Lithography dip-pen

As a consequence one might expect that the future needs to rely on hybrid elements which arise from advanced UV-and electron-beam lithography, from imprint techniques or automated and parallelized nanomanipulation techniques, like dip-pen lithography or focused ion-beam techniques in combination with supramolecular approaches for the assembly of molecular inorganic/organic hybrid system. Nevertheless, it is evident for any kind of chemical approach that falling back onto the present-day... 

Fig. 22 Patterning of OND or DNA solutions by means of an AFM tip. (i) Nanografting, (ii) Meniscus-Force Nanografting, (iii) Dip-pen lithography...

Fig. 30 Principle of operation of dip pen lithography [179]. Reprinted with permission...

In dip-pen lithography, molecules (such as thiols) are placed on the AFM tip and delivered to a substrate surface (such as gold) via a water meniscus. The tip is loaded either by dipping in a solution or by vapour deposition. In damp air, a water meniscus... 

In the example shown in Figure 4.23, a direct write lithographic technique, dip pen lithography [158, 159], which relies on a cantilever used for atomic force microscopy (AFM) to write on a substrate to create patterns of Au nanocrystals on mica substrates. Thus, nanocrystals of metals and semiconductors can be patterned into rectangles of varying aspect ratios. 

In this chapter we provide a brief review of different nanolithography and nanomanipulation techniques. We discuss mainly such techniques as templated growth, dip pen lithography, anodic oxidation and scanning probe microscope based nanomanipulation. The chapter contains an introduction to the basic techniques followed by examples of such nanostructure growth. 

In dip-pen lithography an AFM tip inked with molecnles is scanned along a snrface in a controlled pattern. Under the appropriate conditions the molecules transfer from the tip to the surface, much as a fountain pen writes on... 

With a different setup, a scanning probe can also be used in dip-pen lithography for the preparation of CP nanofeatures. In this case, the probe delivers a soluble CP ink onto a substrate following a programmed route to create CPNWs with the desired pattern and shape. 

A few variations to the original dip-pen lithography have been applied in separate studies. The results have fully demonstrated the potential of this technique [28,29]. For instance, Lim and Mirkin reported a patterning method in which the AFM tip was coated with a water-soluble CP by thermal evaporation or dip-coating and the charged water-soluble polymer was transported from the AFM tip to the pretreated oppositely charged substrate by electrostatic interactions (Figure 10.13 and 10.14) [28]. 

On the other hand, techniques have now been developed that even allow us to write with nanopartides. Today, dip-pen lithography, accompanied by nanoelectrodiemical modifications of surfaces, allow the fixation of nanopartides in a final step. Perhaps these techniques will dominate over the principles of... 

Despite the intractability of conducting polymers, a variety of methods have been developed for the fabrication of conducting polymer thin films and nanopatterns [254,255]. Nanoscale PPy thin films or patterns were fabricated through several techniques such as surfactant and block copolymer templat-ing [256,257], microphase separation and molecular mask [258], dip-pen lithography [259], and so forth [260]. 

Specialized Processes. To facilitate the manufacture of nanoscale materials, a number of specialized processes are used. They include nanoimprint Uthog-raphy, in which nanoscale features are stamped or printed onto a surface atomic layer epitaxy, in which a layer that is only one atom thick is deposited on a surface and dip pen lithography, in which the tip of an atomic force microscope writes on a surface after being dipped into a chemical. 

Dip-pen lithography, SAM, hot embossing, nanoimprint lithography, electron beam lithography, dry etching, and reactive ion etching are techniques that can be used to prepare nanostructures with 50-70 nm dimensions. Nanomechanical techniques include processes that involve local transfer of material from a tool onto a substrate when either the tool or the substrate is prestructured. 

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