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Park. H.J.. Kang, M.-G., and Guo, LJ. (2009) Large area high density sub-20nm Si02 nanostructures fabricated by block copolymer template for nanoimprint lithography. ACS Nano, 3, 2601-2608. [Pg.190]

See other pages where Block copolymers templates for is mentioned: [Pg.17] [Pg.2172] [Pg.2156]