Metal organic chemical vapor deposition, preparation

Nakamura, K., Preparation and Properties of Boron Nitride Films by Metal Organic Chemical Vapor Deposition, /. Electochem. Soc., 133-6 120-1123 (1986)... 

Izu, N. Murayama, N. Shin, W. Matsubara, I. Kanzaki, S. 2004. Resistive oxygen sensors using cerium oxide thin films prepared by metal organic chemical vapor deposition and sputtering. Jpn. J. Appl. Phys. 43 6920-6924. 

YDC has been prepared by various methods, including solid-state reaction, coprecipitation, glycine-nitrate process and metal organic chemical vapor deposition (MOCVD). Table 1.4 shows that the properties depend on the preparation method [118,119,127,129,130], Zha et al. [129] have studied the influence of sintering... 

Transihon metal carbonyls are easily soluble in organic solvents. For this reason, the impregnation method can be used in the preparation of catalysts. In some cases their properties allow the preparation of catalysts by chemical vapor deposition (CVD) on the support [11]. 

Boschloo GK, Goossens A, Schoonman J (1997) J Photoelectrochemical study of thin film of anatase Ti02 films prepared by metal organic chemical vapor deposition. J Electrochem Soc 144 1311-1317... 

Similar to chemical vapor deposition, reactants or precursors for chemical vapor synthesis are volatile metal-organics, carbonyls, hydrides, chlorides, etc. delivered to the hot-wall reactor as a vapor. A typical laboratory reactor consists of a precursor delivery system, a reaction zone, a particle collector, and a pumping system. Modification of the precursor delivery system and the reaction zone allows synthesis of pure oxide, doped oxide, or multi-component nanoparticles. For example, copper nanoparticles can be prepared from copper acetylacetone complexes [70], while europium doped yttiria can be obtained from their organometallic precursors [71]. 

Possibility to prepare the TCO layers on large areas (>lm2) by deposition methods like magnetron sputtering or metal-organic chemical vapor deposition (MOCVD)... 

Dinuclear tetradiketonate complexes with metal-metal bonds have been prepared for Mo11114 and Ptin.115Also familiar are complexes with mixed sets of ligands such as VO(acac)2, V(acac)Cl2(THF)2, and V(acac)Cl(THF)3.116 Many of the diketonate compounds are volatile and have been extensively investigated as precursors for metal organic chemical vapor deposition (MOCVD).117... 

Zhang [3] prepared iridium oxide nanotubes using metal-organic chemical vapor deposition with (methylcyclopentadienyl)(l,5-cyclooctadiene) iridium, (I), followed by heating from 200°C to 500°C. 

The organometallic route can be extended to the formation of one-dimensional indium materials. On the use of long-chain amines as templates. In and InsSn nano wires have been prepared from the organometallic precursors InCp (Cp = 5115 ) in the presence of UV irradiation. In this case, irradiation is cmcial for the formation of the wires. In nanowires are also produced in the metal organic chemical vapor deposition grown InGaN layers. ... 

In recent years, the interest for the preparation of alkylzinc amides has been motivated by their potential apphcation as catalyst for polymerization of propylene oxide, and also as precursors for the MOCVD see Metal-Organic Chemical Vapor Deposition) process. 

Metal organic chemical vapor deposition (MOCVD) is a well-established, practical technique for forming simple as well as complex solid state films (130). For binary systems the conventional approach is to use mixtures of the most readily available molecules containing the elements of interest. This approach has been employed to prepare borides of several types. For example, iron-boron alloys have been pre-... 

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