Laser chemical vapor deposition

Deposition of Thin Films. Laser photochemical deposition has been extensively studied, especially with respect to fabrication of microelectronic stmctures (see Integrated circuits). This procedure could be used in integrated circuit fabrication for the direct generation of patterns. Laser-aided chemical vapor deposition, which can be used to deposit layers of semiconductors, metals, and insulators, could define the circuit features. The deposits can have dimensions in the micrometer regime and they can be produced in specific patterns. Laser chemical vapor deposition can use either of two approaches. 

Baum, T. H., Laser Chemical Vapor Deposition ofGold. The Effect ofOrganometallic Structure, / Electrochem. Soc., 134(10) 2616-2619 (Oct. 1987)... 

England, K. M., and Mazunder, J., Kinetics and Microstructure of Laser Chemical Vapor Deposition of Titanium Nitride, SPIEProc., 2703 552-562 (Feb. 1996)... 

Baum, T.H. (1987) Laser chemical vapor deposition of gold. Journal of the Electrochemical Society, 134, 2616. 

See also LAS processing Laser based patternators, 23 194 Laser cavity, 14 671-672 Laser chemical vapor deposition (LCVD), 5 806-807... 

Laser chemical vapor deposition has been used to prepare films with an unfocused beam (Kimura, 2006) and free-standing fibers with a focused beam. A continuing challenge in this area of chemical vapor deposition is the production of lines that remain on the substrate surface. This is the operational mode that would be useful for replacing lithography as the method for a patterned deposition. 

S. Leppavuori, J. Remes, and H. Moilanen, Laser Chemical Vapor Deposition of Cu and Ni in Integrated Circuit Repair, SPIE, Vol.2874, 1996, pp.272-282. 

J. Mazurader and A. Kar, Theory and Application of Laser Chemical Vapor Deposition, Plenum Press, New York, 1995. 

P. A. Molian, B. Janvrin, and A. M. Molian, Laser chemical vapor deposition of fluorinated diamond thin films for solid lubrication. Wear, 165(2) 133-140 (1993)... 

High-speed coating process, such as plasma spray and electron physical vapor deposition (EB-PVD), has been used for thick coating typically thermal barrier coating (TBC), To improve the performance of TBC, a new coating route should be developed. This review briefly introduces conventional high-speed coating processes, and also describes a new laser chemical vapor deposition (LCVD) technique invented by the present authors. 

High-Speed Engineering Ceramic Coating by Laser Chemical Vapor Deposition... 

New experimental details were reported in 2006 for laser chemical-vapor deposition (LCVD), which is a derivative of CVD whereby the global heat source of a furnace is... 

J. L. Maxwell, J. Pegna, and D. V. Messia, Real-time growth rate measurements and feedback control of three-dimensional laser chemical vapor deposition. Applied Physics A, in print (1998). 

Other applications of F2 lasers are optical pumping of Br and OCS Raman lasers, NO laser, and solid state NdiLaFs laser. Using the high photon energy and short wavelength, photolithography, laser chemical vapor deposition (C VD), laser ablation, etc. are demonstrated. 

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