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CMOS circuits

Current only flows in the CMOS inverter when the load capacitor is being charged or discharged. No current flows to maintain a logic level (0 0 V, 1 5 V). Because power is dissipated only when current flows, the amount of power dissipation in a CMOS circuit is proportional to circuit... [Pg.353]

Planarization- Chemical mechaniced planjurization machines are used to level the topology of the films deposited on the wafer. Chemical-mechanical smoothing is the process used to improve process uniformity, repeatability, removal rate, planarity and defeet reduction. Thus, planarization is requisite to producing defect-free CMOS circuits. [Pg.327]

Kane, M. G. Goodman, L. Firester, A. H. van der Wilt, P. C. Limanov, A. B. Im, J. S. 2005.100MHz CMOS circuits using sequential laterally solidified silicon thin-film transistors on plastic. IEEE International Electron Devices Meeting Tech. Digest 2005 1087-1089. [Pg.29]

A scheme of a typical memory cell of an integrated 32 Mbit Chain FeRAM device is shown in Figure 17.2 [2], Here the cell capacitor has an area of 0.49 /nm2, but sizes down to 0.09 /nm2 for integrated capacitor area used in devices. The fabrication of these devices can only be done by memory manufacturers since the whole processing has to be performed, including CMOS, ferroelectric capacitor and electrodes, and metalization to get a functional device. To perform measurements on these capacitors, the device must have the possibility to access their bottom and top electrodes, e.g. through the CMOS circuit or through additional contact pads. [Pg.329]

A crossbar array based scheme is at the moment perceived as the most realistic strategy to combine nano-scale components with CMOS circuits [67], where a concept for neuromorphic networks based on molecular singleelectron transistors [68] has also been proposed. [Pg.383]

Since capacitors do not pass dc current, special steps must be taken to set the charge stored on each capacitor and protect the circuit from drift due to leakage currents, carrier generation, etc. The resistors in Fig. 6.1.8 labelled R s serve this purpose. Additionally, measurements are usually not performed at dc, but rather at some carrier frequency /m, typically a few 100 kHz or MHz. The higher frequencies are needed especially with CMOS circuits to reject the electronics own low frequency flicker noise which often extends to the low MHz. The only exception are applications in which the signal itself is modulated or free from dc content, such as resonant gyroscopes [1] or microphones. Even in those cases modulation is often used. [Pg.248]

Although there are many other manufacturing steps involved in creating a CMOS circuit, the primary use of CMP involves the circuit interconnection lines that are fabricated to get the supply voltages or signals from one transistor to another. [Pg.15]

The most important CMOS circuit is the CMOS inverter. It consists of only two transistors - a pair of one n-type and one p-type transistor. Both devices are enhancement-mode MOSFETs, with the threshold voltage of the PMOSFET less than zero and the threshold voltage of the NMOSFET greater than zero. Figure 9.6a-c shows the circuit diagram, the top view and the cross section of the CMOS inverter, respectively. [Pg.112]

Rius, G., Llobet, J., Arcamone, J., Borrise, X., and E. Perez-Murano. 2009. Electron- and ion-beam lithography for the fabrication of nanomechanical devices integrated on CMOS circuit. Microelectronic Engineering 86 1046-1049. [Pg.447]

We work on amelioration in this explorative work, including better electrodes, electronics, sensor context to overcome deficiencies due to impedance converter, electrodes, hand operation context such as pressure and sweat. More sophisticated instrumentation or (CMOS) circuit integration should be considered. The scalable adaptive multi-sensor interface and PC-based soft-computing subsystem can be harmonized towards System-on-Chip for high-performance and low-power solution in the future. [Pg.131]


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