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Metal organic chemical vapor

Metal organic chemical vapor deposition pOCVD)... [Pg.609]

This article focuses primarily on the properties of the most extensively studied III—V and II—VI compound semiconductors and is presented in five sections (/) a brief summary of the physical (mechanical and electrical) properties of the 2incblende cubic semiconductors (2) a description of the metal organic chemical vapor deposition (MOCVD) process. MOCVD is the preferred technology for the commercial growth of most heteroepitaxial semiconductor material (J) the physics and (4) apphcations of electronic and photonic devices and (5) the fabrication process technology in use to create both electronic and photonic devices and circuits. [Pg.365]

Tertiary stibines have been widely employed as ligands in a variety of transition metal complexes (99), and they appear to have numerous uses in synthetic organic chemistry (66), eg, for the olefination of carbonyl compounds (100). They have also been used for the formation of semiconductors by the metal—organic chemical vapor deposition process (101), as catalysts or cocatalysts for a number of polymerization reactions (102), as ingredients of light-sensitive substances (103), and for many other industrial purposes. [Pg.207]

Dimethylcadmium has found use as a volatile source of Cd for metal organic chemical vapor deposition (MOCVD) production of cadmium-containing semiconductor thin films (qv) such as CdS, Cdi 2 Hg -Te, or Cdi 2 Mn -Te, as multiple quantum weU species (32). Semiconductor-grade material seUs for... [Pg.396]

Nakamura, K., Preparation and Properties of Boron Nitride Films by Metal Organic Chemical Vapor Deposition, /. Electochem. Soc., 133-6 120-1123 (1986)... [Pg.104]

Silver(I) /3-diketonate derivatives have received significant attention due to the ease with which they can be converted to the elemental metal by thermal decomposition techniques such as metal organic chemical vapor deposition (MOCVD).59 The larger cationic radius of silver(I) with respect to copper(I) has caused problems in achieving both good volatility and adequate stability of silver(I) complexes for the use in CVD apparatus. These problems have been overcome with the new techniques such as super critical fluid transport CVD (SFTCVD), aerosol-assisted CVD (AACVD), and spray pyrolysis, where the requirements for volatile precursors are less stringent. [Pg.952]

MOCVD (metal-organic chemical vapor deposition), OMVPE (organometallic vapor-phase epitaxy), and HVPE (hydride vapor-phase epitaxy) have some... [Pg.239]

Metal dithiophosphinates focused recent interest due to their potential use as single source precursors for low-pressure, metal-organic chemical vapor deposition (LP-MOCVD) of metal sulfides. Thus, zinc and cadmium dithiophosphinates and their phenanthroline and bipyridine adducts were characterized and used for deposition of ZnS and CdS.85,86... [Pg.599]

Izu, N. Murayama, N. Shin, W. Matsubara, I. Kanzaki, S. 2004. Resistive oxygen sensors using cerium oxide thin films prepared by metal organic chemical vapor deposition and sputtering. Jpn. J. Appl. Phys. 43 6920-6924. [Pg.236]

GaN as a semi-conducting material for electronics is about to be launched on the market, especially for the use in blue- and UV-emitting LEDs and laser diodes [2]. The material is deposited on crystalline substrates like sapphire using thin-film epitactical techniques. Often, metal-organic chemical vapor deposition (MOCVD) is used. The necessity for such technologies limits the production rate and pushes up costs. [Pg.168]

YDC has been prepared by various methods, including solid-state reaction, coprecipitation, glycine-nitrate process and metal organic chemical vapor deposition (MOCVD). Table 1.4 shows that the properties depend on the preparation method [118,119,127,129,130], Zha et al. [129] have studied the influence of sintering... [Pg.38]


See other pages where Metal organic chemical vapor is mentioned: [Pg.609]    [Pg.206]    [Pg.391]    [Pg.391]    [Pg.432]    [Pg.366]    [Pg.367]    [Pg.368]    [Pg.386]    [Pg.207]    [Pg.249]    [Pg.94]    [Pg.119]    [Pg.142]    [Pg.381]    [Pg.381]    [Pg.385]    [Pg.155]    [Pg.1161]    [Pg.1225]    [Pg.690]    [Pg.613]    [Pg.228]    [Pg.265]    [Pg.297]    [Pg.105]    [Pg.186]    [Pg.206]    [Pg.569]    [Pg.656]    [Pg.105]   


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Atmospheric pressure metal organic chemical vapor deposition

Chemical vapor deposition metal organic, preparation

Chemical vapor deposition metal-organic compound

MOCVD (metal-organic chemical vapor

Metal vapor

Metal vaporization

Metal-Organic Chemical Vapor Condensation

Metal-organic chemical vapor deposition

Metal-organic chemical vapor deposition MOCVD)

Organic vapor

Semiconductor nanoparticles metal-organic chemical-vapor deposition

Synthesis metal-organic chemical vapor

Synthesis metal-organic chemical vapor deposition

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