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Plasma constants

Perrin J, Leroy O and Bordage M C 1996 Cross-sections, rate constants and transport coefficients in silane chemistry Contr. Plasma Phys 36 3-49... [Pg.2812]

In practical applications, gas-surface etching reactions are carried out in plasma reactors over the approximate pressure range 10 -1 Torr, and deposition reactions are carried out by molecular beam epitaxy (MBE) in ultrahigh vacuum (UHV below 10 Torr) or by chemical vapour deposition (CVD) in the approximate range 10 -10 Torr. These applied processes can be quite complex, and key individual reaction rate constants are needed as input for modelling and simulation studies—and ultimately for optimization—of the overall processes. [Pg.2926]

The section on Spectroscopy has been retained but with some revisions and expansion. The section includes ultraviolet-visible spectroscopy, fluorescence, infrared and Raman spectroscopy, and X-ray spectrometry. Detection limits are listed for the elements when using flame emission, flame atomic absorption, electrothermal atomic absorption, argon induction coupled plasma, and flame atomic fluorescence. Nuclear magnetic resonance embraces tables for the nuclear properties of the elements, proton chemical shifts and coupling constants, and similar material for carbon-13, boron-11, nitrogen-15, fluorine-19, silicon-19, and phosphoms-31. [Pg.1284]

Dielectric Film Deposition. Dielectric films are found in all VLSI circuits to provide insulation between conducting layers, as diffusion and ion implantation (qv) masks, for diffusion from doped oxides, to cap doped films to prevent outdiffusion, and for passivating devices as a measure of protection against external contamination, moisture, and scratches. Properties that define the nature and function of dielectric films are the dielectric constant, the process temperature, and specific fabrication characteristics such as step coverage, gap-filling capabihties, density stress, contamination, thickness uniformity, deposition rate, and moisture resistance (2). Several processes are used to deposit dielectric films including atmospheric pressure CVD (APCVD), low pressure CVD (LPCVD), or plasma-enhanced CVD (PECVD) (see Plasma technology). [Pg.347]

Once the steady-state concentration is known, the rate of dmg clearance determines how frequendy the dmg must be adininistered. Because most dmg elimination systems do not achieve saturation under therapeutic dosing regimens, clearance is independent of plasma concentration of the dmg. This first-order elimination of many dmgs means that a constant fraction of dmg is eliminated per unit time. In the simplest case, clearance can be deterrnined by the dose and the area under the curve (AUC) describing dmg concentration as a function of total time ... [Pg.271]

The two most common temporal input profiles for dmg delivery are zero order (constant release), and half order, ie, release that decreases with the square root of time. These two profiles correspond to diffusion through a membrane and desorption from a matrix, respectively (1,2). In practice, membrane systems have a period of constant release, ie, steady-state permeation, preceded by a period of either an increasing (time lag) or decreasing (burst) flux. This initial period may affect the time of appearance of a dmg in plasma on the first dose, but may become insignificant upon multiple dosing. [Pg.224]

In addition to the elimination rate constant, the half-life (T/i) another important parameter that characterizes the time-course of chemical compounds in the body. The elimination half-life (t-1/2) is the time to reduce the concentration of a chemical in plasma to half of its original level. The relationship of half-life to the elimination rate constant is ti/2 = 0.693/ki,i and, therefore, the half-life of a chemical compound can be determined after the determination of k j from the slope of the line. The half-life can also be determined through visual inspection from the log C versus time plot (Fig. 5.40). For compounds that are eliminated through first-order kinetics, the time required for the plasma concentration to be decreased by one half is constant. It is impottant to understand that the half-life of chemicals that are eliminated by first-order kinetics is independent of dose. ... [Pg.272]

FIGURE 5.40 Schematic representation of the concentration of a chemical in the plasma as a function of time after an intravenous injection if the body acts as a one-compartment system and elimination of the chemical obeys first-order kinetics with a rate constant... [Pg.273]

X 10 M), and an equivalent amount of OH (its usual concentration in plasma) would swamp the buffer system, causing a dangerous rise in the plasma pH. How, then, can this bicarbonate system function effectively The bicarbonate buffer system works well because the critical concentration of H2CO3 is maintained relatively constant through equilibrium with dissolved CO2 produced in the tissues and available as a gaseous CO2 reservoir in the lungs. ... [Pg.52]

A surgical implant is constantly bathed in extracellular tissue fluid. Basically water, this fluid contains electrolytes, complex compounds, oxygen and carbon dioxide. Electrolytes present in the largest amounts are sodium (Na ) and chloride (Cl ) ions. Most of the fluids existing in the body (such as blood, plasma and lymph) have a chloride content (and pH) somewhat similar to that of sea water (about 5 to 20g/l and pH about 8) . [Pg.472]

FIGURE 8.25 Repeated oral administration of drags leads to steady-state plasma concentrations. If elimination is rapid and administration not often enough, then an elevated and therapeutically effective steady-state concentration may not be achieved (green lines). In contrast, if elimination is very slow (or administration too often), then an accumulation of the drag may be observed with no constant steady state (red line). Bine line shows a correct balance between frequency of administration and elimination. [Pg.168]

Between 5,000 and 100,000 GR molecules are found within almost every cell of the organism. The affinity constant for cortisol comes to around 30 nM, which is in the range of the concentration of free hormone in the plasma under normal conditions. Consequently, receptor occupancy can be expected to be 10-70%. This suggests that changes in cortisol secretion such as under stress conditions, directly translate into alterations in GR occupancy, leading to transcriptional responses. [Pg.544]


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See also in sourсe #XX -- [ Pg.74 ]




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