Ray Photoelectron Spectroscopy XPS

Electronic spectra of surfaces can give information about what species are present and their valence states. X-ray photoelectron spectroscopy (XPS) and its variant, ESC A, are commonly used. Figure VIII-11 shows the application to an A1 surface and Fig. XVIII-6, to the more complicated case of Mo supported on TiOi [37] Fig. XVIII-7 shows the detection of photochemically produced Br atoms on Pt(lll) [38]. Other spectroscopies that bear on the chemical state of adsorbed species include (see Table VIII-1) photoelectron spectroscopy (PES) [39-41], angle resolved PES or ARPES [42], and Auger electron spectroscopy (AES) [43-47]. Spectroscopic detection of adsorbed hydrogen is difficult, and... 

X-ray photoelectron spectroscopy (XPS), also called electron spectroscopy for chemical analysis (ESCA), is described in section Bl.25,2.1. The most connnonly employed x-rays are the Mg Ka (1253.6 eV) and the A1 Ka (1486.6 eV) lines, which are produced from a standard x-ray tube. Peaks are seen in XPS spectra that correspond to the bound core-level electrons in the material. The intensity of each peak is proportional to the abundance of the emitting atoms in the near-surface region, while the precise binding energy of each peak depends on the chemical oxidation state and local enviromnent of the emitting atoms. The Perkin-Elmer XPS handbook contains sample spectra of each element and bindmg energies for certain compounds [58]. 

X-ray photoelectron spectroscopy (XPS) is among the most frequently used surface chemical characterization teclmiques. Several excellent books on XPS are available [1, 2, 3, 4, 5, 6 and 7], XPS is based on the photoelectric effect an atom absorbs a photon of energy hv from an x-ray source next, a core or valence electron with bindmg energy is ejected with kinetic energy (figure Bl.25.1) ... 

Figure 8.1 Processes occurring in (a) ultraviolet photoelectron spectroscopy (UPS), (b) X-ray photoelectron spectroscopy (XPS) and (c) Auger electron spectroscopy (AES)...

Other techniques in which incident photons excite the surface to produce detected electrons are also Hsted in Table 1. X-ray photoelectron Spectroscopy (xps), which is also known as electron spectroscopy for chemical analysis (esca), is based on the use of x-rays which stimulate atomic core level electron ejection for elemental composition information. Ultraviolet photoelectron spectroscopy (ups) is similar but uses ultraviolet photons instead of x-rays to probe atomic valence level electrons. Photons are used to stimulate desorption of ions in photon stimulated ion angular distribution (psd). Inverse photoemission (ip) occurs when electrons incident on a surface result in photon emission which is then detected. 

X-ray Photoelectron Spectroscopy. X-ray photoelectron spectroscopy (xps) and Auger electron spectroscopy (aes) are related techniques (19) that are initiated with the same fundamental event, the stimulated ejection of an electron from a surface. The fundamental aspects of these techniques will be discussed separately, but since the instmmental needs required to perform such methods are similar, xps and aes instmmentation will be discussed together. 

High quahty SAMs of alkyltrichlorosilane derivatives are not simple to produce, mainly because of the need to carefully control the amount of water in solution (126,143,144). Whereas incomplete monolayers are formed in the absence of water (127,128), excess water results in facile polymerization in solution and polysiloxane deposition of the surface (133). Extraction of surface moisture, followed by OTS hydrolysis and subsequent surface adsorption, may be the mechanism of SAM formation (145). A moisture quantity of 0.15 mg/100 mL solvent has been suggested as the optimum condition for the formation of closely packed monolayers. X-ray photoelectron spectroscopy (xps) studies confirm the complete surface reaction of the —SiCl groups, upon the formation of a complete SAM (146). Infrared spectroscopy has been used to provide direct evidence for the hiU hydrolysis of methylchlorosilanes to methylsdanoles at the soHd/gas interface, by surface water on a hydrated siUca (147). 

Near edge x-ray absorption fine stmcture spectroscopy (nexafs) and x-ray photoelectron spectroscopy (xps) have been used to study SAMs of OTS, octadecyltrimethoxysilane (OTMS), CH2(CH2) ySi(OCH2)3, and (17-aminoheptadecyl)-trimethoxysilane (AHTMS), H2N(CH2) ySi(OCH3)3 (149). A number of important observations have been reported. First, the chains in OTS SAMs are practicaUy perpendicular to the substrate surface (tilt angle... 

In other articles in this section, a method of analysis is described called Secondary Ion Mass Spectrometry (SIMS), in which material is sputtered from a surface using an ion beam and the minor components that are ejected as positive or negative ions are analyzed by a mass spectrometer. Over the past few years, methods that post-ion-ize the major neutral components ejected from surfaces under ion-beam or laser bombardment have been introduced because of the improved quantitative aspects obtainable by analyzing the major ejected channel. These techniques include SALI, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS), and Sputtered Neutral Mass Spectrometry (SNMS) or electron-gas post-ionization. Post-ionization techniques for surface analysis have received widespread interest because of their increased sensitivity, compared to more traditional surface analysis techniques, such as X-Ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES), and their more reliable quantitation, compared to SIMS. 

Roughness from sputtering causes loss of depth resolution in depth profiling for Auger Electron Spectroscopy (AES), X-Ray Photoelectron Spectroscopy (XPS), and SIMS. 

X-ray photoelectron spectroscopy (XPS) is currently the most widely used surface-analytical technique, and is therefore described here in more detail than any of the other techniques. At its inception hy Sieghahn and coworkers [2.1] it was called ESCA (electron spectroscopy for chemical analysis), hut the name ESCA is now considered too general, because many surface-electron spectroscopies exist, and the name given to each one must be precise. The name ESCA is, nevertheless, still used in many places, particularly in industrial laboratories and their publications. Briefly, the reasons for the popularity of XPS are the exceptional combination of compositional and chemical information that it provides, its ease of operation, and the ready availability of commercial equipment. 

Surface analysis has made enormous contributions to the field of adhesion science. It enabled investigators to probe fundamental aspects of adhesion such as the composition of anodic oxides on metals, the surface composition of polymers that have been pretreated by etching, the nature of reactions occurring at the interface between a primer and a substrate or between a primer and an adhesive, and the orientation of molecules adsorbed onto substrates. Surface analysis has also enabled adhesion scientists to determine the mechanisms responsible for failure of adhesive bonds, especially after exposure to aggressive environments. The objective of this chapter is to review the principals of surface analysis techniques including attenuated total reflection (ATR) and reflection-absorption (RAIR) infrared spectroscopy. X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and secondary ion mass spectrometry (SIMS) and to present examples of the application of each technique to important problems in adhesion science. 

In X-ray photoelectron spectroscopy (XPS), a beam of soft X-rays with energy hv s. focused onto the surface of a solid that is held under an ultra-high vacuum, resulting in the ejection of photoelectrons from core levels of the atoms in the solid [20]. Fig. 15 shows an energy level diagram for an atom and illustrates the processes involved in X-ray-induced photoelectron emission from a solid. 

The interface properties can usually be independently measured by a number of spectroscopic and surface analysis techniques such as secondary ion mass spectroscopy (SIMS), X-ray photoelectron spectroscopy (XPS), specular neutron reflection (SNR), forward recoil spectroscopy (FRES), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), infrared (IR) and several other methods. Theoretical and computer simulation methods can also be used to evaluate H t). Thus, we assume for each interface that we have the ability to measure H t) at different times and that the function is well defined in terms of microscopic properties. 

The most widely used techniques for surface analysis are Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS), Raman and infrared spectroscopy, and contact angle measurement. Some of these techniques have the ability to determine the composition of the outermost atomic layers, although each technique possesses its own special advantages and disadvantages. 

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