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Voltage threshold

If we compare with figure C2.2.I I, we can see that this defonnation involves bend and splay of the director field. This field-induced transition in director orientation is called a Freedericksz transition [9, 106, 1071. We can also define Freedericksz transitions when the director and field are both parallel to the surface, but mutually orthogonal or when the director is nonnal to the surface and the field is parallel to it. It turns out there is a threshold voltage for attaining orientation in the middle of the liquid crystal cell, i.e. a deviation of the angle of the director [9, 107]. For all tliree possible geometries, the threshold voltage takes the fonn [9, 107]... [Pg.2561]

Threshold voltage. Batteries can only supply low voltages, so for portable appliances the switching voltage or tlireshold voltage must be sufficiently small. [Pg.2563]

Step 6. The doping concentration of the "typ substrate under the gate oxide is adjusted by another boron implantation. Boron passes through the thin gate oxide. This provides the threshold voltage adjustment for the final device. [Pg.354]

Fig. 16. Twisted nematic LCD showiag the V dark state (right), where D is the threshold voltage of the ceU. Fig. 16. Twisted nematic LCD showiag the V <V, bright state (left) and the U > dark state (right), where D is the threshold voltage of the ceU.
Fig. 17. Polymer dispersed Hquid crystal display (PDLC). (a) U < clear state, where U) is the threshold voltage of the ceU. and rij represent the indexes of refraction for light polarized parallel and perpendicular to the director of the Hquid crystal represents the index of refraction of the isotropic... Fig. 17. Polymer dispersed Hquid crystal display (PDLC). (a) U < clear state, where U) is the threshold voltage of the ceU. and rij represent the indexes of refraction for light polarized parallel and perpendicular to the director of the Hquid crystal represents the index of refraction of the isotropic...
Fig. 5. NMOS capacitance voltage characteristics where C is the oxide capacitance, A shows low frequency characteristics, and B shows high frequency characteristics. At low frequencies C approaches C for negative voltages (accumulation) and positive voltages (inversion). In the flat-band (FB) condition there is no voltage difference between the semiconductor s surface and bulk. The threshold voltage, Dp for channel formation is the point where the... Fig. 5. NMOS capacitance voltage characteristics where C is the oxide capacitance, A shows low frequency characteristics, and B shows high frequency characteristics. At low frequencies C approaches C for negative voltages (accumulation) and positive voltages (inversion). In the flat-band (FB) condition there is no voltage difference between the semiconductor s surface and bulk. The threshold voltage, Dp for channel formation is the point where the...
Silicon diodes have a very high internal resistance on loading in the transmission direction up to their threshold voltage of about -1-0.7 V. If the threshold voltage is exceeded, the internal resistance decreases. With a nonsymmetrical... [Pg.341]

The eurrent sense resistor should be sized in order to reaeh the 1.1 V eurrent sense threshold voltage at the low ae input voltage. The value then beeomes... [Pg.229]

By changing the device architecture e.g. by building multi- instead of single layer structures the physical and chemical processes in the LED can be greatly altered. For that reason the fundamental properties of the LED, such as threshold voltage, efficiency, emission color, brightness, and lifetime can be optimized in multilayer structures [43J. [Pg.160]

Nanocrystals are receiving significant attention for nano-electronics application for the development of future nonvolatile, high density and low power memory devices [1-3]. In nanocrystal complementary metal oxide semiconductor (CMOS) memories, an isolated semiconductor island of nanometer size is coupled to the channel of a MOS field effect transistor (MOSFET) so that the charge trapped in the island modulates the threshold voltage of the transistor (Fig. 1). [Pg.71]

An inhibitory input increases the influx of Cl to make the inside of the neuron more negative. This hyperpolarisation, the inhibitory postsynaptic potential (IPSP), takes the membrane potential further away from threshold and firing. It is the mirror-image of the EPSP and will reduce the chance of an EPSP reaching threshold voltage. [Pg.13]

The operation principle of these TFTs is identical to that of the metal-oxide-semiconductor field-effect transistor (MOSFET) [617,618]. When a positive voltage Vg Is applied to the gate, electrons are accumulated in the a-Si H. At small voltages these electrons will be localized in the deep states of the a-Si H. The conduction and valence bands at the SiN.v-a-Si H interface bend down, and the Fermi level shifts upward. Above a certain threshold voltage Vth a constant proportion of the electrons will be mobile, and the conductivity is increased linearly with Vg - Vih. As a result the transistor switches on. and a current flows from source to drain. The source-drain current /so can be expressed as [619]... [Pg.177]


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Teflon-Based Electret Layers for Threshold Voltage Tuning

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