Patterning, OLEDs

OLEDs are obviously able to produce light with virtually every color in the CIE chromaticity diagram but the optimum inexpensive method to manufacture a pixeiatcd full color display is not yet established. The difficulty lies in patterning OLED materials with standard photolithographic methods. Five schemes to achieve color have been suggested, as illustrated schematically in Figure 13-19. 

The minimum size of the monochrome pixels (we consider color in Section 13.7.3) that can be fabricated using OLEDs is dictated primarily by the ability to pattern the electrode which is deposited on top. OLEDs are not sufficiently robust to withstand the normal processes of photolithography. Among the schemes which have been suggested for high resolution patterning is one in which the substrate is pne-pattemed to provide its own shadow mask [1911. By this means, pixel sizes down to 300 p have been demonstrated, and a lower limit of about 100 p is estimated. 

Indicator lights, fixed pattern, and segmented displays are applications which have been suggested for OLED deployment. Manufacturers of automobile components have shown interest in OLED indicators for the dashboard, where the primary considerations are those of cost, form factor, brightness, and stability over a wide range of ambient conditions. Power consumption is not particularly critical. The possibility of molding a thin light into a curved dashboard is attractive. 

The fifth of the color methods places the three emitting structures in a stack one on top of the other, rather than side by side ]20l ]. Clearly there is a requirement here that the two electrodes in the middle of the structure must be transparent. The advantages are that the display can be made much brighter with up to three times the luminance from each pixel, and the requirements for high resolution patterning are relaxed by a factor of three. The disadvantages are that three times as many layers must be coated (without defects) over the area of the display and electrical driving circuitry must make contact with four sets of elec- trades. It will be extremely difficult to incorporate a stacked OLED into a active matrix array. 

FIGURE 7.3 Schematic representation of the basic steps required in fabricating a vapor-deposited OLED test pixel, (a) anode patterning via lithography, (b) deposition of the organic, and (c) metal cathode layers through shadow masks. 

One of the most obvious markets for thin-film vapor-deposited organic materials is in flat panel displays [123], a market currently dominated by LCDs. Over the last two decades, a great improvement in the lifetime and efficiency of OLEDs have been achieved. OLED displays can already be found in simple applications such as automobile stereos, mobile phones, and digital cameras. However, to exploit the advantages of the technology fully, it is necessary to pattern the OLEDs to form monochrome, or more preferentially, full-color displays. This section will consider the difficulties involved in addressing such displays (either passively or actively) and the variety of patterning methods that can be used to produce full-color displays. 

Deposition and patterning of the bottom magnetic pole follow. The pole is usually electroplated with a through-photoresist window frame mask to a thickness level of 2 to 4 fim. Note that whereas the magnetic pole is made into a pancake shape to increase the head efficiency, it is the narrow p>ole tip s dimension that determines the narrow track width. As stated, the widely used Co-based alloy magnetic poles are elec-trodeposited (wet process). Nanocrystalline FeN-based alloys are sputter-deposited in a vacuum chamber (dry process). 

The top magnetic pole, 2 to 4 /rm thick, and overpass lead, which provides electrical connection to the central tap of the coils are now deposited and patterned (as in step 2). The back regions of the magnetic poles are, as a rule, made thicker than the p>ole tips, to achieve high head efficiency and avoid magnetic saturation. 

In sharp contrast to the unique pattern for the incorporation of carbon monoxide into the 1,6-diyne 63, aldehyde 77 was obtained as the sole product in the rhodium-catalyzed reaction of 1,6-enyne 76 with a molar equivalent of Me2PhSiH under CO (Scheme 6.15, mode 1) [22]. This result can be explained by the stepwise insertion of the acetylenic and vinylic moieties into the Rh-Si bond, the formyl group being generated by the reductive elimination to afford 77. The fact that a formyl group can be introduced to the ole-finic moiety of 76 under mild conditions should be stressed, since enoxysilanes are isolated in the rhodium-catalyzed silylformylation of simple alkenes under forcing conditions. The 1,6-enyne 76 is used as a typical model for Pauson-Khand reactions (Scheme 6.15, mode 2) [23], whereas formation of the corresponding product was completely suppressed in the presence of a hydrosilane. The selective formation of 79 in the absence of CO (Scheme 6.15, mode 3) supports the stepwise insertion of the acetylenic and olefmic moieties in the same molecules into the Rh-Si bond. 

Like X-ray diffraction patterns, neutron and electron diffraction patterns provide averaged information about the structure of a compound. Details of these techniques are given in works by Hirsch et al. (1965) and West (1988). Neutron diffraction involves interaction of neutrons with the nuclei of the atoms. As the neutrons are scattered relatively evenly by all the atoms in the compound, they serve to indicate the positions of the protons in an oxide hydroxide. This technique has been applied to elucidation of the structure and/or magnetic properties of goethite (Szytula et al., 1968 Forsyth et al., 1968), akaganeite (Szytula et al., 1970), lepidocrocite (Oles et al., 1970 Christensen Norlund-Christensen, 1978), hematite (Samuelson Shirane, 1970 Fernet et al., 1984) and wiistite (Roth, 1960 Cheetham et al., 1971 Battle Cheetham, 1979). A neutron diffractogram of a 6-line ferrihydrite was recently produced by Jansen et al. (2002) and has helped to refine its structure (see chap. 2). 

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