Chemically amplified deep-ultraviolet

L.M. Buchmann, and W. Finkelstein, Chemically amplified deep ultraviolet resist for positive tone ion exposure, J. Vac. Sci. Technol. B 15, 2355 (1997). [Pg.764]

Itani, H. Yoshino, S. Hashimoto, M. Yamana, N. Samoto, and K. Kasama, Acid and base diffu sion in chemically amplified DUV resists, Microelectron. Eng. 35, 149 (1997) T. Itani, H. Yoshino, and S. Hashimoto, Photoacid hulkiness effect on dissolution kinetics in chemically amplified deep ultraviolet resists, J. Vac. Sci. Technol. B. 13(6), 3026 (1995). [Pg.826]

Acid—base reactions, anhydrous hydrazine, 13 567-568 Acid Black 63, 6 559 Acid blue, herbicide/algicide for aquaculture in U.S., 3 214t Acid catalysis, deep-ultraviolet chemically amplified resists based on, 15 163-181 Acid catalysts, 10 493. See also Acidic catalysts... [Pg.8]

Deep-ultraviolet chemically amplified resists, 15 163-181 Deepwater barges, 25 327 Deep-well turbine pumps, 21 68 Deesterification, of aspartame, 24 227 DEET, 2 549t Defaunation, 10 871 D,E,F color scale, 7 310 Defect Action Levels (DALs), 23 160 Defects, in silicon-based semiconductors, 22 232... [Pg.248]

Deep-Ultraviolet Chemically Amplified Resists Based on Acid Catalysis. Unfortunately DNQ-novolac resists are not suitable for use at deep-ultraviolet (DUV) wavelengths (A, 250 nm), the succeeding evolutionary step in the progression of optical lithography tools to higher resolution. There are two principal reasons for this. The first can best be understood by consideration of... [Pg.4302]

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