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Polymer Photochemistry

Mead Imaging (photochemistry, polymers and emulsions, and separation techniques) ... [Pg.127]

Elsevier-Applied Science Publishers have recently begun to publish a Developments in... series. The separate topics covered are adhesives, composite materials, injection moulding, polymer characterization, polymer degradation, polymer fracture, polymer photochemistry, polymer stabilization, polyurethanes, PVC (production and processing), reinforced plastics, rubber and rubber composites, and rubber technology. [Pg.63]

Fig. 5. Chemistry of cyclized mbbei—bis-a2ide negative acting resist, (a) Preparation of cyclized mbber resin from polyisoprene (b) photochemistry of aromatic bis-a2ide sensiti2ers. The primary photoproduct is a highly reactive nitrene which may combine with molecular oxygen to form oxygenated products, or may react with the resin matrix by addition or insertion to form polymer—polymer linkages. Fig. 5. Chemistry of cyclized mbbei—bis-a2ide negative acting resist, (a) Preparation of cyclized mbber resin from polyisoprene (b) photochemistry of aromatic bis-a2ide sensiti2ers. The primary photoproduct is a highly reactive nitrene which may combine with molecular oxygen to form oxygenated products, or may react with the resin matrix by addition or insertion to form polymer—polymer linkages.
E. McKeUar and N. E. Aden, Photochemistry of Man Made Polymers, AppHed Science, London, 1978. [Pg.530]

Guillet J (1985) In Polymer photophysics and photochemistry. Cambridge University Press, London, p 241... [Pg.96]

Aqueous plutonium photochemistry is briefly reviewed. Photochemical reactions of plutonium in several acid media have been indicated, and detailed information for such reactions has been reported for perchlorate systems. Photochemical reductions of Pu(VI) to Pu(V) and Pu(IV) to Pu(III) are discussed and are compared to the U(VI)/(V) and Ce(IV)/(III) systems respectively. The reversible photoshift in the Pu(IV) disproportionation reaction is highlighted, and the unique features of this reaction are stressed. The results for photoenhancement of Pu(IV) polymer degradation are presented and an explanation of the post-irradiation effect is offered. [Pg.263]

The primary reason for studying aqueous plutonium photochemistry has been the scientific value. No other aqueous metal system has such a wide range of chemistry four oxidation states can co-exist (III, IV, V, and VI), and the Pu(IV) state can form polymer material. Cation charges on these species range from 1 to 4, and there are molecular as well as metallic ions. A wide variety of anion and chelating complex chemistry applies to the respective oxidation states. Finally, all of this aqueous plutonium chemistry could be affected by the absorption of light, and perhaps new plutonium species could be discovered by photon excitation. [Pg.264]

Visible and UV spectrophotometric techniques are most convenient for studying the polymer and various oxidation states of plutonium. The spectra of the plutonium states and the procedure for resolution of the concentrations were previously described (9 ). Changes in the relative concentrations of the oxidation states and of the polymer generally are determined from corresponding changes in the spectra and a comparison of the changes to standard spectra of the various states. These techniques have been used exclusively for studying the photochemistry of aqueous plutonium. [Pg.264]

In this chapter the topochemical [2+2] photoreactions of diolefin crystals are reviewed from the viewpoints of organic photochemistry, analysis of reaction mechanism, and crystallography as well as in terms of synthetic polymer chemistry and polymer physics. [Pg.121]

Hiroshi Fukumura received his M.Sc and Ph.D. degrees from Tohoku University, Japan. He studied biocompatibility of polymers in the Government Industrial Research Institute of Osaka from 1983 to 1988. He became an assistant professor at Kyoto Institute of Technology in 1988, and then moved to the Department of Applied Physics, Osaka University in 1991, where he worked on the mechanism of laser ablation and laser molecular implantation. Since 1998, he is a professor in the Department of Chemistry at Tohoku University. He received the Award of the Japanese Photochemistry Association in 2000, and the Award for Creative Work from The Chemical Society Japan in 2005. His main research interest is the physical chemistry of organic molecules including polymeric materials studied with various kinds of time-resolved techniques and scanning probe microscopes. [Pg.335]

Masahiro Irie received his B.S. and M.S. degrees from Kyoto University and his Ph.D. in radiation chemistry from Osaka University. He joined Hokkaido University as a research associate in 1968 and started his research on photochemistry. In 1973 he moved to Osaka University and developed various types of photoresponsive polymers. In 1988 he was appointed Professor at Kyushu University. In the middle of the 1980 s he invented a new class of photochromic molecules - diaryl-ethenes - which undergo thermally irreversible and fatigue resistant photochromic reactions. He is currently interested in developing singlecrystalline photochromism of the diarylethene derivatives. [Pg.335]

During the last few years, new developments in polymer photochemistry have made it possible to graft various functional monomers onto surfaces of inert polymers like polyethylene, polypropylene and polyethyleneterephthalate. In the first attempts, initiator and monomer were transferred in vapor phase into a "UV Cure" irradiator containing the polymer sheet to be surface grafted. [Pg.168]

McKellar, J.F., and Allen, N.S., "Photochemistry of Man-Made Polymers",Applied Science Publishers,London, 1979,p.10. [Pg.200]

The TT-electron system-substituted organodisilanes such as aryl-, alkenyl-, and alkynyldisilanes are photoactive under ultraviolet irradiation, and their photochemical behavior has been extensively studied (1). However, much less interest has been shown in the photochemistry of polymers bearing TT-electron substituted disilanyl units (2-4). In this paper, we report the synthesis and photochemical behavior of polysiloxanes involving phenyl(trimethylsilyl)-siloxy units and silicon polymers in which the alternate arrangement of a disilanylene unit and a phenylene group is found regularly in the polymer backbone. We also describe lithographic applications of a double-layer system of the latter polymers. [Pg.209]

Low-molecular weight organotin compounds are known to easily undergo chemical conversions upon UV-irradiation1). However, the photochemistry of organotin polymers is still obscure. [Pg.132]

This paper reports a study of the photochemistry of polymers and copolymers containing o-tolyl vinyl ketone units. [Pg.20]

J.F. McKellar and N.S. Allen, Photochemistry of Man-Made Polymers, Appl. Sci. Publishers, London, 1979. [Pg.92]

During the course of these studies, it was found that fluorescence intensity from the polymeric films rapidly decreased on continued excitation in a fluorescence spectrophotometer (ca. 30% loss in 1 min for L). Herein, we (1) elaborate further upon the fluorescence loss studies, (2) provide direct evidence for RET from fluorescence lifetime measurements, and (3) present preliminary findings on the photochemistry of model compounds for polymer 1. The results support the conclusion, from previous studies, that the effectiveness of added stabilizer decreases with time due to formation of a photoproduct(s) from the polymer which competes in RET, and is less able to dissipate the resulting excitation energy.1... [Pg.109]

Polymer Matrix Effects. In order to approximate the environment experienced by the arylcarbamate moieties in coatings based on aromatic diisocyanates, we chose to study the photochemistry of alkyl N-arylcarbamates in polymethacrylate (PMMA) and polypropyl-methacrylate (PPMA) films. First, however, 2a and 3a were irradiated in ethyl propionate (a model solvent for PMMA and PPMA) to determine the effect of the solvent polarity (dielectric) on the photolysis of the carbamates. Upon excitation at 280 nm, where the solvent absorbance was negligible, is 0.006 for 2a and 0j) is 0.005 for 3a. These values are significantly smaller... [Pg.124]


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See also in sourсe #XX -- [ Pg.280 ]




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