Auger electron spectroscopy quantitative elemental surface

As a surface analytical tool, SIMS has several advantages over X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). SIMS is sensitive to all elements and isotopes in the periodic table, whereas XPS and AES cannot detect H and He. SIMS also has a lower detection limit of 10 5 atomic percent (at.S) compared to 0.1 at.S and 1.0 at.% for AES and XPS, respectively. However, SIMS has several disadvantages. Its elemental sensitivity varies over five orders of magnitude and differs for a given element in different sample matrices, i.e., SIMS shows a strong matrix effect. This matrix effect makes SIMS measurements difficult to quantify. Recent progress, however, has been made especially in the development of quantitative models for the analysis of semiconductors [3-5]. 

XPS and to a lesser extent, Auger electron spectroscopy (AES) have been applied to detect the presence of and to determine the extent of surface modification. Most of these qualitative and semi-quantitative studies have monitored certain elements which occurred in the mediator and not on the unmodified surface. The sustained presence of such element(s) following... 

AES Auger Electron Spectroscopy Electrons Quantitative elemental analysis tool for determining surface composition of semiconductors and conductors. Limited to non-insulators. 

Several analytical techniques which can be used to obtain information on the chemical composition of modified surfaces are available (58,59). For example, x-ray photo electron spectroscopy (XPS) can be useful for analysis of thin layers (to depths of 20 A) on substrates. XPS can provide both qualitative and quantitative information on the elements present as well as on their oxidation state, organic structure and bonding information. Auger electron spectroscopy (AES) is a similar technique, but offers only marginal information on the chemical environment of the elements. As for XPS, AES is a highly surface-sensitive technique. It is usually the outermost 2-6 atomic layers which are analysed. These surface-sensitive techniques are very prone to interference from absorbed contaminants. Careful handling of the sample between preparation in the electrochemical cell and the characterization experiment is therefore most important. AES is quantitative only to 50% (60). Electron microprobe analysis (EPMA) provides much more accurate quantitative data. 

Auger electron spectroscopy (AES) provides qualitative elemental information relatively quickly. That it also allows fine spatial resolution and elemental mapping of the surface (known as scanning Auger microscopy, or SAM) enhances the information gained. However, quantitative elemental analysis can be complicated by... 

Auger electron spectroscopy is somewhat similar to XPS in providing surface element analysis, and involves the analysis of Auger electrons emitted from surfaces due to irradiation with an X-ray beam. It is very useful for quantitative analysis of elements on the surface." ... 

X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), and Auger electron spectroscopy (AES) are widely used materials characterization techniques belonging to the general class of methods referred to as surface analysis. Each of these techniques provides, to varying degrees, semi-quantitative elemental, chemical-state and electronic-structure information from the top 10 nm of a material. Another widely used surface analytical method covered in this book is secondary ion mass spectrometry. Chap. 4. 

---