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Semiconductor nanoparticles metal-organic chemical-vapor deposition

Layers of semiconductor nanoparticles may be prepared, in a variety of ways, either from preformed colloids via techniques such as spin-coating or LbL assembly, or from ionic, atomic or molecular precursors via, for example, electrodeposition, chemical vapor deposition (CVD), or metal-organic chemical vapor deposition (MOCVD). Selected examples of layered structures, derived from a wealth of reports, are described here as examples, together with some attempts at their characterization. [Pg.315]


See other pages where Semiconductor nanoparticles metal-organic chemical-vapor deposition is mentioned: [Pg.631]    [Pg.1031]    [Pg.1031]    [Pg.179]    [Pg.537]    [Pg.7]    [Pg.495]    [Pg.292]    [Pg.1745]   


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Chemical vapor deposition

Chemical vapor deposition , metallation

Metal deposition

Metal nanoparticle

Metal nanoparticles

Metal vapor

Metal vapor deposition

Metal vaporization

Metal-organic chemical vapor

Metal-organic deposition

Metal-organic vapor deposition

Metal/semiconductor nanoparticles

Metallic metal deposits

Nanoparticle organic

Nanoparticles organization

Organic deposition

Organic nanoparticles

Organic semiconductor

Organic vapor

Semiconductor metals

Semiconductor nanoparticles

Semiconductors chemical vapor deposition

Semiconductors metallicity

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