necessarily known in advance. 

In Chapter 5.4, optical ultraviolet radiation sensors are described, including UV-enhanced silicon-based pn diodes, detectors made from other wide band gap materials in crystalline or polycrystalline form, the latter being a new, less costly alternative. Other domestic applications are personal UV exposure dosimetry, surveillance of sun beds, flame scanning in gas and oil burners, fire alarm monitors and water sterilization equipment surveillance. 

In spite of uncertainties, ionization correction factors often provide more accurate abundances than summing up ionic abundances obtained combining different techniques in the optical, ultraviolet and infrared domains. 

Much of solar radiation lies in the infrared part of the spectrum and is of too low energy to be utilized in conventional PV cells (or in photo-electrochemical reactions see below) so that it is wasted. To harness this thermal energy and thereby improve the efficiency of solar energy conversion, Licht has proposed the use of dielectric filters to separate the radiation received by the solar tower into an infrared component to heat pressurized water to at least 300 °C and an optical/ultraviolet component to generate electricity through PV (or photo-electrochemical) cells. The electricity would then be used to split water by high-temperature steam electrolysis (see above) with the entropy term Th.S of Figure... 

The selection rules help to predict the probability of a transition but are not always strictly followed. If the transition obeys the rules it is allowed, otherwise it is forbidden. A molecule can become excited in a variety of ways, corresponding to absorption in different regions of the spectrum. Thus certain properties of the radiation that emerges from the sample are measured. The fraction of the incident radiation absorbed or dissipated by the sample is measured in optical (ultraviolet and visible) absorption spectroscopy and some modes of nuclear magnetic resonance spectrometry (NMR). Because the relative positions of the energy levels depend characteristically on the molecular structure, absorption spectra provide subtle tools for structural investigation. 

Aspnes D E 1985 Above-bandgap optical anisotropies in cubic semiconductors a visible-near ultraviolet probe of surfaces J. Vao. Sc/. Teohnoi. B 3 1498-506... 

Optical metiiods, in both bulb and beam expermrents, have been employed to detemiine tlie relative populations of individual internal quantum states of products of chemical reactions. Most connnonly, such methods employ a transition to an excited electronic, rather than vibrational, level of tlie molecule. Molecular electronic transitions occur in the visible and ultraviolet, and detection of emission in these spectral regions can be accomplished much more sensitively than in the infrared, where vibrational transitions occur. In addition to their use in the study of collisional reaction dynamics, laser spectroscopic methods have been widely applied for the measurement of temperature and species concentrations in many different kinds of reaction media, including combustion media [31] and atmospheric chemistry [32]. 

The focus of this chapter is photon spectroscopy, using ultraviolet, visible, and infrared radiation. Because these techniques use a common set of optical devices for dispersing and focusing the radiation, they often are identified as optical spectroscopies. For convenience we will usually use the simpler term spectroscopy in place of photon spectroscopy or optical spectroscopy however, it should be understood that we are considering only a limited part of a much broader area of analytical methods. Before we examine specific spectroscopic methods, however, we first review the properties of electromagnetic radiation. 

As for the far-infrared, absorption by air in the vacuum-ultraviolet (VUV) necessitates evacuation of the optical path from source to detector. In this region it is oxygen which absorbs, being opaque below 185 nm. 

Until the advent of lasers the most intense monochromatic sources available were atomic emission sources from which an intense, discrete line in the visible or near-ultraviolet region was isolated by optical filtering if necessary. The most often used source of this kind was the mercury discharge lamp operating at the vapour pressure of mercury. Three of the most intense lines are at 253.7 nm (near-ultraviolet), 404.7 nm and 435.7 nm (both in the visible region). Although the line width is typically small the narrowest has a width of about 0.2 cm, which places a limit on the resolution which can be achieved. 

Optical windows of highly purified magnesium fluoride which transmit light from the vacuum ultraviolet (140 nm) into the infrared (7) are recommended for use as ultraviolet optical components for use in space exploration. 

Optical Properties. Teflon FEP fluorocarbon film transmits more ultraviolet, visible light, and infrared radiation than ordinary window glass. The refractive index of FEP film is 1.341—1.347 (74). 

Optical Lithography. Optical Hthography uses visible or ultraviolet light as the exposure media, and is the dominant Hthographic process used for patterning IC wafers. The linewidth limit is near 0.4 p.m, although some narrower features may be possible (34). The masks typically are made from patterned, opaque chromium films on glass. 

For the visible and near-ultraviolet portions of the spectmm, tunable dye lasers have commonly been used as the light source, although they are being replaced in many appHcation by tunable soHd-state lasers, eg, titanium-doped sapphire. Optical parametric oscillators are also developing as useful spectroscopic sources. In the infrared, tunable laser semiconductor diodes have been employed. The tunable diode lasers which contain lead salts have been employed for remote monitoring of poUutant species. Needs for infrared spectroscopy provide an impetus for continued development of tunable infrared lasers (see Infrared technology and RAMAN spectroscopy). 

Laser Photochemistry. Photochemical appHcations of lasers generally employ tunable lasers which can be tuned to a specific absorption resonance of an atom or molecule (see Photochemical technology). Examples include the tunable dye laser in the ultraviolet, visible, and near-infrared portions of the spectmm the titanium-doped sapphire, Tfsapphire, laser in the visible and near infrared optical parametric oscillators in the visible and infrared and Line-tunable carbon dioxide lasers, which can be tuned with a wavelength-selective element to any of a large number of closely spaced lines in the infrared near 10 ]lni. 

A confocal microscope using ultraviolet light and a 1.30-NA objective is expected to produce a resolution of about 0.07 p.m (70 nm), but no such instmment has been developed. There are confocal attachments that fit on almost any compound microscope. If one of the eady twentieth century ultraviolet microscopes or a Burch reflected optics scope can be found, the shorter wavelength and improved contrast would make possible better resolution than any compound light microscope. 

Optical Properties. Owing to the high crystallinity of HDPE, most thick-waHed articles made from HDPE resins are opaque. Significant surface roughness can also add to the opacity. Thin HDPE film, in contrast, is translucent, but its transparency is significantly lower than that of LDPE or LLDPE film. The ultraviolet transmission limit of HDPE is around 230 nm. 

Technology has been introduced for on-line estimation of the kappa number based on absorption of ultraviolet light (35). This breakthrough ia optical sensor technology permits closed-loop feedback control of digesters from on-line measurement of the kappa number. 

The properties of high quaUty vitreous sihca that determine its uses iaclude high chemical resistance, low coefficient of thermal expansion (5.5 X 10 /° C), high thermal shock resistance, high electrical resistivity, and high optical transmission, especially ia the ultraviolet. Bulk vitreous sihca is difficult to work because of the absence of network-modifyiag ions present ia common glass formulations. An extensive review of the properties and stmcture of vitreous sihca is available (72). 

Vitreous siUca has a wide range of commercial and scientific appHcations. Its unique combination of physical properties iacludes good chemical resistance, minimal thermal expansion, high refractotiness, and excellent optical transmission from the ultraviolet to the near-iafrared. 

Optical Properties. The optical transmission of vitreous siUca is influenced by impurities and the forming process. Ultrapure vitreous siUca has the abihty to transmit from the deep ultraviolet, through the visible, and into the near-infrared spectral range. 

Optical Applications. Vitreous siUca is ideal for many optical appHcations because of its excellent ultraviolet transmission, resistance to radiation darkening, optical polishing properties, and physical and chemical stabiUty. It is used for prisms, lenses, cells, wiadows, and other optical components where ultraviolet transmission is critical. Cuvettes used ia scatter and spectrophotometer cells are manufactured from fused siUca and fused quart2 because of the transmissive properties and high purity (222). 

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