ALPHA-STEP

Alpha-Step MC48 Alpha techno DL-alpha tocopherol Alphavims Alphenate Alphol... 

Historically, these sulfonates have been difficult to produce in good quaUty and to formulate into laundry powders because of thermal and hydrolytic stabihty problems. Used basically as an anionic, oleochemically sourced replacement for LAS, FAE sulfonate benefits include good detergency at low concentration, low environmental load, and good supply of high quaUty material (71). To avoid possible thermal stabihty problems, these sulfonates have found apphcation in Hquid products. They are used in at least one U.S. dishwashing Hquid, and the cocoyl derivative, Alpha-Step MC48, is marketed by Stepan Chemical Company. 

Thickness Measurement. The thickness of poly(I) at different coverages was obtained using a Tencor alpha-step 100 surface profile measuring system. Electrodes used were glass slides coated with Pt by electron beam evaporation. In order to produce a "step" across which the stylus of the surface profiler was drawn, Apiezon N grease was applied to part of the electrode surface and was removed with CH2CI2 after derivatization with poly(I). 

Surface roughness was measured according to ANSI standard 1346.1-(1978) using a Tencor Instruments Alpha-Step 200 stylus profilometer located at the National Nanofabrication Facility of Cornell. Five surface roughness measurements were made for each sample and their average values recorded. Details of the experimental apparatus set-up and its operation are given elsewhere (Dems, B. C. et. al. Inti. Polvm. Proc.. in press.). 

Surface Roughness measured with Tencor Instruments Alpha-Step 200 stylus profilometer per ANSI Standard 1346.1-(1978)... 

CEL dye. A CEL solution was obtained by dissolving poly(N-vinylpyrrolidone) (PVP) (7 g) and Dl (5.8 g) in 50 wt% aqueous acetic acid. (87.2 g). The CEL layer was spin-coated onto a photoresist, RI-7000P (Hitachi Chemical Co.), and baked at 80T for 20 minutes. Exposure was performed with an in-house i-line reduction projection aligner. The resist was developed in a 2. 38 wt% tetramethylammonium hydroxide aqueous solution. The film thickness was measured with an Alpha-step 200 (Tencor)... 

The polymer resists used in this study were either synthesized in-house or obtained from Aldrich Chemicals or Polyscience, Inc. Photoresist samples were obtained from KTI Chemicals or the manufacturer. The polymers were dissolved in suitable solvents and spin coated onto oxidized Si wafers or Cr-coated glass test substrates. The polymer film thicknesses were measured either by a Taylor-Hobson proficorder or Tencor Alpha-step. 

Figure 1 Computerized surface profilometer, Alpha-Step 200 Tencor Instruments,...

In manual dishwash, a high-SME product (such as Alpha-Step MC48 from Stepan, SME SFA 5 1) based on a distilled coconut methyl ester is used as a partial replacement for LAS and alkyl ether sulphate. Substitution of SME for LAS/AES can give enhanced... 

All sensitive layers were prepared from solutions of Makrolon in mixtures of chloroform and dichlorobenzene by a spin-coating process. By adjustment of the rotation speed and time the thickness of the layers were varied between 35 nm and 455 nm. Layer thicknesses and refractive indices were determined by spectral ellipsometry. Furthermore the polymer thicknesses were verified by a surface profilometer (Alpha Step 500, Tencor Instruments, Mountain View, USA). 

Film thickness was determined with an Alpha Step 200 (Tencor) profilometer. 

Instrumental analysis was performed with an IBM IR/32 (FTIR), Hewlett Packard 8450A UV/Vis spectrophotometer, and a Tencor Alpha Step 200 (film thickness). Photomicrographs were taken with a Reichert-Jung Polyvar-met optical microscope and electron micrographs with a Philips SEM505. 

Samples were exposed to synchrotron radiation through a gold-on-boron nitride mask and then developed using various mixtures of isopropyl alcohol (IPA) and methyl isobutyl ketone (NIBK). Development was conducted under stirred conditions using a constant temperature bath at 23°C and was terminated by blow drying with Freon gas. Film thicknesses were measured using a Tencor Alpha Step. 

After exposure, the resist film was dipped in a NMD-3 developer (tetramethylammonium hydroxide solution, Tokyo Ohka Kogyo Co.), which was diluted with water to an appropriate concentration. Exposure characteristics were obtained by plotting normalized film thickness remaining vs exposure time under constant light intensity. Film thickness was measured by Alpha Step 200. 

Surface Analysis. The resist etching process was studied by measuring changes in the resist thickness versus etching time using a mechanical stylus surface profiler (Alpha-Step 200, Tencor Instruments, Inc.). 

Film thickness could be varied from 500 nm to 800 nm by changing the polymer concentration in the solution and the spinning speed. The film thickness was measured either by means of the X-ray grazing angle reflectivity method, or by an Alpha-step profilometer, in the case of thicker films. Independent low-signal capacitance measurements yield consistent results for film thickness. 

Alpha-Step . [Stepan] Alpha sulfo methyl esters surfactants for dishwashing liqs., fine fid>iic washes, hard surface cleaners, bubble baths. 

Alpha-Step LD-200 Steol CS-460 Sodium Chloride Opaci fi er Mixing Procedure ... 

Ingredi ents Alpha-Step LD-200 Sodi urn Ch1ori de Water... 

Charge water. Blend in Alpha-Step ML-A and Ninol 40-CD with good agitation. Blend in Bio Soft D-62. Add sodium chloride mix until homogeneous. Adjust pH to 6.5-7.5 with sodium hydroxide to increase or sulfuric acid to decrease. 

Ingredi ents % By Wt. Alpha-Step ML-A 10.0 Bio Soft D-62 23.0 Ninol 40-C0 2.0 Sodium Chloride 1.5 Water 73.5... 

Inqredi ents Alpha-Step ML-A Bio Soft D-62 Water... 

Bio-Soft S-100 Sodium hydroxide (50%) Alpha-Step ML-A Stepanate SXS Water, D.I. 

Add Alpha-Step ML-A and mix until clear and uniform. Properti es ... 

Add Stepanate SXS and sodium hydroxide to water. Add Bio-Soft S-100 while mixing to about a pH of 7. Add Alpha-Step ML-A and mix. Heat to 60C and add EGMS. Continue mixing until EGMS has dissolved and product comes back to ambient temperature. 

Alpha-Step ML-40 Bio Soft D-62 Steol CS-460 Ninol 40-CO Water... 

Ingredi ents Water, D. I. Alpha-Step ML-40 Steol CS-330 Ninol 40CO Sodium chloride... 

Inqredi ents % by Wt Water, D.I. 50. Alpha-Step ML-40 28. Ninol 30-LL 3. Steol CS-330 6. Sodium chloride 9. 

Add Alpha-Step ML-40 and Neodol 25-7 or Makon 10 in that ord Mix until clear and uniform. Add dye and fragrance as desir Properties e... 

Alpha-Step ML-40 able. ML-40 acts hard water, and al hydrotrope or alcohol. 

Ingredi ents % bv Wt, Water, D.I. 54.2 Sodium tallow/coco (80 20) soap 4.0 Ninol 11-CM 2.5 Triethanolamine 2.0 Alpha-Step ML-40 37.3 Mixing Procedure ... 

Charge tank with water and add sodium hydroxide. Add Bio-Soft S-100 while mixing. Adjust pH to about 7 with sodium hydroxide or Bio-Soft S-100 as required. Add Alpha-Step ML-40. Adjust final pH to requirements. 

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