Plasma-deposited polymers

Inorganic monomers can be used to plasma-deposit polymer-type films (16). At high plasma energies, the monomers are largely decomposed and can be used to form materials such as amorphous hydrogen-containing siUcon films from SiH for thin-film solar-ceU materials. 

X-ray photoelectron spectroscopy (XPS) was used for elemental analysis of plasma-deposited polymer films. The photoelectron spectrometer (Physical Electronics, Model 548) was used with an X-ray source of Mg Ka (1253.6 eV). Fourier transform infrared (FTIR) spectra of plasma polymers deposited on the steel substrate were recorded on a Perkin-Elmer Model 1750 spectrophotometer using the attenuated total reflection (ATR) technique. The silane plasma-deposited steel sample was cut to match precisely the surface of the reflection element, which was a high refractive index KRS-5 crystal. 

Elemental analysis of surfaces of plasma-deposited polymers on steel substrates... 

Slipcoat Plasma deposited polymer solid Lubricity Total AL... 

Warner et al. [37] Plasma-deposited polymer Irregular matrix of surface and reentrant cavities... 

The conventional bilayer resist systems in which the top imaging layer (typically organosilicon polymer) also serves as an etch mask was first proposed by Hatzakis et al. in 1981, ostensibly for electron-beam lithography. Since then, a number of organosilicon resists for bilayer resist systems have been reported for use in near-UV, DUV, mid-UV, electron-beam, and x-ray applications, a good review of which has been provided by Ohnishi et al. In recent times, negative-tone resist systems and processes based on silicon-backbone polymers such as polysilanes,polysilynes, and plasma-deposited polymers have been developed for 193-nm lithography. 

Oran, U., Swaraj, S., Lippitz, A., Unger, W.E.S., 2006. Surface analysis of plasma deposited polymer films, 7. Plasma Processes Polym. 3, 288—298. 

In conclusion, plasma polymerization provided the possibility to deposit carefully designed, highly adherent and pinhole-free thin polymer films onto various substrates, and thus to control adhesion between various types of solid surface. Moreover, plasma-deposited polymer films can be used to protect metals and other substrates from environmental attacks, for instance by corrosive agents. Further information on these topics is available in Ref. [80]. 

In the recent development of new polymeric materials, plasma polymerization processes have become an important branch of polymer chemistry. The complex plasma reactions produce polymers of different structure and properties from their counterparts polymerized hy conventional methods. From an application viewpoint, it is noteworthy that plasma-deposited polymer films are highly crosslinked, adhere tenaciously to a wide range of substrates and their structure and thickness can be controlled closely by the plasma conditions employed. 

Chinn J A, Horbett T A, Ratner B D, Sohway M B, Hague Y and Hausohka S D 1989 Enhanoement of serum fibroneotin adsorption and the olonal plating of swiss mouse-3T3 fibroplast and MM14-mouse myoblast sells on polymer substrates modified by radiofrequenoy plasma deposition J. Colloid Interface Sol. 127 67-87... 

Plasma Deposition, Treatment and Etching of Polymers ed R d Agostino (Boston, MA Academic) pp 463-516... 

Plasma-deposited siUcon nitride contains large amounts of hydrogen, typically in the range of 20—25 atomic % H, and has polymer-like properties. The electrical resistivity of the film depends on the deposition temperature, the film stoichiometry, and the amounts of hydrogen and oxygen in the film. 

Plasma-deposited fluorocarbon polymers or vacuum-deposited Teflon, polyimide, or parylene... 

Glow discharge or "cold" plasmas are gaining increased currency for the deposition of novel and potentially valuable macromolecular coatings. The range of properties attainable by a plasma-polymer is wide, and depends critically on such variables of the plasma deposition process as choice of monomer, substrate temperature (T ), power density (p), the excitation frequency (v), and others incluSing monomer flow rate, reactor geometry, etc... Control over these variables can produce crossllnked, dense deposits which adhere tenaciously to... 

As stated, the capability of plasma deposits to reduce the access of water to corrosion-sensitive surfaces may be an important motivation for their application in corrosion protection. In order to study this property, Kapton polyimide film was selected as the substrate because of its high inherent permeability to water and its ability to resist elevated temperatures. The response of Kapton film overcoated by PPHMDSO to the permeation of water vapor is shown in Fig. 1. Clearly, the presence of the organo-silicone plasma film greatly reduces water permeation. The magnitude of the effect is much enhanced when plasma polymers are produced at high T and p. 

Li, Z.F. and Nctravali, A.N. (1992). Surface modification of UHSPE fibers through allylamine plasma deposition. II. effect on fiber and fiber/epoxy interface. J. Appl. Polym. Sci. 44, 319-332. 

Plasma surface treatment of many polymers, including fabrics, plastics, and composites, often occurs. The production of ultra-thin films via plasma deposition is important in microelectronics, biomaterials, corrosion protection, permeation control, and for adhesion control. Plasma coatings are often on the order of 1 100 nm thick. 

The fragmentation process depends on how much electrical energy (RF power) is supplied to maintain the plasma, how much monomer is introduced into the plasma, and where the monomer molecules interact with activated species of the plasma. Yasuda proposed a controlling parameter or W/FM value, where W, F, and M are RF power [J/s], the monomer flow rate [mol/s], and the molecular weight of the monomer [kg/mol], respectively [21]. The W/FM parameter is an apparent input energy per unit of monomer molecules [J/kg] therefore, the magnitude of the W/FM parameter is considered to be proportional to the concentration of activated species in the plasma. The polymer formation rate (polymer deposition rate) increases by increasing the W/FM parameter in the operational condition, whereby... 

Characterization of this tumbler reactor was carried out via the deposition rate measurement of a plasma polymer film on silicon wafers under different conditions. In the longitudinal direction, the deposition rate decreases significantly when the plasma moves from the central plasma zone to the remote zone. With appropriate shielding, the decay in deposition rate in the longitudinal direction can be effectively reduced. By means of the stirring, a uniform distribution of the plasma deposition is achieved within the chamber. 

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