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Thin films surface conductivity

Figure 24. Models illustrating the source of chemical capacitance for thin film mixed conducting electrodes, (a) Oxygen reduction/oxidation is limited by absorption/de-sorption at the gas-exposed surface, (b) Oxygen reduction/ oxidation is limited by ambipolar diffusion of 0 through the mixed conducting film. The characteristic time constant for these two physical situations is different (as shown) but involves the same chemical capacitance Cl, as explained in the text. Figure 24. Models illustrating the source of chemical capacitance for thin film mixed conducting electrodes, (a) Oxygen reduction/oxidation is limited by absorption/de-sorption at the gas-exposed surface, (b) Oxygen reduction/ oxidation is limited by ambipolar diffusion of 0 through the mixed conducting film. The characteristic time constant for these two physical situations is different (as shown) but involves the same chemical capacitance Cl, as explained in the text.
Electrically conducting polymer particles such as polypyrrole and polyaniline could also be prepared by dispersion polymerization in aqueous ethanol (31). The oxidation polymerization of pyrrole and aniline has been carried out at the electrode surfaces so far and formed a thin film of conducting polymer. On the other hand, polypyrrole precipitates as particles when an oxidizing reagent is added to a pyrrole dissolved ethanol solution, which contains a water-soluble stabilizer. In this way electrically conducting polymer particles are obtained and, in order to add more function to them, incorporation of functional groups, such as aldehyde to the surface, and silicone treatment were invented (32). [Pg.621]

A multi-layer module 18 consisting of thin insulating wafers 20 formed from a ceramic material is prepared. The wafers have a large number of thin film electrically-conducting leads on their surfaces. The leads end at points 22 located on the focal plane surface 24 of the module. The lengths of the ceramic wafers are staggered to give access to lead pads 26 on the face of each wafer. [Pg.317]

Electrochemical deposition has attracted increasing attention as a technique for nanowire fabrication. Traditionally, electrochemistry has been used to grow thin films on conducting surfaces. Because electrochemical... [Pg.177]

Silicon thin film thermal conductivities are predicted using equilibrium molecular dynamics and the Grccn-Kubo relation. Periodic boundary conditions are applied in the direetions parallel to the thin film surfaees (Fig. 5). Atoms near the surfaces of the thin film are subjeeted to the above-described repulsive potential in addition to the Stillinger-Weber potential [75]. Simulations were also performed adding to each surface four layers of atoms kept frozen at their crystallographic positions, in order to eompare the dependence of the predieted thermal eonduetivities on the surface boundary eonditions. We found that the thermal eonduetivities obtained using frozen atoms or the repulsive potential are identical within the statistical deviations, exeept for the in-plane thermal eonduetivity of films with thickness less than 10 nm [79]. Therefore, in the present study, we present only the predietions obtained with the repulsive potential. [Pg.391]

There are four main problems which arise when enhancement factors are evaluated. The first problem is that we generally do not know the amount of material on the surface, especially in electrochemical, colloid, and thin-film studies conducted in the ambient or in solution. There are only a few studies which have used radiochemical techniques for electrodes " or colloids. " A few studies attempted to measure surface coverages from the... [Pg.256]

Thin films of conductive polymers like polypyrrole, polyaniline, etc are also used for the surface modification of the semiconductor electrodes [26, 27]. Their performance mechanism has not yet been deciphered. Most likely, the coating is a combination of a protective film and the charge carrier, the more so that reversible redox couples are used to be introduced into films [28], as well as catalytically-active admixtures like Ru02 [29]. Such films were used to stabilize a promising "solar" electrode material, amorphous silicon [30]. [Pg.427]

Electrodeposition. In this process, a conductive substrate is placed in an electrolyte solution (typically aqueous) that contains a salt of the material of interest. When an electrical potential is apphed between the substrate and a counter electrode, redox chemistry takes place at the surface of the substrate which deposits material. Complex pulse trains and/or high-pulse frequencies are sometimes used to direct current flow and favor desired reactions. A postsynthesis calcination is often performed to reach a desired material phase. Electrodeposition is restricted to deposition of electrically conductive materials and produces polycrystaUine and amorphous films. This process is also appropriate for thin film surface treatment of PEC electrodes, such as electrocatalyst deposition. [Pg.18]

Both the polymers are dark in color and exhibit semiconductivity and paramagnetism. The electric conductivity measurements are performed on peUets and on thin films in sandwich and surface ceUs. [Pg.534]

Spray Pyrolysis. In spray pyrolysis, a chemical solution is sprayed on a hot surface where it is pyrolyzed (decomposed) to give thin films of either elements or, more commonly, compounds (22). Eor example, to deposit CdS, a solution of CdCl plus NH2CSNH2 (thiourea) is sprayed on a hot surface. To deposit Iu202, InCl is dissolved in a solvent and sprayed on a hot surface in air. Materials that can be deposited by spray pyrolysis include electrically conductive tin—oxide and indium/tin oxide (ITO), CdS, Cu—InSe2, and CdSe. Spray pyrolysis is an inexpensive deposition process and can be used on large-area substrates. [Pg.528]

The energy densities of laser beams which are conventionally used in the production of thin films is about 10 — 10 Jcm s and a typical subsU ate in the semiconductor industry is a material having a low drermal conductivity, and drerefore dre radiation which is absorbed by dre substrate is retained near to dre surface. Table 2.8 shows dre relevant physical properties of some typical substrate materials, which can be used in dre solution of Fourier s equation given above as a first approximation to dre real situation. [Pg.83]

Applications Although a wide range of metals can be sputtered, the method is often commercially restricted by the low rate of deposition. Applications include the coating of insulating surfaces, e.g. of crystal vibrators, to render them electrically conducting, and the manufacture of some selenium rectifiers. The micro-electronics industry now makes considerable use of sputtering in the production of thin-film resistors and capacitors . ... [Pg.442]


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Film conductance

Films conducting

Films conductive

Films conductivity

Surface conductance

Surface conducting

Surface films

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Thin Films and Surface Conductivity

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